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1. 发明申请

WO2011138331A3 PVD HYBRID METHOD FOR DEPOSITING MIXED CRYSTAL LAYERS 审中-公开
标题翻译： PVD混合法分离混合晶体层
公开(公告)号：WO2011138331A3
公开(公告)日：2012-12-13
申请号：PCT/EP2011057064
申请日：2011-05-03
申请人： WALTER AG , ENGELHART WOLFGANG , SCHIER VEIT
发明人： ENGELHART WOLFGANG , SCHIER VEIT
IPC分类号： C23C14/22 , C23C14/32 , C23C14/35
CPC分类号： C23C14/325 , B32B15/01 , B32B15/012 , B32B15/013 , C23C14/08 , C23C14/22 , C23C14/35 , C23C14/352 , C23C28/042 , C23C28/044 , C23C30/005 , Y10T428/12493 , Y10T428/12972
摘要： The present invention relates to a method for depositing mixed crystal layers having at least two different metals (M1, M2) on a substrate by means of a PVD method. In order to provide a method for depositing mixed crystal layers having at least two different metals on a substrate by means of a PVD method, by means of which mixed crystal layers that are as free as possible from macroparticles (droplets) and that have as great a proportion as possible of a desired crystalline phase and that are highly crystalline are obtained, the deposition of the mixed crystal layer is performed while simultaneously applying I) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering (HIPIMS) and ii) arc vaporization (arc PVD).
摘要翻译：本发明涉及一种用于沉积混合晶体层具有通过PVD法在基板上的至少两种不同的金属（M1，M2）的处理。到用于与至少两种不同的金属在基板上通过PVD法用其是尽可能不含宏观颗粒（液滴）的并且具有所希望的结晶相和高度结晶是高比例的所获得的混合晶体层沉积混合晶体层提供一种方法，本发明提出进行同时施加i）所述双阴极溅射磁控管或高功率脉冲磁控管溅射法，在混晶层（HIPIMS）和ii）电弧蒸发（电弧-PVD）的沉积。

2. 发明申请

WO2010106142A8 CUTTING TOOL 审中-公开
标题翻译：切削刀具
公开(公告)号：WO2010106142A8
公开(公告)日：2010-11-18
申请号：PCT/EP2010053551
申请日：2010-03-18
申请人： WALTER AG , EIBL OLIVER , SCHIER VEIT , ENGELHART WOLFGANG
发明人： EIBL OLIVER , SCHIER VEIT , ENGELHART WOLFGANG
IPC分类号： C23C14/08 , C23C30/00
CPC分类号： C23C14/08 , B23B27/14 , B23B2228/08 , B23B2228/105 , C23C14/081 , C23C14/083 , C23C16/40 , C23C30/005 , Y10T428/257 , Y10T428/265
摘要： The invention relates to a cutting tool having a substrate base body and a single or multi-layered coating attached thereupon, wherein at least one layer of the coating is a metal oxide layer produced in the PVD process or in the CVD process and the metal oxide layer has a grain structure wherein there is structural disorder within a plurality of the existing grains that are characterized in that in electron diffraction images of the grains, point-shaped reflections occur up to a maximum lattice spacing dGRENZ and for lattice spacing greater than dGRENZ no point-shaped reflections occur, but rather a diffuse intensity distribution typical for amorphous structures.
摘要翻译：一种切削工具，其包括基体和涂覆在其上的一个或多层涂层，其中该涂层的层通过PVD法或CVD法，至少金属氧化物层中产生，并且该金属氧化物层具有的晶粒结构，其中，多个现有晶粒病症的内结构都存在，其特征在于发生在晶粒的电子衍射图像，最多面间距dGRENZ点状的反应和更大的对晶面间距dGRENZ没有点状的反射发生，但一个典型的无定形结构的漫强度分布。

