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    • 2. 发明申请
    • METHOD OF PATTERNING PILLARS
    • 图案方法
    • WO2015061096A1
    • 2015-04-30
    • PCT/US2014/060658
    • 2014-10-15
    • QUALCOMM MEMS TECHNOLOGIES, INC.
    • HONG, Brandon JohnMA, JianHONG, John HyunchulWEN, BingCHANG, Tallis Young
    • B81C1/00
    • C01B33/113B81C1/00031G02B5/00
    • The disclosed technology relates to methods of patterning elongated structures. In one aspect, a method of forming pillars includes providing a substrate and providing a plurality of beads on a surface of the substrate. Regions of the surface without a directly overlying bead are exposed. The method additionally includes selectively etching the exposed regions of the substrate between the beads such that a plurality of pillars is formed under areas masked by the beads. Selectively etching completely removes at least some of the beads. The pillars that are not covered by beads are etched, thereby leaving some pillars taller than others, with the pillar height pending on the amount of time a pillar was left exposed to etchant by a removed bead.
    • 所公开的技术涉及图案化细长结构的方法。 一方面,形成支柱的方法包括提供基底并在基底的表面上提供多个珠粒。 暴露出没有直接覆盖珠的表面区域。 该方法还包括选择性地蚀刻珠之间的衬底的暴露区域,使得多个柱形成在由珠掩蔽的区域之下。 选择性蚀刻完全除去珠粒中的至少一些。 没有被珠子覆盖的柱子被蚀刻,从而留下一些比其他柱子更高的柱子,其中柱子高度等待通过移除的珠子将柱子暴露于蚀刻剂的时间量。
    • 5. 发明申请
    • SYSTEM AND METHOD FOR MEASURING A DISTANCE
    • 用于测量距离的系统和方法
    • WO2012094146A1
    • 2012-07-12
    • PCT/US2011/066234
    • 2011-12-20
    • QUALCOMM MEMS TECHNOLOGIES, INC.HONG, John, H.MA, JianCHANG, Tallis, Y.
    • HONG, John, H.MA, JianCHANG, Tallis, Y.
    • G02B26/00G01B11/14G09G3/34B81C99/00
    • G02B26/001G01B9/02007G01B9/02014G01B9/02019G01B9/02027G01B9/02057G01B11/14G01B2290/25G09G3/006G09G3/3466
    • This disclosure provides systems, methods and apparatus, including computer programs encoded on computer storage media, for measuring a distance. In one aspect, the method includes actuating or releasing an interferometric modulator having a first surface and a second surface and measuring a distance between the first and second surfaces at a plurality of times during the actuation or release. In another aspect, the method includes illuminating, with a first laser beam having a first wavelength and with a second laser beam having a second wavelength different from the first wavelength, an interferometric modulator having a distance between a first surface which is at least partially reflective and a second surface which is at least partially absorptive, measuring a first intensity of the first laser beam modulated by the interferometric modulator and a second intensity of the second laser beam modulated by the interferometric modulator, and determining the distance based on the measured intensities.
    • 本公开提供了用于测量距离的系统,方法和装置,包括在计算机存储介质上编码的计算机程序。 一方面,该方法包括致动或释放具有第一表面和第二表面的干涉式调制器,并且在致动或释放期间多次测量第一和第二表面之间的距离。 在另一方面,该方法包括用具有第一波长的第一激光束和具有不同于第一波长的第二波长的第二激光束照射干涉式调制器,该调制器具有至少部分反射的第一表面之间的距离 以及第二表面,其至少部分地吸收,测量由所述干涉式调制器调制的所述第一激光束的第一强度和由所述干涉式调制器调制的所述第二激光束的第二强度,以及基于所测量的强度来确定所述距离。