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1. 发明申请

WO1998027460A1 METHOD OF MANUFACTURING PELLICLE AND PELLICLE MANUFACTURING JIG 审中-公开
标题翻译：制造油墨和油墨制造方法
公开(公告)号：WO1998027460A1
公开(公告)日：1998-06-25
申请号：PCT/JP1997004640
申请日：1997-12-16
申请人： MITSUI CHEMICALS, INC. , KONDOU, Masahiro , FUJITA, Minoru , NAKAGAWA, Hiroaki , KURATA, Hiroyuki
发明人： MITSUI CHEMICALS, INC.
IPC分类号： G03F01/14
CPC分类号： G03F1/62
摘要： A method of manufacturing a pellicle, in which a thin film which is one of the components of a pellicle to serve as a dust-proof cover of a mask used for patterning in the manufacture of a semiconductor device or a liquid crystal display panel is temporarily formed on a frame larger than a specific frame which is another component of the pellicle, adhesive is applied to the specific frame beforehand and the larger frame is put on the specific frame with adhesive to bond the thin film which is applied temporarily to the larger frame to the specific frame. The thin film which is applied to the larger frame is transferred to the specific frame and parts of the thin film which protrude from the specific frame are cut off with a physical cutting means to obtain a pellicle. Immediately after, or simultaneously when, or before the parts of the thin film are cut off with the physical cutting means, coating material which is obtained by dissolving a specific resin in organic solvent is applied to the parts of the thin film which are to be cut off with the physical cutting means.
摘要翻译：一种防护薄膜组件的制造方法，其中在半导体装置或液晶显示面板的制造中用作图形化的掩模的防尘罩的防尘薄膜组件之一的薄膜暂时地形成在比作为防护薄膜组件的另一部件的特定框架大的框架上，粘合剂预先施加到特定框架，并且较大的框架用粘合剂放置在特定框架上，以将临时施加的薄膜粘合到较大框架到具体框架。施加到较大框架的薄膜被转移到特定框架，并且用物理切割装置切断从特定框架突出的薄膜的部分以获得防护薄膜组件。在用物理切割装置切断薄膜的部分之后或同时或之后，将通过将特定树脂溶解在有机溶剂中而获得的涂层材料施加到要成为的薄膜的部分用物理切割手段切断。

2. 发明申请

WO1998022851A1 PELLICLE 审中-公开
标题翻译：薄皮
公开(公告)号：WO1998022851A1
公开(公告)日：1998-05-28
申请号：PCT/JP1997004176
申请日：1997-11-17
申请人： MITSUI CHEMICALS, INC. , NAKAYAMA, Norio
发明人： MITSUI CHEMICALS, INC.
IPC分类号： G03F01/14
CPC分类号： G03F1/64
摘要： A pellicle which exhibits an excellent retaining performance of immobilizing extraneous matter such as dust floating in the space enclosed with the pellicle and a mask, and which has on the inner side of a pellicle frame an adhesive layer having a resistance to short wavelength light, such as excimer light. This pellicle has a pellicle frame, a pellicle film formed on one side of the pellicle frame, and an adhesive layer formed on the inner side of the pellicle frame and containing a greaselike fluorocarbon resin.
摘要翻译：防护薄膜组件具有优良的保持性能，能够固定外部物质，例如悬浮在由防护薄膜组成的空间中的灰尘和掩模，并且在防护薄膜组件框架的内侧具有耐短波长光的粘合剂层，作为准分子光。防护薄膜组件具有防护薄膜组件框架，防护薄膜组件框架一侧形成的防护薄膜组件和形成在防护薄膜组件框架内侧并具有油脂状碳氟树脂的粘合剂层。

