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    • 3. 发明申请
    • METHOD FOR PRODUCING FILMLIKE SEMICONDUCTOR MATERIALS AND/OR ELECTRONIC ELEMENTS BY PRIMARY FORMING AND/OR COATING
    • PROCESS FOR通过模制和/或涂覆PRODUCING膜状半导体材料和/或电子部件
    • WO2009000608A2
    • 2008-12-31
    • PCT/EP2008056693
    • 2008-05-30
    • EVONIK DEGUSSA GMBHTROCHA MARTINSCHMITZ GEORG-JFRANKE DIETERBAEHR THOMASTIEFERS RUEDIGERREX STEPHANAPEL MARKUS
    • TROCHA MARTINSCHMITZ GEORG-JFRANKE DIETERBAEHR THOMASTIEFERS RUEDIGERREX STEPHANAPEL MARKUS
    • B81C99/00H01L21/208
    • H01L21/02601H01L21/0242H01L21/02422H01L21/02439H01L21/0245H01L21/02532H01L21/02628H01L31/03921Y02E10/50
    • The present invention relates to a production method for filmlike semiconductor materials and/or electronic elements by primary forming and/or coating. A characteristic feature of the method is the application of a size composed of nanoscale, system-inherent substances on the surface of the substrate to be coated or on the surface of the mould used in the primary forming method. Said size enables a filmlike semiconductor material to be released more simply from the substrate after the primary forming or coating process, reduces reactions with the substrate or mould material and hence contamination of the semiconductor material and reduces the heat transfer from the semiconductor material into the substrate with possibly advantageous effects on the microstructure of the semiconductor material, in particular its average grain size. In an advantageous configuration of the invention, the size is used not just with regard to better releasability from the substrate and reduced contamination of the semiconductor material but can furthermore be used in a targeted manner for producing a dopant pattern in the semiconductor material. For this purpose, at least two sizes having different dopant contents are applied to the substrate in a defined pattern. These dopant patterns are transferred during the primary forming and/or coating process by diffusion into the semiconductor material.
    • 本发明涉及一种用于片状半导体材料和/或通过模制和/或涂层的电子元件的制造方法。 该方法的特征是从纳米级应用的尺寸,衬底的表面上的物质的全身待涂覆或在成型方法中使用的模具的表面上。 这允许上浆与衬底或从基材上的片状半导体材料的一次成型或涂覆过程之后容易释放,减少的反应。 模具材料,从而所述半导体材料的污染,并减少了从半导体材料中的热量传递到衬底,如果需要,与有益效果aufdie微观结构的半导体材料的,特别是其平均晶粒尺寸。 在本发明的一个有利的实施方案中,上浆不仅术语aufeine从衬底和所使用的半导体材料的污染少更好的可除去性,但可以另外被使用,专门用于在半导体材料中产生一个Dotierstoffmusters。 为了这个目的,在所述基板上的定义的模式具有不同Dotierstoffgehalten至少两个尺寸被应用。 此Dotierstoffmuster通过扩散的主整形和/或涂层工艺期间被转移到半导体材料中。
    • 4. 发明申请
    • CARBONYL-SUBSTITUTED TITANOCENES
    • 羰基取代茂钛
    • WO2008059068A3
    • 2008-07-31
    • PCT/EP2007062511
    • 2007-11-19
    • CHARITE UNIVERSITAETSMEDIZINUNIV BONNPROKOP ARAMSELIG ANJAGANSAEUER ANDREASFRANKE DIETER
    • PROKOP ARAMSELIG ANJAGANSAEUER ANDREASFRANKE DIETER
    • A61K31/28A61K31/7008A61P31/04A61P31/10A61P31/12A61P33/02A61P33/10A61P35/00A61P35/02C07F17/00
    • A61K31/28A61K31/7008C07F17/00A61K2300/00
    • Disclosed is a medicament containing a compound of formula (Ia) or (Ib), wherein Z is selected from among a group comprising a covalent bond, at least one at least bivalent heteroatom, a saturated, unsaturated, branched, linear and/or cyclic, substituted or unsubstituted hydrocarbon chain, a saturated or unsaturated, branched, linear and/or cyclic, substituted or unsubstituted hydrocarbon chain containing heteroatoms, or combinations thereof, R `1 to R `4 and R ``1 to R ``5 each independently represents H, at least one heteroatom, a saturated, unsaturated, branched, linear and/or cyclic, substituted or unsubstituted hydrocarbon chain, a saturated or unsaturated, branched, linear and/or cyclic, substituted or unsubstituted hydrocarbon chain containing heteroatoms, or combinations thereof, the cyclopentadienyl rings are optionally linked by means of any of the radicals R ``1 to R ``5 , R 1 and R 2 independently represent H, a heteroatom, a saturated, unsaturated, branched, linear and/or cyclic, substituted or unsubstituted hydrocarbon chain, a saturated or unsaturated, branched, linear and/or cyclic, substituted or unsubstituted hydrocarbon chain containing heteroatoms, or combinations thereof, A`, A`` independently represent F, Cl, BR, I, and/or a physically acceptable acid radical of an organic or inorganic acid, n represents a positive integer, particularly 1, 2, 3, X = O, S, NH, NR 3 , NR 4 R 5 , wherein R 3 , R 4 , and R 5 independently have the meanings indicated for R` 1 to R` 4 , Y = a covalent bond, O, S, or NR 6 , wherein R 6 has the meaning indicated for R `1 to R `4 .
    • 含有其中Z选自共价键组成的组中的下式(Ia)或(Ib)的化合物的药物,至少一种至少二价的杂原子,饱和的,不饱和的,支链的,无支链和/或环状的,取代或未取代的烃链 在链中或提供的一个具有杂原子的,饱和或不饱和的,支链的,无支链和/或环状的,取代或未取代的烃链,或它们的组合,R `1 至R `4 ,和 [R ``1 至R ``5 各自独立地为H,至少一个杂原子,饱和的,不饱和的,支链的,无支链和/或环状的,取代或未取代的烃链, 设置有在链中杂原子,饱和或不饱和的,支链的,无支链和/或环状的,取代或未取代的 平均烃链,或它们的组合,这两个环戊二烯基环`5 是任选的任何的R ``1 至R `联,R 1 和 [R 2 各自独立地是H,杂原子,饱和的,不饱和的,支链的,无支链和/或环状的,取代或未取代的烃链,设置有在链中的杂原子的,饱和或不饱和的,支链的,无支链和 意味着/或环状的,取代或未取代的烃链或它们的组合,A`,A``,F,氯,溴,I,和/或有机或无机酸的生理学可接受的酸残基是在每一情况下彼此独立地,n是一个正整数 ,尤其是1,2,3,X = O,S,NH,NR 3 ,NR 4 - [R 5 ,其中R < SUP> 3 ,R 4 和R 5 各自独立于R 1 至R `4 ,Y =共价键,O,S,或NR 6 ,其中R 6 的 [R `1 至R `4 如上所定义。