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1. 发明申请

WO2010110535A2 REFLECTANCE DISTRIBUTION CURVE MODELING METHOD, THICKNESS MEASUREMENT SCHEME AND THICKNESS MEASUREMENT REFLECTOMETER USING SAME 审中-公开
标题翻译：反射分布曲线建模方法，厚度测量方案和厚度测量反射计使用相同
公开(公告)号：WO2010110535A2
公开(公告)日：2010-09-30
申请号：PCT/KR2010001131
申请日：2010-02-26
申请人： SNU PRECISION CO LTD , PAHK HEUI JAE , AHN WOO JUNG , KIM SEONG RYONG
发明人： PAHK HEUI JAE , AHN WOO JUNG , KIM SEONG RYONG
IPC分类号： G01B11/06 , H01L21/66
CPC分类号： G01B11/0625
摘要： The reflectance distribution curve modeling method of the present invention is for modeling a reflectance distribution of a thin film layer according to a change in the wavelength of light with respect to a thin film layer having a uniform thickness, and comprises: a reflectance distribution curve preparation step whereby a reflectance distribution curve is prepared to represent reflectance distribution of the thin film layer according to a change in wavelength of light; an input intensity setting step whereby an intensity distribution curve is prepared to represent intensity of light in a certain wavelength band around a specific wavelength for which white light was band-passed, and then the intensity distribution curve is integrated within the wavelength band to set as an input intensity of the specific wavelength; an output intensity setting step whereby a combined intensity distribution curve of the reflectance and intensity distribution curves is integrated within the wavelength band to set an output intensity of the specific wavelength; an integrated reflectance setting step whereby a value obtained by dividing the output intensity of the specific wavelength by the input intensity of the specific wavelength is set as an integration reflectance of the thin film layer for the specific wavelength; and an integration reflectance distribution curve generating step whereby an integration reflectance distribution curve for reflecting the integration reflectance distribution according to a change in wavelength is generated by repeating the input intensity setting step, the output intensity setting step and the integration reflectance setting step, while changing the specific wavelength.
摘要翻译：本发明的反射率分布曲线建模方法用于根据光的波长相对于具有均匀厚度的薄膜层的变化来模拟薄膜层的反射率分布，并且包括：反射率分布曲线制备根据光的波长变化制备反射率分布曲线以表示薄膜层的反射率分布的步骤; 输入强度设定步骤，其中准备强度分布曲线以表示白光被带通的特定波长周围的特定波长带中的光的强度，然后将该强度分布曲线积分在该波长带内以设定为该特定波长的输入强度; 输出强度设定步骤，由此将所述反射率和强度分布曲线的组合强度分布曲线积分在所述波段内，以设定所述特定波长的输出强度; 积分反射率设定步骤，通过将特定波长的输出强度除以特定波长的输入强度而获得的值设定为特定波长的薄膜层的积分反射率; 以及积分反射率分布曲线生成步骤，通过反复进行输入强度设定步骤，输出强度设定步骤和积分反射率设定步骤，生成用于反映与波长的变化对应的积分反射率分布的积分反射率分布曲线特定的波长。

