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    • 4. 发明授权
    • Microwave meter for fluid mixtures
    • 用于流体混合物的微波计
    • US4423623A
    • 1984-01-03
    • US295904
    • 1981-08-24
    • William W. HoAlan B. HarkerIra B. GoldbergKwang E. Chung
    • William W. HoAlan B. HarkerIra B. GoldbergKwang E. Chung
    • G01N22/00G01F1/70
    • G01N22/00
    • A meter and a method are provided for measuring the composition and flow rate of a coal slurry and other similar mixtures. The meter is a waveguide through which the mixture flows. Microwaves are propagated in the waveguide from a transmitter probe. A detector probe spaced from the transmitter probe receives signals from the microwaves. Those signals are processed to determine a characteristic frequency of the waveguide or the wavelength of the propagating microwave, which are related to the composition of the mixture within the waveguide. A second transmitter and detector pair determines these properties for another portion of the waveguide. Differences in the frequencies resulting from inhomogenuities in the mixture are cross correlated to determine the flow rate of the mixture.
    • 提供了用于测量煤浆和其它类似混合物的组成和流速的仪表和方法。 仪表是混合物流过的波导。 微波在发射探头的波导中传播。 与发射器探头间隔开的探测器探头接收来自微波的信号。 处理这些信号以确定波导的特征频率或传播微波的波长,其与波导内的混合物的组成相关。 第二发射器和检测器对确定波导的另一部分的这些特性。 由混合物中的不均匀性引起的频率的差异是交叉相关的,以确定混合物的流速。
    • 5. 发明授权
    • Method of detecting gaseous contaminants
    • 检测气体污染物的方法
    • US4049383A
    • 1977-09-20
    • US757277
    • 1977-01-06
    • C. Shepherd BurtonAlan B. HarkerWilliam W. Ho
    • C. Shepherd BurtonAlan B. HarkerWilliam W. Ho
    • G01N21/76G01N21/58G01N21/26
    • G01N21/766Y10T436/17Y10T436/175383Y10T436/203332Y10T436/204165
    • A method for the detection and quantitative analysis of certain selected constituent parts of a gas stream. A gas stream containing the selected constituent is introduced into a reaction zone and contacted with metastable mercury (6.sup.3 P.sub.o) atoms to form an excited complex of the selected constituent and the metastable mercury atom, which decomposes emitting light. The intensity of the light emission is measured and directly correlatable to the concentration of the constituent in the gas stream. The method of the present invention is particularly applicable to the measurement of ambient air containing selected constituents in an amount or concentration in the 1-100 ppb range. The method can be used to measure trace amounts of numerous selected constituents contained in a gaseous stream including such constituents as ammonia, hydrazine, water vapor, alcohols and various amines.
    • 一种用于检测和定量分析气流的某些选定组成部分的方法。 将含有所选组分的气流引入反应区并与亚稳态汞(63Po)原子接触以形成所选择的成分和亚稳态汞原子的激发络合物,其分解发光。 测量发光强度,并直接与气流中成分浓度相关。 本发明的方法特别适用于以1-100ppb范围内的量或浓度测量含有所选成分的环境空气。 该方法可用于测量痕量的包含在包含氨,肼,水蒸气,醇和各种胺的组分的气流中的许多选定成分。
    • 9. 发明授权
    • Diamond growth by microwave generated plasma flame
    • 金刚石生长由微波产生等离子体火焰
    • US5349154A
    • 1994-09-20
    • US994060
    • 1992-12-17
    • Alan B. HarkerIra B. Goldberg
    • Alan B. HarkerIra B. Goldberg
    • C30B25/10H05H1/46B23K10/00
    • H05H1/46C30B25/105
    • A swirl flow microwave plasma torch is provided for the growth of diamond films. The swirl flow torch incorporates an injection nozzle that directs reactant gases into a cylindrical flow tube extending through the center of a tuned microwave cavity. The outer surface of the nozzle comprises a contoured, conical shape that causes inert gas, directed tangentially against the outer surface of the nozzle, to swift in a helical path that surrounds and confines the reactant gas emerging from the nozzle. The tuned cavity is coupled to a microwave energy source to generate a highly localized plasma in the reactant gas in the center of the sheathing swirl of inert gas. The swirl of inert gas contains the plasma in a well-defined shape, prevents in-diffusion of undesirable gases, forms a boundary layer to prevent plasma migration, and provides flow tube cooling. The reactant gas flow forces the plasma out of the flow tube to form a plasma flame that can be impinged on a substrate to induce diamond growth.
