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    • 6. 发明申请
    • BIOGAS MEASURING DEVICE FOR USE IN A BIOGAS PLANT
    • 用于生物工厂的BIOGAS测量装置
    • WO2011110443A1
    • 2011-09-15
    • PCT/EP2011/052969
    • 2011-03-01
    • ENDRESS+HAUSER CONDUCTA GESELLSCHAFT FÜR MESS- UND REGELTECHNIK MBH+CO. KGENDRESS+HAUSER (M) SDN. BHD.ANDREAS, NilsSCHMIDT, MartinSEITZ, StefanTRIETSCH, Frieso
    • ANDREAS, NilsSCHMIDT, MartinSEITZ, StefanTRIETSCH, Frieso
    • G01N33/00
    • G01F1/74G01N33/225
    • A measuring device for use in a biogas plant, comprises: - a gas analyzer with a gas feed line for feeding a portion of a gas mixture flowing in a pipe of said biogas plant to said gas analyzer, said gas mixture comprising at least two gas components, wherein the gas analyzer is configured to determine a measured value representing a fraction of at least one gas component in said portion of said gas mixture, in particular one of a concentration, a volume fraction, a mass fraction or a partial pressure of said at least one gas component in said portion of said gas mixture, and - a computation unit connected to the gas analyzer, wherein said computation unit is configured to receive said measured value provided by the gas analyzer, wherein said computation unit further comprises a first communication interface for receiving at least an additional measured value correlated with a flow rate of the gas mixture in the pipe, said computation unit being configured to derive from said additional measured value correlated with the flow rate and from said measured value provided by said gas analyzer a volume flow or a mass flow of said at least one gas component of the gas mixture in the pipe.
    • 一种用于沼气设备的测量装置,包括: - 气体分析器,具有用于将在所述沼气工厂的管道中流动的一部分气体混合物供给到所述气体分析器的气体供给管线,所述气体混合物包括至少两个气体 组分,其中所述气体分析器被配置为确定表示所述气体混合物的所述部分中的至少一种气体组分的分数的测量值,特别是所述气体混合物的浓度,体积分数,质量分数或分压 在所述气体混合物的所述部分中的至少一种气体成分,以及 - 连接到所述气体分析器的计算单元,其中所述计算单元被配置为接收由所述气体分析器提供的所述测量值,其中所述计算单元还包括第一通信 接口,用于接收与所述管道中的所述气体混合物的流量相关的至少另外的测量值,所述计算单元被配置为从所述加法 l与流量相关的测量值和由所述气体分析仪提供的所述测量值,所述管道中气体混合物的所述至少一种气体组分的体积流量或质量流量。
    • 7. 发明申请
    • FLUID PATHS IN ETCHABLE MATERIALS
    • 可蚀性材料中的流体状态
    • WO2008067206A2
    • 2008-06-05
    • PCT/US2007/085086
    • 2007-11-19
    • BIOSCALE, INC.MILLER, MichaelMASTERS, Brett, P.SCHMIDT, Martin
    • MILLER, MichaelMASTERS, Brett, P.SCHMIDT, Martin
    • B81C1/00
    • B81C1/00714B81B2201/058B81B2203/033B81C2201/0112
    • The invention relates to fluid paths in etchable materials. Fluid paths are formed by forming a cavity through a substrate material with a first dry removal process to produce a first surface of the cavity. The first surface of the cavity is associated with a first roughness. The first surface of the cavity is etched with a second wet removal process to reduce the first roughness and produce a second roughness associated with the first surface of the cavity. A coating is applied to the first surface of the cavity to produce a second surface to improve wettability of the first or second surface of the cavity, reduce in size or number gas nucleation sites in the first or second surface of the cavity, reduce the amount of debris associated with the first roughness carried by the fluid flow, and/or improve hydrophilicity of the first or second surface.
    • 本发明涉及可蚀刻材料中的流体路径。 通过用第一干燥去除工艺通过基底材料形成空腔来形成流体路径,以产生空腔的第一表面。 空腔的第一表面与第一粗糙度相关联。 通过第二湿去除工艺蚀刻空腔的第一表面,以减少第一粗糙度并产生与空腔的第一表面相关联的第二粗糙度。 将涂层施加到空腔的第一表面以产生第二表面以改善空腔的第一或第二表面的润湿性,减小空腔的第一或第二表面中的气体成核位置的尺寸或数量,减少量 与由流体流动携带的第一粗糙度相关联的碎屑和/或改善第一或第二表面的亲水性。