会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS
    • 用于生产胶片组合物的薄膜形成树脂的方法
    • WO2002084402A2
    • 2002-10-24
    • PCT/EP2002/002997
    • 2002-03-19
    • CLARIANT INTERNATIONAL LTDCLARIANT FINANCE (BVI) LIMITED
    • RAHMAN, M., DalilMCKENZIE, DouglasKUDO, TakanoriPADMANABAN, Munirathna
    • G03F7/039
    • B01J20/28033B01J20/28004B01J20/28028B01J20/2803B01J20/28085B01J47/018B01J47/133C08F6/02C08F6/16G03F7/0395
    • The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent, the film forming resin made by polymerizing at least one monomer containing a cycloolefin or an acid labile acrylate or a methacrylate; (b) providing at least one of the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid (which has preferably been acid-washed) and particulate ion exchange resin particles having an average particle size of from about 2 to about 10 microns, where the particulate filter aid and ion exchange resin particulates are distributed substantially uniformly throughout a cross-section of said matrix; and/or (ii) a filter sheet containing a self-supporting matrix of fibers (preferably cellulose) having immobilized therein particulate filter aid and binder resin, the filter sheet preferably not containing any ion exchange resin embedded therein, and having an average pore size of 0.05 to 0.5 µm; (c) rinsing the filter sheet of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheet of step (c). The present invention also provides a method for producing a phtoresist composition by providing an admixture of: (1) a film forming resin prepared by the foregoing method; (2) a photosensitive component in an amount sufficient to photosensitize a photoresist composition; and optionally (3) an additional suitable photoresist solvent. The present invention also provides a method for producing a microelectronic device by forming an image on a substrate, by (a) providing the photoresist composition prepared by the foregoing method; (b) thereafter, coating a suitable substrate with the photoresist composition from step (a); (c) thereafter, heat treating the coated substrate until substantially all of the photoresist solvent is removed; and (d) imagewise exposing the photoresist composition and removing the imagewise exposed areas of the photoresist composition with a suitable developer.
    • 本发明提供一种适用于光致抗蚀剂组合物的成膜树脂的制造方法,包括以下步骤:(a)将成膜树脂在溶剂中的溶液提供,所述成膜树脂通过聚合至少一种 含有环烯烃或酸不稳定丙烯酸酯或甲基丙烯酸酯的单体; (b)提供以下两个过滤片中的至少一个:(i)包含其中固定有微粒过滤助剂(优选被酸洗)的自支撑纤维基质的过滤片和具有颗粒状离子交换树脂颗粒的颗粒, 平均粒度为约2至约10微米,其中颗粒助滤剂和离子交换树脂微粒基本均匀地分布在所述基质的横截面上; 和/或(ii)含有固定有颗粒助滤剂和粘合剂树脂的自支撑纤维基质(优选纤维素)的过滤片,所述过滤片优选不含嵌入其中的任何离子交换树脂,并且具有平均孔径 为0.05〜0.5μm; (c)用步骤(a)的溶剂冲洗步骤(b)的过滤片; 和(d)使成膜树脂的溶液通过步骤(c)的冲洗过的滤纸。 本发明还提供一种通过提供以下成分的混合物来制备抗蚀剂组合物的方法:(1)通过上述方法制备的成膜树脂; (2)光敏组分,其量足以使光致抗蚀剂组合物光敏; 和(3)另外合适的光刻胶溶剂。 本发明还提供了一种通过在(a)提供通过上述方法制备的光致抗蚀剂组合物在基底上形成图像来生产微电子器件的方法; (b)此后,用来自步骤(a)的光致抗蚀剂组合物涂覆合适的基材; (c)此后,对涂覆的基材进行热处理,直到基本上所有的光致抗蚀剂溶剂被除去; 和(d)成像曝光光致抗蚀剂组合物并用合适的显影剂去除光刻胶组合物的成像曝光区域。
    • 3. 发明申请
    • Radioactive waste disposal cartridge
    • 放射性废物处理盒
    • WO9610831A3
    • 1996-07-11
    • PCT/US9512783
    • 1995-10-02
    • GENOMYX CORPDAVIS THOMAS ESCHWARTZ HENRY L
    • DAVIS THOMAS ESCHWARTZ HENRY L
    • G01N27/447B01J47/12G01N30/00G21F9/12
    • G21F9/12B01J47/133
    • This invention relates to the use of a unique apparatus and method for extracting radioactive components from liquids, such as electrophoresis buffers. In the present invention, the radioactive liquid is pumped or transported by other suitable means and is passed through a cartridge having an elongated chamber that contains an exchange medium. The exchange medium, i.e. exchange resin, is contained within the elongated chamber between an upper frit and a lower frit. Further, the cartridge has a means within the elongated chamber for retaining pressure between the upper frit and the lower frit. The nucleotides, being charged molecules, bind to the exchange medium and are removed from the liquid. The liquid then exits the cartridge and has such a low amount of radioactivity that it can be disposed of to a conventional drain.
    • 本发明涉及使用从液体如电泳缓冲液中提取放射性成分的独特装置和方法。 在本发明中,放射性液体被其他合适的装置泵送或输送,并且通过具有包含交换介质的细长室的盒。 交换介质,即交换树脂,被包含在上玻璃料和下玻璃料之间的细长室内。 此外,筒具有在细长室内的装置,用于保持上玻璃料和下玻璃料之间的压力。 作为带电分子的核苷酸与交换介质结合并从液体中除去。 液体然后离开墨盒,并且具有如此低的放射性量,使其能够被排放到常规的排水口。
    • 4. 发明申请
    • RADIOACTIVE WASTE DISPOSAL CARTRIDGE
    • 放射性废物处理盒
    • WO1996010831A2
    • 1996-04-11
    • PCT/US1995012783
    • 1995-10-02
    • GENOMYX CORPORATIONDAVIS, Thomas, E.SCHWARTZ, Henry, L.