    • 为金刚石薄膜的生长提供了涡流微波等离子体焰炬。 涡流喷管包括一个注射喷嘴,其将反应气体引导到延伸通过调谐的微波腔的中心的圆柱形流管中。 喷嘴的外表面包括成形的圆锥形状,其形成相对于喷嘴的外表面切向指向的惰性气体,以围绕并限制从喷嘴出来的反应气体的螺旋路径旋转。 调谐的空腔耦合到微波能源,以在惰性气体的护套漩涡的中心的反应气体中产生高度局部化的等离子体。 惰性气体的涡流包含明确形状的等离子体,防止不期望的气体的扩散,形成边界层以防止等离子体迁移,并提供流管冷却。 反应气体流动迫使等离子体离开流管,形成等离子体火焰,该等离子体火焰可以撞击在基底上以诱导金刚石生长。
    • 10. 发明授权
    • Nucleation control of diamond films by microlithographic patterning
    • 通过微光刻图案对金刚石膜的成核控制
    • US5242711A
    • 1993-09-07
    • US746458
    • 1991-08-16
    • Jeffrey D. DeNataleJohn F. FlintoffAlan B. HarkerPatrick J. HoodGerald D. Robinson
    • Jeffrey D. DeNataleJohn F. FlintoffAlan B. HarkerPatrick J. HoodGerald D. Robinson
    • B81B3/00B81C99/00C23C16/02C23C16/27G02B1/11G03F7/00
    • G02B1/118B81C1/00111B81C1/00198B81C1/0038C23C16/0227C23C16/0272C23C16/274C23C16/277G03F7/00B81B2201/035B81B2201/047B81C2201/0191B81C2201/056Y10T428/30
    • A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. A conventional polymeric resist process may be used to deposit a pattern of high temperature resist material. With the high temperature resist in place and the polymeric resist removed, a high temperature deposition process may proceed without degradation of the resist pattern. After a desired film of material has been deposited, the high temperature resist is removed to leave the film in the pattern defined by the resist. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate. A fine-grained nucleation geometry, established at the nucleation sites, is maintained as the diamond film is deposited over the entire substrate after the silicon nitride resist is removed. The process can be extended to form microstructures of fine-grained polycrystalline diamond, such as rotatable microgears and surface relief patterns, that have the desirable characteristics of hardness, wear resistance, thermal conductivity, chemical inertness, anti-reflectance, and a low coefficient of friction.
    • 将高温抗蚀剂工艺与用于生产需要高温沉积环境的材料(例如金刚石膜)的微光刻图案组合。 传统的聚合物抗蚀剂工艺可用于沉积耐高温材料的图案。 通过将高温抗蚀剂置于适当位置并除去聚合物抗蚀剂,可以进行高温沉积工艺而不降解抗蚀剂图案。 在已经沉积所需的材料膜之后,去除高温抗蚀剂以使膜以由抗蚀剂限定的图案离开。 对于金刚石膜,可以使用高温氮化硅抗蚀剂用于硅衬底的微光刻图案以提供金刚石成核位点的均匀分布并且改善金刚石膜对衬底的粘附。 在去除氮化硅抗蚀剂之后,在整个衬底上沉积金刚石膜,保持在成核位置建立的细晶粒成核几何形状。 该方法可以扩展以形成具有期望的硬度,耐磨性,导热性,化学惰性,抗反射性和低系数的细晶粒多晶金刚石的微观结构,例如可旋转的微观尺寸和表面浮雕图案 摩擦。