3. 发明申请

WO1995022083A2 PHOTOMASK BLANKS 审中-公开
公开(公告)号：WO1995022083A2
公开(公告)日：1995-08-17
申请号：PCT/US1995001393
申请日：1995-02-10
申请人： E.I. DU PONT DE NEMOURS AND COMPANY
发明人： E.I. DU PONT DE NEMOURS AND COMPANY , ALPAY, Hakki, Ufuk , FRENCH, Roger, Harquail , KALK, Franklin, Dean
IPC分类号： G03F01/14
CPC分类号： G03F1/32
摘要： Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 at the lithographic wavelength and consists essentially of a combination of multiple components with one of the components having a higher absorbance than another at the lithographic wavelength. One depth from a surface of the films has a higher content of the higher absorbing component than another depth and the profile of change in refractive index and/or extinction coefficient is gradual through the film thickness. Said profile(s) of change and the film thickness are selected to provide a phase shift of about 180 DEG (or an odd multiple thereof) at a selected lithographic wavelength.
摘要翻译：公开了透射嵌入式移相器 - 光掩模坯料，其包含光学不均匀的衰减膜，其在平版印刷波长处具有至少0.001的透射率，并且基本上由多个组分与其中一个组分的组合具有比另一个光刻波长。从膜的表面的一个深度具有比另一深度更高的吸收组分的含量，并且折射率和/或消光系数的变化曲线通过膜厚度逐渐变化。选择所述变化轮廓和膜厚度以在所选择的光刻波长处提供约180°（或其奇数倍）的相移。

4. 发明申请

WO1994017449A1 PHASE SHIFTING MASK STRUCTURE WITH MULTILAYER OPTICAL COATING FOR IMPROVED TRANSMISSION 审中-公开
标题翻译：用于改进传输的多层光学涂层的相移立面结构
公开(公告)号：WO1994017449A1
公开(公告)日：1994-08-04
申请号：PCT/US1993011514
申请日：1993-11-29
申请人： SEMATECH, INC.
发明人： SEMATECH, INC. , VASUDEV, Prahalad, K. , LOW, Kah, Kuen
IPC分类号： G03F01/14
CPC分类号： G03F1/30 , G03F1/26 , Y10T428/24479
摘要： A multi-layer PSM structure with multi-layer optical coating disposed between a quartz substrate and a surrounding medium, which typically is air. The multi-layer coating is comprised of a high index of refraction material overlying the quartz and a lower index of refraction material overlying the first. The multi-layer coating essentially functions as an anti-reflective coating to reduce scattering and reflection at the interface boundaries.
摘要翻译：具有多层光学涂层的多层PSM结构，其设置在石英基板和通常为空气的周围介质之间。多层涂层由覆盖在石英上的高折射率材料和覆盖在第一层上的较低的折射率材料构成。多层涂层基本起到抗反射涂层的作用，以减少界面边界处的散射和反射。

5. 发明申请

WO1991002294A1 DUST-PREVENTING FILM 审中-公开
标题翻译：防尘膜
公开(公告)号：WO1991002294A1
公开(公告)日：1991-02-21
申请号：PCT/JP1990001019
申请日：1990-08-09
申请人： DAICEL CHEMICAL INDUSTRIES, LTD. , MIYATA Akihiro , TAKAHASHI Shigeyuki
发明人： DAICEL CHEMICAL INDUSTRIES, LTD.
IPC分类号： G03F01/14
CPC分类号： G03F1/62
摘要： A dust-preventing film comprising a pellicle frame (2), a pellicle film (1) spread across one end surface thereof, and an adhesive layer (5) that includes a hot melt-type adhesive (4) provided on the other end surfaces. The film is attached to a photomask (6) or a reticule to prevent foreign matters from adhering to the circuit patterns (7).

6. 发明申请

WO1994017450A1 PHASE SHIFTING MASK STRUCTURE WITH ABSORBING/ATTENUATING SIDEWALLS FOR IMPROVED IMAGING AND METHOD OF FABRICATING PHASE SHIFTERS WITH ABSORBING/ATTENUATING SIDEWALLS 审中-公开
标题翻译：具有用于改进成像的吸收/衰减侧面的相移切片结构以及吸收/衰减侧面制造相位切换器的方法
公开(公告)号：WO1994017450A1
公开(公告)日：1994-08-04
申请号：PCT/US1993012094
申请日：1993-12-13
申请人： SEMATECH, INC.
发明人： SEMATECH, INC. , VASUDEV, Prahalad, K. , LOW, Kah, Kuen
IPC分类号： G03F01/14
CPC分类号： G03F1/26 , G03F1/32 , G03F1/34 , G03F1/38
摘要： A phase shifting mask has phase shifters in which the sidewalls of the shifters are coated with a light absorbing or attenuating material. The light absorption at the sidewalls reduces the edges scattering and improves the resolution by obtaining similar transmission profiles from phase shifted and unshifted regions of the PSM. A method of fabricating phase shifters with absorbing or attenuating sidewalls in order to inhibit or prevent light scattering at quartz-air interfaces is also provided. A quartz substrate is patterned and trenches are formed to provide "shifters". A metal film layer is formed along sidewalls of the trenches to provide the light absorbing characteristics. In one technique, the conformal metal layer is anisotropically etched while in another the metal layer is removed along with the photoresist by a lift-off technique.
摘要翻译：相移掩模具有移相器，其中移位器的侧壁涂覆有光吸收或衰减材料。在侧壁处的光吸收通过从PSM的相移和非移相区域获得相似的透射曲线来减少边缘散射并提高分辨率。还提供了制造具有吸收或衰减侧壁以便抑制或防止石英 - 空气界面处的光散射的移相器的方法。对石英衬底进行构图，形成沟槽以提供“移位器”。沿着沟槽的侧壁形成金属膜层以提供光吸收特性。在一种技术中，保形金属层被各向异性地蚀刻，而在另一种技术中，金属层通过剥离技术与光致抗蚀剂一起被去除。