2. 发明申请

WO2012141544A3 INTERFEROMETER FOR TSV MEASUREMENT AND MEASUREMENT METHOD USING SAME 审中-公开
标题翻译：用于TSV测量的干涉仪和使用相同的测量方法
公开(公告)号：WO2012141544A3
公开(公告)日：2013-01-10
申请号：PCT/KR2012002843
申请日：2012-04-13
申请人： SNU PRECISION CO LTD , LEE KI HUN , SHIN HEUNG HYUN , PAHK HEUI JAE
发明人： LEE KI HUN , SHIN HEUNG HYUN , PAHK HEUI JAE
IPC分类号： H01L21/66
CPC分类号： G01B11/24 , G01B2210/56 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention relates to an interferometer for TSV measurement and a measurement method using the same, and according to the present invention, an interferometer for TSV measurement comprises: a beam splitter on which the light generated from a light source is incident and is divided and outputted in a first direction and a second direction that are vertical to each other, and which combines lights inputted from said first direction and said second direction and outputs a combined light; a measuring object having mirrors and at least one TSV, wherein the mirrors are respectively disposed in said first direction or said second direction and reflect, to said beam splitter, the outputted light which is outputted from said beam splitter after the light has been inputted; an imaging means which receives the combined light that is reflected from said mirrors and said measuring object and is outputted from said beam splitter, and forms an interference signal through said combined light; an object lens which is positioned between said beam splitter and said imaging means, or is positioned between said beam splitter and said measuring object; and a variable field stop which is positioned between said beam splitter and said imaging means, so that the focus of the lights divided on said measuring object can be adjusted to a reference position, which is the entrance of said TSV, and to a variable position, which is the bottom surface of said TSV, thereby measuring a diameter and a depth of a via hole on the basis of an interference signal at said reference position and the interference signal at said variable position. Thus, the invention provides the interferometer for TSV measurement and the measurement method using the same, in which: the diameter and the depth of the TSV are measured by using the variable field stop for adjusting the focus of the lights to the entrance and the bottom surface of the TSV during TSV measurement, thereby reducing measurement time and a capacity of result data; and a telecentric lens, which enables the light incident on the TSV to substantially become a straight light, is used such that the intensity of radiation can reach the bottom surface even though an aspect ratio like TSV is large, whereby the measurement accuracy is improved.
摘要翻译：本发明涉及一种用于TSV测量的干涉仪和使用该干涉仪的测量方法，根据本发明，用于TSV测量的干涉仪包括：分束器，从光源产生的光入射到其上并被分割; 在彼此垂直的第一方向和第二方向上输出，并且组合从所述第一方向和所述第二方向输入的光，并输出组合的光; 具有反射镜和至少一个TSV的测量对象，其中所述反射镜分别设置在所述第一方向或所述第二方向上，并且在输入光之后将从所述分束器输出的输出光反射到所述分束器; 接收从所述反射镜和所述测量对象反射并从所述分束器输出的组合光的成像装置，并通过所述组合光形成干涉信号; 位于所述分束器和所述成像装置之间或位于所述分束器和所述测量对象之间的物镜; 以及位于所述分束器和所述成像装置之间的可变场停止件，使得可以将分配在所述测量对象上的光的焦点调整到作为所述TSV的入口的参考位置和可变位置，其是所述TSV的底表面，由此基于所述参考位置处的干扰信号和所述可变位置处的干扰信号来测量通孔的直径和深度。因此，本发明提供了用于TSV测量的干涉仪和使用该干涉仪的测量方法，其中：通过使用用于将光的焦点调节到入口和底部的可变场停止来测量TSV的直径和深度在TSV测量期间TSV的表面，从而减少测量时间和结果数据的容量; 并且使用能够使入射在TSV上的光基本上变成直线光的远心透镜，使得尽管诸如TSV的纵横比较大，辐射的强度可以到达底面，从而提高了测量精度。

3. 发明申请

WO2011043566A3 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE 审中-公开
标题翻译：装置和处理基板的方法
公开(公告)号：WO2011043566A3
公开(公告)日：2011-11-03
申请号：PCT/KR2010006749
申请日：2010-10-04
申请人： SNU PRECISION CO LTD , BAK BYEONG-MIN , GONG DOO WON , SON SUNG KWAN , CHO WHANG SIN , JUNG SUNG JAE , PAHK HEUI JAE
发明人： BAK BYEONG-MIN , GONG DOO WON , SON SUNG KWAN , CHO WHANG SIN , JUNG SUNG JAE , PAHK HEUI JAE
IPC分类号： H01L21/20 , H01L31/042
CPC分类号： H01L21/6776 , C23C16/4401 , C23C16/4411 , C23C16/45563 , C23C16/4557 , C23C16/54 , H01L21/6715
摘要： There is provided a substrate processing apparatus and method capable of preventing the substrate from being heated and efficiently collecting residual deposition material. The substrate processing apparatus includes a chamber unit including an inner space divided into an introduction section, a film formation section, and a discharge section, at least one material injection nozzle unit disposed in the film formation section of the chamber unit to inject a deposition material to a substrate being transferred, and a cooling plate unit disposed to surround the film formation section of the chamber unit and adapted to cool inside of the film formation section. In addition, the substrate processing apparatus further includes at least one cold trap unit disposed at a lower part of the material injection nozzle unit to collect residual deposition material not deposited on the substrate but left from the whole deposition material injected from the material injection nozzle unit.
摘要翻译：提供了能够防止基板被加热并有效地收集残留沉积材料的基板处理装置和方法。基板处理装置包括：室单元，包括分为导入部，成膜部和排出部的内部空间;至少一个注入喷嘴单元，设置在室单元的成膜部中，以将沉积材料到被转印的基板，以及冷却板单元，设置成围绕室单元的成膜部分并且适于在成膜部分内部冷却。此外，基板处理装置还包括至少一个冷阱单元，其设置在材料注入喷嘴单元的下部，以收集未沉积在基板上但留在从材料注入喷嘴单元注入的整个沉积材料的残留沉积材料。

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