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    • 6. 发明申请
    • MICROELECTROMECHANICAL DEVICE AND METHOD UTILIZING CONDUCTING LAYERS SEPARATED BY STOPS
    • 利用导电层分离导电层的微电子机械装置和方法
    • WO2008121543A2
    • 2008-10-09
    • PCT/US2008/057273
    • 2008-03-17
    • QUALCOMM MEMS TECHNOLOGIES, INC.KOGUT, LiorTUNG, Ming-Hau
    • KOGUT, LiorTUNG, Ming-Hau
    • B81B3/00G02B26/00
    • B81B3/001B81B2201/047G02B26/001G02B26/0841Y10T29/49002
    • A microelectromechanical system (MEMS) device includes a reflective element that includes at least one stop member. The device also includes an electrode and an aperture that extends at least partially through the electrode. The aperture has a boundary. The device has an electrically nonconductive surface within the aperture or on a portion of the boundary of the aperture. A support structure separates the reflective element from the electrode. The reflective element can be moved between a first position and a second position. The stop member is spaced from the electrically nonconductive surface when the reflective element is in the first position. A portion of the stop member is in contact with the electrically nonconductive surface when the reflective element is in the second position. The reflective element and the electrode are electrically isolated from each other when the reflective element is in the second position.
    • 微电子机械系统(MEMS)装置包括反射元件,该反射元件包括至少一个止动构件。 该装置还包括电极和至少部分延伸穿过电极的孔。 光圈有一个边界。 该装置在孔内或孔的边界的一部分上具有非导电表面。 支撑结构将反射元件与电极分开。 反射元件可以在第一位置和第二位置之间移动。 当反射元件处于第一位置时,止动构件与不导电表面间隔开。 当反射元件处于第二位置时,止动构件的一部分与不导电表面接触。 当反射元件处于第二位置时,反射元件和电极彼此电隔离。
    • 10. 发明申请
    • NON-PLANAR SURFACE STRUCTURES AND PROCESS FOR MICROELECTROMECHANICAL SYSTEMS
    • 微电子机械系统的非平面表面结构与工艺
    • WO2007126844A2
    • 2007-11-08
    • PCT/US2007/007613
    • 2007-03-27
    • QUALCOMM INCORPORATEDTUNG, Ming-HauAKELLA, SriramCUMMINGS, William, J.KOGUT, Lior
    • TUNG, Ming-HauAKELLA, SriramCUMMINGS, William, J.KOGUT, Lior
    • B81C1/00
    • B81B3/0008G02B26/001
    • Methods of making MEMS devices including interferometric modulators involve depositing various layers, including stationary layers, movable layers and sacrificial layers, on a substrate. Apertures are formed in one or more of the various layers so as to form a non-planar surface on the movable and/or the stationary layers. Other layers may be formed over the formed apertures. Removal of the sacrificial layer from between the resulting non-planar movable and/or stationary layers results in a released MEMS device having reduced contact area and/or a larger surface separation between the movable and stationary layers when the MEMS device is actuated. The reduced contact area results in lower adhesion forces and reduced stiction during actuation of the MEMS device. These methods may be used to manufacture released and unreleased interferometric modulators.
    • 制造包括干涉式调制器的MEMS器件的方法涉及在衬底上沉积各种层,包括固定层,可移动层和牺牲层。 在各个层中的一个或多个层中形成孔以便在可移动层和/或固定层上形成非平面表面。 其他层可以形成在所形成的孔之上。 从所得非平面可移动层和/或静止层之间移除牺牲层导致当MEMS器件被致动时释放的MEMS器件具有减小的接触面积和/或可移动层和固定层之间的更大表面分离。 减小的接触面积在MEMS装置的致动期间导致较低的粘合力和降低的静摩擦。 这些方法可用于制造释放和未释放的干涉式调制器。