7. 发明申请

WO1994012911A1 METHOD AND APPARATUS FOR FABRICATING MICROLENSES 审中-公开
标题翻译：制备微生物的方法和装置
公开(公告)号：WO1994012911A1
公开(公告)日：1994-06-09
申请号：PCT/US1993009896
申请日：1993-10-15
申请人： LOCKHEED MISSILES & SPACE COMPANY, INC.
发明人： LOCKHEED MISSILES & SPACE COMPANY, INC. , GAL, George
IPC分类号： G03F01/14
CPC分类号： G03F7/0005 , C10M2201/065 , C10M2201/066 , C10M2207/125 , C10M2207/129 , C10M2211/06 , C10M2213/00 , C10M2213/02 , C10M2213/04 , C10M2213/06 , C10M2213/062 , C10N2240/02 , G02B3/0031 , G02B3/0056 , G02B6/12002 , G02B6/1245 , G02B6/136 , G02B2006/12102 , G02B2006/12104 , G02B2006/12147 , G02B2006/12154 , G02B2006/12173 , G02B2006/12176 , G02B2006/12195
摘要： A microlens of any designed configuration is formed as a replica in a photoresist material, and the photoresist material replica is used to reproduce the replica directly in a substrate material.
摘要翻译：任何设计结构的微透镜形成为光致抗蚀剂材料中的复制品，并且光致抗蚀剂材料复制品用于在基材材料中直接再现复制品。

8. 发明申请

WO1994011786A1 PHOTOMASK BLANKS 审中-公开
公开(公告)号：WO1994011786A1
公开(公告)日：1994-05-26
申请号：PCT/US1993010709
申请日：1993-11-12
申请人： E.I. DU PONT DE NEMOURS AND COMPANY
发明人： E.I. DU PONT DE NEMOURS AND COMPANY , ALPAY, Hakki, Ufuk , FRENCH, Roger, Harquail , KALK, Franklin, Road
IPC分类号： G03F01/14
CPC分类号： G03F1/32 , G03F1/54
摘要： Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 and consists essentially of a combination of a metallic component and a dielectric component. One surface of the film has a higher content of metallic component than the other surface and the profile of change in extinction coefficient is gradual through the film thickness. The profile of change in extinction coefficient and the film thickness are selected to provide a phase shift of about 180 DEG (or an odd multiple thereof) at a selected wavelength.
摘要翻译：公开了透射式嵌入式移相器 - 光掩模坯料，其包含光学非均匀衰减膜，其具有至少0.001的透射率，并且基本上由金属成分和电介质成分的组合组成。膜的一个表面具有比另一个表面更高的金属成分含量，并且消光系数的变化曲线通过膜厚逐渐变化。选择消光系数和膜厚度变化的曲线，以在所选波长处提供约180°（或其奇数倍）的相移。