3. 发明申请

WO2009003755A2 TOOL WITH MULTILAYERED METAL OXIDE COATING 审中-公开
标题翻译： WITH多层金属氧化物WERZEUG
公开(公告)号：WO2009003755A2
公开(公告)日：2009-01-08
申请号：PCT/EP2008056037
申请日：2008-05-16
申请人： WALTER AG , SCHIER VEIT
发明人： SCHIER VEIT
IPC分类号： C23C14/00 , C23C14/08 , C23C30/00
CPC分类号： C23C14/22 , C23C4/131 , C23C14/081 , C23C14/083 , C23C28/042 , C23C28/044 , C23C30/005 , Y10T428/24975
摘要： The present invention relates to a cutting tool with a base body and a multilayered coating applied to it, wherein at least two layers of the multilayered coating, arranged one on top of the other, contain or consist of metal oxide of the same metal or of different metals. To provide cutting tools that are improved over the prior art, it is proposed according to the invention that the at least two metal oxide layers arranged one on top of the other are produced one after the other by different PVD processes, selected from i) reactive magnetron sputtering RMS, ii) arc vapour deposition (arc-PVD), iii) ion plating, iv) electron-beam vapour deposition and v) laser ablation, wherein modifications of the respective processes i) to v) do not constitute different PVD processes.
摘要翻译：本发明涉及一种切削工具用基体和其上的多层涂层具有，其中至少有相同的金属的多层涂层的金属氧化物的或不同的金属两个叠加层或包含它。以提供改进的切削刀具相对于所述现有技术，本发明提出，至少有两个叠置的金属氧化物层被连续通过选自i各种PVD方法）反应磁控RMS，ⅱ）电弧蒸发（电弧-PVD），III）离子镀产生，ⅳ）电子束蒸发，以及v）激光烧蚀，其中，所述各工序的修饰i）至v）不是不同PVD过程。

4. 发明申请

WO03018862A3 METHOD FOR PRODUCING A NANOSTRUCTURED COATING 审中-公开
标题翻译：用于生产纳米结构涂层功能，因此生产的涂层
公开(公告)号：WO03018862A3
公开(公告)日：2003-06-26
申请号：PCT/DE0203074
申请日：2002-08-22
申请人： BOSCH GMBH ROBERT , WALTER AG , BECK THOMAS , SCHATTKE ALEXANDER , HENKE SASCHA , SCHIER VEIT
发明人： BECK THOMAS , SCHATTKE ALEXANDER , HENKE SASCHA , SCHIER VEIT
IPC分类号： B23B51/00 , B23B27/14 , B23P15/28 , C23C14/06 , C23C14/34 , C23C14/35 , C23C16/30
CPC分类号： C23C14/354 , C23C14/06 , C23C14/352 , Y10T428/25 , Y10T428/252 , Y10T428/30
摘要： The invention relates to a method for producing a nanostructured, in particular, ceramic-type functional coating (17) on a substrate (16). At least one plasma source (11, 12) generates a pulsed plasma (13, 14), by means of which a matrix phase (30) with at least one nanoscalar interstitial phase (31) embedded therein is deposited on the substrate (16), with the aid of the introduction of a material. Preferably, a plurality of temporally correlated or synchronised pulsed plasma sources (11, 12) is used. The invention also relates to a nanostructured functional coating (17), produced in particular according to said method, which is devoid of chlorine and/or sulphur and contains at least one metal and/or at least one element selected from the group comprising oxygen, hydrogen, nitrogen, carbon, helium, argon and neon.
摘要翻译：它提出了一种用于制造纳米结构，在基板（16）上的特定的类陶瓷功能性涂层（17）的方法。为此，用至少一个等离子体源（11，12）的脉冲等离子体（13，14）产生通过材料入口沉积与基底（16）上的基体相（30）和至少一个嵌入其中的纳米级掺入相（31），多个时间优选相关的或者被一个同步（11，12）使用另一种脉冲等离子体源。另外，纳米结构化的，特别是可以通过该方法生产的功能性涂层（17），提出了不含氯和/或硫的，和至少一种金属和/或选自氧，氢，氮，碳，氦中的至少一种元素，含有氩，氖。

5. 发明申请

WO2006029747A2 CUTTING TOOL WITH OXIDE COATING 审中-公开
标题翻译： WITH氧化物涂层刀具
公开(公告)号：WO2006029747A2
公开(公告)日：2006-03-23
申请号：PCT/EP2005009595
申请日：2005-09-07
申请人： WALTER AG , SCHIER VEIT
发明人： SCHIER VEIT
IPC分类号： C23C30/00 , C23C14/08 , C23C16/40
CPC分类号： C23C14/08 , C23C30/005
摘要： Cutting tools are provided with a coating by means of the PVD process, which is a single-phase ternary or more complex oxide. By suitable fixing of the atom percentages of the main components and the trace components concerned, the stress in the oxide may be specifically controlled and used to influence the properties thereof. The coating may alternatively be an amorphous matrix phase and comprise oxide crystallites embedded therein. The oxide crystallites may be binary, ternary, or more complex. One or more different crystallite types may exist adjacent to each other.
摘要翻译：在PVD工艺切削工具设置有其为单相的三元或更复杂的氧化物的层。由beiteiligten主要组分和次要组分的原子百分比的合适定义参与形成能够选择性地控制和利用，以影响其特性的氧化物的张力。可替代地，该层可以具有嵌入在其中的无定形基质相和氧化微晶。氧化物晶体可以是二元，三元或络合物。它可以共存于一个或多个不同Kristallitsorten。

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