    • GENOMYX CORPORATION
    • G21F09/12
    • G21F9/12B01J47/133
    • This invention relates to the use of a unique apparatus and method for extracting radioactive components from liquids, such as elctrophoresis buffers. In the present invention, the radioactive liquid is pumped or transported by other suitable means and is passed through a cartridge having an elongated chamber that contains an exchange medium. The exchange medium, i.e. exchange resin, is contained within the elongated chamber between an upper frit and a lower frit. Further, the cartridge has a means within the elongated chamber for retaining pressure between the upper frit and the lower frit. The nucleotides, being charged molecules, bind to the exchange medium and are removed from the liquid. The liquid then exits the cartridge and has such a low amount of radioactivity that it can be disposed of to a conventional drain.
    • 本发明涉及使用独特的装置和方法从液体中提取放射性成分,如电泳缓冲液。 在本发明中,放射性液体被其他合适的装置泵送或输送,并且通过具有包含交换介质的细长室的盒。 交换介质,即交换树脂,被包含在上玻璃料和下玻璃料之间的细长室内。 此外,盒具有在细长室内的装置,用于保持上玻璃料和下玻璃料之间的压力。 作为带电分子的核苷酸与交换介质结合并从液体中除去。 液体然后离开墨盒,并且具有如此低的放射性量,使其能够被排放到常规的排水口。
    • 10. 发明申请
    • PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS
    • 生产用于光致抗蚀剂组合物的成膜树脂的方法
    • WO02084402A3
    • 2002-12-12
    • PCT/EP0202997
    • 2002-03-19
    • CLARIANT INT LTDCLARIANT FINANCE BVI LTD
    • RAHMAN M DALILMCKENZIE DOUGLASKUDO TAKANORIPADMANABAN MUNIRATHNA
    • B01J20/28B01J47/00B01J47/12C08F220/10C08F232/08G03F7/039G03F7/26H01L21/027
    • B01J20/28033B01J20/28004B01J20/28028B01J20/2803B01J20/28085B01J47/018B01J47/133C08F6/02C08F6/16G03F7/0395
    • The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent, the film forming resin made by polymerizing at least one monomer containing a cycloolefin or an acid labile acrylate or a methacrylate; (b) providing at least one of the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid (which has preferably been acid-washed) and particulate ion exchange resin particles having an average particle size of from about 2 to about 10 microns, where the particulate filter aid and ion exchange resin particulates are distributed substantially uniformly throughout a cross-section of said matrix; and/or (ii) a filter sheet containing a self-supporting matrix of fibers (preferably cellulose) having immobilized therein particulate filter aid and binder resin, the filter sheet preferably not containing any ion exchange resin embedded therein, and having an average pore size of 0.05 to 0.5 µm; (c) rinsing the filter sheet of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheet of step (c). The present invention also provides a method for producing a phtoresist composition by providing an admixture of: (1) a film forming resin prepared by the foregoing method; (2) a photosensitive component in an amount sufficient to photosensitize a photoresist composition; and optionally (3) an additional suitable photoresist solvent. The present invention also provides a method for producing a microelectronic device by forming an image on a substrate, by (a) providing the photoresist composition prepared by the foregoing method; (b) thereafter, coating a suitable substrate with the photoresist composition from step (a); (c) thereafter, heat treating the coated substrate until substantially all of the photoresist solvent is removed; and (d) imagewise exposing the photoresist composition and removing the imagewise exposed areas of the photoresist composition with a suitable developer.
    • 本发明提供一种适用于光致抗蚀剂组合物的成膜树脂的制造方法,其包括以下步骤:(a)提供成膜树脂在溶剂中的溶液,该成膜树脂通过聚合至少一种 含有环烯烃或酸不稳定的丙烯酸酯或甲基丙烯酸酯的单体; (b)提供以下两个过滤片中的至少一个:(i)含有自支撑纤维基质的过滤片,所述自支撑纤维基质具有固定在其中的颗粒助滤剂(其优选经酸洗)和颗粒状离子交换树脂颗粒 平均粒度为约2至约10微米,其中所述颗粒状助滤剂和离子交换树脂颗粒基本均匀地分布在所述基质的整个横截面上; 和/或(ii)含有其中固定有颗粒助滤剂和粘合剂树脂的纤维(优选纤维素)的自支撑基质的过滤片,所述过滤片优选不包含嵌入其中的任何离子交换树脂,并且平均孔径 为0.05至0.5μm; (c)用步骤(a)的溶剂漂洗步骤(b)的滤板; 和(d)使成膜树脂的溶液通过步骤(c)的冲洗的过滤片。 本发明还提供了一种通过提供如下物质的混合物来生产药物组合物的方法:(1)用上述方法制备的成膜树脂; (2)足以使光致抗蚀剂组合物光敏化的量的光敏组分; 和任选地(3)另外的合适的光致抗蚀剂溶剂。 本发明还提供了一种通过在基底上形成图像来制造微电子器件的方法,其通过(a)提供通过上述方法制备的光致抗蚀剂组合物; (b)之后,用来自步骤(a)的光致抗蚀剂组合物涂布合适的基材; (c)之后,热处理涂覆的基底,直到基本上除去所有的光刻胶溶剂; 和(d)将光致抗蚀剂组合物成像曝光并用合适的显影剂除去光致抗蚀剂组合物的成像曝光区域。