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    • 2. 发明申请
    • DUAL PHOTO-DIODE CMOS PIXELS
    • 双光电二极管CMOS像素
    • WO2009103048A1
    • 2009-08-20
    • PCT/US2009/034211
    • 2009-02-16
    • QUANTUM SEMICONDUCTOR LLC
    • AUGUSTO, Carlos
    • H01L27/146
    • H01L27/14689H01L27/14603H01L27/14609H01L27/14647
    • The present invention provides a method of forming CMOS pixels, with the light-sensing region comprising vertically aligned dual photo-diodes, in which the bottom photo-diode is formed either by a well-to-substrate junction, or by a deep-well-to-substrate junction, wherein said well and deep-well are independently biased from surrounding wells and deep-wells of the same polarity. Said independently biased well is a common region to the top and bottom photo-diodes and overlaps the source/drain region of a MOSFET formed on a well with the opposite polarity, that of the substrate. The photo-diodes can be electrically connected in parallel, or the top photo- diode can be biased separately from the bottom photo-diode, said bias can be such that avalanche mode operation is possible, including the single-photon detection (Geiger) mode.
    • 本发明提供了一种形成CMOS像素的方法,其中光感测区域包括垂直对准的双光电二极管,其中底部光电二极管由阱到衬底结或由深阱形成 其中所述阱和深阱独立地偏置于相同极性的周围阱和深阱。 所述独立偏置井是顶部和底部光电二极管的公共区域,并且与形成在具有相反极性的衬底的阱的MOSFET的源极/漏极区域重叠。 光电二极管可以并联电连接,或者顶部光电二极管可以与底部光电二极管分开偏置,所述偏置可以使得雪崩模式操作是可能的,包括单光子检测(盖革)模式 。