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    • 2. 发明申请
    • CHARGE-COUPLED DEVICE
    • 电荷耦合器件
    • WO2002059975A1
    • 2002-08-01
    • PCT/IB2001/002670
    • 2001-12-19
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.
    • BOSIERS, Jan, T., J.KLEIMANN, Agnes, C., M.BOERSMA, Yvonne, A.
    • H01L27/148
    • H01L29/76816H01L27/148
    • The invention relates to a CCD of the buried-channel type comprising a charge-transport channel in the form of a zone (12) of the first conductivity type, for example the n-type, in a well (13) of the opposite conductivity type, in the example the p-type. In order to obtain a drift field in the channel below one or more gates (9, 10a) to improve the charge transfer, the well is provided with a doping profile, so that the average concentration decreases in the direction of charge transport. Such a profile can be formed by covering the area of the well during the well implantation with a mask, thereby causing fewer ions to be implanted below the gates (9, 10a) than below other parts of the channel. By virtue of the invention, it is possible to produce a gate (10a) combining a comparatively large length, for example in the output stage in front of the output gate (9) to obtain sufficient storage capacity, with a high transport rate.
    • 本发明涉及一种埋入通道型的CCD,其包括形成第一导电类型的区域(12)形式的电荷传输通道,例如n型,在相反电导率的阱(13)中 类型,在示例中为p型。 为了获得在一个或多个栅极(9,10a)下方的通道中的漂移场以改善电荷转移,阱具有掺杂分布,使得平均浓度在电荷传输方向上减小。 这样的形状可以通过用掩模在阱注入期间覆盖阱的区域来形成,从而在栅极(9,10a)下面比在沟道的其它部分下方注入更少的离子。 根据本发明,可以产生组合比较大长度的门(10a),例如在输出门(9)前面的输出级中以高传输速率获得足够的存储容量。
    • 6. 发明申请
    • 固体撮像装置
    • 固态图像捕获器件
    • WO2013008405A1
    • 2013-01-17
    • PCT/JP2012/004251
    • 2012-06-29
    • パナソニック株式会社石田 琢磨白木 宏一
    • 石田 琢磨白木 宏一
    • H04N5/372H01L27/148
    • H01L29/76816H01L27/14831H04N5/3698H04N5/372
    •  垂直転送部(4)における最終転送電極下のチャネル領域の不純物濃度及び水平転送部(5)のチャネル領域の不純物濃度は、垂直転送部(4)における最終転送電極下以外のチャネル領域の不純物濃度よりも低い。信号電荷を垂直方向に転送する際に垂直転送部(4)の最終転送電極に印加される駆動信号におけるハイレベルの電位は、光電変換部(3)で生成された信号電荷を垂直転送部(4)に読み出す際に使用される信号の電位と同レベルであり、前記駆動信号におけるローレベルの電位は、垂直転送部(4)で信号電荷を垂直方向に転送する際に使用される信号の最低電位と同レベルである。
    • 在垂直转印单元(4)中的极性转移电极下的沟道区域的杂质浓度和水平转印单元(5)的沟道区域的杂质浓度低于最终转印区域以外的通道区域的杂质浓度 电极在垂直传送单元(4)中。 当在垂直方向上传送信号电荷时,施加到垂直传送单元(4)的最终传送电极的驱动信号中的高电平电位与读出时使用的信号的电位相同 由光电转换单元(3)生成到垂直传送单元(4)的信号电荷。 驱动信号中的低电平电位与垂直传送单元(4)在垂直方向传送信号电荷时使用的信号的最小电位相同。
    • 7. 发明申请
    • CCD SENSOR AND METHOD FOR EXPANDING DYNAMIC RANGE OF CCD SENSOR
    • CCD传感器和扩展CCD传感器动态范围的方法
    • WO2006108927A1
    • 2006-10-19
    • PCT/FI2006/050151
    • 2006-04-12
    • PLANMECA OYDE GODZINSKY, Christian
    • DE GODZINSKY, Christian
    • H01L27/148
    • H04N5/32H01L27/14806H01L27/14825H01L29/76816H04N5/355H04N5/35554H04N5/37206H04N5/37213
    • The invention relates to a CCD sensor arrangement (1-1 ), comprising a CCD sensor, which comprises a detector (1-2) which has an active area comprising pixels that receive charges; a read-out register (1-4) in functional connection with the aforesaid active area; means for transferring charges from the active area into the read-out register (1-4); means for transferring charges to the out-put (1-4a, 1-4b) of the read-out register (1-4); at least two, a first and a second read-out well (1-6, 1-8) functionally connected with the read-out register (1-4); and means for transferring charges from the output (1-4a, 1-4b) of read-out register (1-4) into the read-out well (1-6, 1-8). The invention is characterized in that said at least two read-out wells (1-6, 1-8) have different capasities, and means arranged in the sensor or in functional connection with the sensor for measuring the signal generated by the charges, and selection means for deciding at least partly on the basis of the aforesaid measured signal whether the read-out well (1-6, 1-8) to be used is to be changed.
