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    • 5. 发明申请
    • DISPLAY DEVICE
    • 显示设备
    • WO2005008715A3
    • 2005-07-21
    • PCT/IL2004000670
    • 2004-07-22
    • YEDA RES & DEVHALAHMI EREZNAAMAN RON
    • HALAHMI EREZNAAMAN RON
    • C25C3/00G09G3/10H01J1/00H01J1/304H01J1/34H01J3/02H01J21/10H01J31/12H01J40/06
    • H01J21/10H01J3/021
    • A display device (20) is presented. The display device includes an electrodes' arrangement (12) and an electrons' extractor (14). The electrodes' arrangement comprises a Cathode electrode layer (12A) having at least one Cathode electrode and an Anode electrode layer (12C) having at least one Anode electrode, the Cathode and Anode electrode layers being accommodated in a spaced-apart relationship with a gap between them. The Anode layer carries a luminescent screen assembly (22) on its surface. The electrodes arrangement is operable to create a desired electrical field between the electrodes. The electrons' extractor operates to extract electrons from at least a selected region of the Cathode electrode layer by illuminating this Cathode region with exciting illumination of a predetermined wavelength range to cause the electron emission from the illuminated Cathode region.
    • 呈现显示装置(20)。 显示装置包括电极装置(12)和电子提取器(14)。 电极的布置包括具有至少一个阴极电极的阴极电极层(12A)和具有至少一个阳极电极的阳极电极层(12C),阴极和阳极电极层以间隔开的方式被容纳 它们之间。 阳极层在其表面上携带发光屏组件(22)。 电极布置可操作以在电极之间产生期望的电场。 电子提取器通过用预定波长范围的激发照明照射该阴极区域,从而从阴极电极层的至少一个选定区域提取电子,以引起来自照明阴极区域的电子发射。
    • 6. 发明申请
    • MAGNETIC PATTERNING METHOD AND SYSTEM
    • 磁性图案方法与系统
    • WO2010061378A3
    • 2010-11-18
    • PCT/IL2009001026
    • 2009-11-03
    • YEDA RES & DEVNAAMAN RONBARDEA AMOSYOFFE ALEXANDER
    • NAAMAN RONBARDEA AMOSYOFFE ALEXANDER
    • B81C1/00
    • C12M23/06B81C1/00031B81C2201/0154B81C2201/0198C12M27/00H01F41/16
    • The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator (100b) configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate (102) creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles (106), while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.
    • 本发明涉及一种用于图案化衬底的方法和装置。 该方法包括提供至少一个磁性图案发生器(100b),其配置并可操作以根据期望的图案调制磁场以对磁场产生变化的磁性; 在所述基板(102)附近施加所述调制磁场,从而产生将在所述基板的顶部上获得的相互作用区域的特定图案; 和; 在使用调制磁场的同时,将衬底与磁性颗粒(106)相互作用,磁性颗粒被吸引到由特定图案限定的相互选择的相互作用区域,同时基本上不被吸引到相互作用区域之外的区域,从而产生 在衬底的顶部,某些区域与磁性颗粒相互作用。 期望的图案对应于预定磁场分布的特定图案,并且距离磁图案发生器预定距离处,其中样本将被定位。
    • 7. 发明申请
    • METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES
    • 用于制作纳米尺度图形表面的方法
    • WO2009113063A3
    • 2010-08-19
    • PCT/IL2009000269
    • 2009-03-10
    • YEDA RES & DEV COMPANY LTD NNAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • NAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • B81C1/00H01J1/304H01J1/34
    • B81C1/00206B81C1/00031B81C2201/0132B81C2201/115G03F7/40
    • A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.
    • 提出了一种具有纳米级表面粗糙度的基板的制造方法。 该方法包括:图案化基板的表面以产生光敏材料的间隔开的区域的阵列; 对所述图案化表面施加可控制的蚀刻,所述可控蚀刻具有预定的持续时间,以便形成具有纳米尺度特征的图案; 并去除感光材料,从而产生具有纳米级表面粗糙度的结构。 用疏水性分子对这样的纳米级粗糙表面进行硅烷化,导致产生了以接触角大和倾斜角大的特征的超疏水特性。 而且,在纳米级粗糙度表面上沉积光活性材料导致光电阴极具有增强的光电转换率。 该方法还提供对入射光的偏振不敏感的光电阴极的制造。
    • 9. 发明申请
    • METHOD FOR FABRICATING NANO-SCALE PATTERNED SURFACES
    • 制造纳米图案化表面的方法
    • WO2009113063A8
    • 2009-11-26
    • PCT/IL2009000269
    • 2009-03-10
    • YEDA RES & DEV COMPANY LTD NNAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • NAAMAN RONGOLAN BENFRADKLIN ZEEVWINKLEMAN ADAMORON DAN
    • B81C1/00
    • B81C1/00206B81C1/00031B81C2201/0132B81C2201/115G03F7/40
    • A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super- hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.
    • 提出了一种制造具有纳米级表面粗糙度的基板的方法。 该方法包括:图案化衬底的表面以形成光敏材料的间隔开的区域的阵列; 对图案化表面施加可控蚀刻,所述可控蚀刻具有预定的持续时间,以便形成具有纳米级特征的图案; 并去除光敏材料,从而形成具有纳米级表面粗糙度的结构。 用疏水分子将这种纳米级粗糙表面硅烷化导致产生以大接触角和大倾角为特征的超疏水特性。 而且,在纳米级粗糙表面上沉积光敏材料导致光电阴极具有增强的光电发射产率。 该方法还提供了制造对入射光的偏振不敏感的光电阴极。