9. 发明申请

WO1998002783A1 MASK PROTECTING DEVICE 审中-公开
标题翻译：防护装置
公开(公告)号：WO1998002783A1
公开(公告)日：1998-01-22
申请号：PCT/JP1997002368
申请日：1997-07-08
申请人： MITSUI CHEMICALS, INC. , NAKAGAWA, Hiroaki , KONDO, Masahiro
发明人： MITSUI CHEMICALS, INC.
IPC分类号： G03F01/14
CPC分类号： G03F1/64 , Y10T428/24793 , Y10T428/24868
摘要： A mask protecting device which is constructed such that a transparent, thin film (12) is mounted and stretched to cover one opening of a frame body sized to surround a mask pattern. Bonded to an end surface (11a) on one opening side of a frame body (11) by means of an adhesive (41) applied on the entire end surface (11a) is a peripheral edge of the transparent, thin film (12) to cover the opening. Also, formed on an end surface (11b) on the other opening side of the frame body (11) by an adhesive, which is applied on an entire periphery of the end surface (11b) of the frame body (11) to bond the frame body (11) to a mask (17), is a linear bead (42). The linear bead (42) provided on the end surface (11b) on the other opening side of the frame body (11) can be formed in various configurations such that it is formed spirally or in parallel inside and outside to be discontinuous in different positions so that such discontinuous portions serve as communication ports between inside and outside. When the mask protecting device (40) is placed on a surface of the mask (17) to be bonded by means of the linear bead (42), which is formed by linearly applying an adhesive (13) on the end surface (11b) of the frame body (11), curved grooves (42) formed with the linear bead (42) as side walls thereof are closed at top portions thereof by the mask (17) to become communication passages (43) between inside and outside the frame body (11). Accordingly, an inner space (19) in the mask protecting device (40) communicates to inside and outside through the communication passages (43) to eliminate expansion or collapse of the thin film (12) to prevent damage to the thin film (12) and generation of optical disadvantages since air within the mask protecting device (40) flows inside and outside through the communication passage (43).
摘要翻译：一种掩模保护装置，其被构造成使得透明薄膜（12）被安装和拉伸以覆盖尺寸为围绕掩模图案的框架主体的一个开口。通过施加在整个端面（11a）上的粘合剂（41）与框体（11）的一个开口侧的端面（11a）接合，是透明薄膜（12）的周边边缘盖开口另外，通过粘合剂在框体（11）的另一开口侧的端面（11b）上形成，该粘合剂涂敷在框体（11）的端面（11b）的整个周边上，框架体（11）到一个面罩（17）上，是一个线性小珠（42）。设置在框体（11）的另一开口侧的端面（11b）上的直线状胎圈（42）可以形成为各种构造，使得其在不同位置处螺旋状或平行地内外平行地形成为不连续使得这种不连续部分用作内部和外部之间的连通端口。当掩模保护装置（40）通过在端面（11b）上线性施加粘合剂（13）而形成的线性凸缘（42）放置在待接合的掩模（17）的表面上时，在框架体11的顶部设有作为其侧壁的直线状凸缘42形成的弯曲槽42，通过掩模17在框架内外形成连通路43，身体（11）。因此，掩模保护装置（40）中的内部空间（19）通过连通通路（43）与内部和外部连通，以消除薄膜（12）的膨胀或破裂，以防止损坏薄膜（12）以及光学缺陷的产生，因为掩模保护装置（40）内的空气通过连通通道（43）内部和外部流动。

10. 发明申请

WO1994019723A1 RESOLUTION-ENHANCING OPTICAL PHASE STRUCTURE FOR A PROJECTION ILLUMINATION SYSTEM 审中-公开
标题翻译：分辨率 - 增强投影照明系统的光学相位结构
公开(公告)号：WO1994019723A1
公开(公告)日：1994-09-01
申请号：PCT/BE1993000009
申请日：1993-02-23
申请人： INTERUNIVERSITAIR MICRO-ELEKTRONICA , VAN DER HOVE, Luc, Maria, Maurits, Leopold , PFORR, Rainer , RONSE, Kurt, Germain, Martha , JONCKHEERE, Rik, Madga, Etienne
发明人： INTERUNIVERSITAIR MICRO-ELEKTRONICA
IPC分类号： G03F01/14
CPC分类号： G03F7/70191 , G03F1/26 , G03F1/50 , G03F7/70108 , G03F7/70125
摘要： In an optical projection system for use in projection printing of masks to wafers, comprising an illumination system including a light source and a mask positioned in the optical path of the illumination system, an optical phase structure is positioned in the optical path between the light source and the mask. The phase structure comprises a pattern of distributed transparent features having at least one refractive index, the transparent features of said phase structure being related in position and orientation to the opaque features of the mask.
摘要翻译：在用于向晶片投影印刷掩模的光学投影系统中，包括一个照明系统，该照明系统包括位于照明系统的光路中的光源和掩模，光学相位结构位于光源和面具。相位结构包括具有至少一个折射率的分布式透明特征的图案，所述相位结构的透明特征在位置和方向上与掩模的不透明特征相关。

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