    • 本发明涉及一种CCD传感器装置(1-1),其包括CCD传感器,其包括检测器(1-2),其具有包括接收电荷的像素的有效区域; 与上述活动区域功能连接的读出寄存器(1-4); 用于将费用从有效区域转移到读出寄存器(1-4)的手段; 用于将费用转移到读出寄存器(1-4)的输出(1-4a,1-4b)的装置; 至少两个,与读出寄存器(1-4)功能连接的第一和第二读出阱(1-6,1-8); 以及用于将读出寄存器(1-4)的输出(1-4a,1-4b)的电荷转移到读出阱(1-6,1-8)中的装置。 本发明的特征在于,所述至少两个读出孔(1-6,1-8)具有不同的容量,以及布置在传感器中或与传感器功能连接的装置,用于测量由电荷产生的信号,以及 选择装置,用于至少部分地基于上述测量信号确定要使用的读出井(1-6,1-8)是否被改变。
    • 8. 发明申请
    • SOLID STATE IMAGE PIKUP DEVICE AND ITS MANUFACTURING METHOD
    • 固态图像剔除装置及其制造方法
    • WO2006011313A1
    • 2006-02-02
    • PCT/JP2005/011103
    • 2005-06-10
    • FUJI PHOTO FILM CO., LTD.NAGASE, Masanori
    • NAGASE, Masanori
    • H01L27/148
    • H01L27/14683H01L27/14812H01L29/76816
    • PROBLEM To provide a high quality solid state image pickup device. SOLUTION Impurities are implanted into a semiconductor substrate to form vertical transfer channels for transferring electric charges in a first direction and to form a drain near each of the vertical transfer channels via a gate which forms a barrier. A first silicon oxide film, a silicon nitride film and a second silicon oxide film are deposited in this order from the bottom, on the surfaces of the vertical transfer channels, gates and drains. A first layer vertical transfer electrode is formed on the second silicon oxide film above the vertical transfer channel, and an insulating film if formed on the surface of the first layer vertical transfer electrode. The second silicon oxide film and silicon nitride film are etched in such a manner that the silicon nitride film covers the vertical transfer channel and extends above the gate excepting a portion near the drain. A gate control electrode is formed on the insulating film and first silicon oxide film. A plurality of charge accumulation regions are formed in a matrix shape in an area defined on an upstream side of the first direction further than the drains, in such a manner that each column of the charge accumulation regions is formed near each of the vertical transfer channels.
    • 问题提供高品质固态图像拾取装置。 解决方案将杂质注入到半导体衬底中以形成用于沿第一方向传送电荷的垂直传输通道,并且经由形成屏障的栅极在每个垂直传输通道附近形成漏极。 该第一氧化硅膜,氮化硅膜和第二氧化硅膜从该底部,垂直传输通道,栅极和漏极的表面依次沉积。 第一层垂直转移电极形成在垂直转移通道上方的第二氧化硅膜上,如果形成在第一层垂直转移电极的表面上,则形成绝缘膜。 蚀刻第二氧化硅膜和氮化硅膜,使得氮化硅膜覆盖垂直传输沟道并且在栅极附近延伸,除了漏极附近的部分。 在绝缘膜和第一氧化硅膜上形成栅极控制电极。 多个电荷累积区域形成为在比排水线更远的第一方向的上游侧限定的区域中以矩阵形状,使得电荷累积区域的每列形成在每个垂直传送通道附近 。
    • 9. 发明申请
    • SEMICONDUCTOR CHARGE POTENTIAL WELLS WITH INTEGRATED DIFFUSIONS
    • 具有集成扩散的半导体充电电位阱
    • WO1997012402A1
    • 1997-04-03
    • PCT/US1996015285
    • 1996-09-24
    • ANALOG DEVICES, INC.
    • ANALOG DEVICES, INC.MUNROE, Scott, C.
    • H01L29/768
    • H01L29/76816H01L29/42396H01L29/768H01L29/772H01L29/7831H01L29/94
    • A semiconductor device having a semiconductor region including a material of a first predetermined conductivity type; an insulating layer (40) provided on the semiconductor region; a gate electrode (32, 34, 38) provided on the insulating layer, the gate electrode forming a potential well within the semiconductor region in response to a potential being applied thereto; and a diffusion (36) of highly doped material of a second predetermined conductivity type being positioned within the semiconductor region, and which is applied through an opening in the gate electrode and the insulating layer (40), the diffusion (36) being in direct ohmic contact with the potential well. The diffusion (36) can be either a n+ or p+ diffusion. The diffusion (36) accommodates a reduction in lateral time constants of charge redistribution within the potential well, direct sensing of the charge in the well, and injection and extraction of charge to and from the well.
    • 一种半导体器件,具有包括第一预定导电类型的材料的半导体区域; 设置在所述半导体区域上的绝缘层(40) 设置在所述绝缘层上的栅极电极,所述栅极电极响应于施加到所述栅电极的电位而在所述半导体区域内形成势阱; 并且第二预定导电类型的高掺杂材料的扩散(36)位于半导体区域内,并且通过栅电极和绝缘层(40)中的开口施加,扩散(36)直接 欧姆接触势阱。 扩散(36)可以是n +或p +扩散。 扩散(36)可以减少潜在井内的电荷再分配的横向时间常数,直接感测井中的电荷,以及向井和从井的注入和提取电荷。