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1. 发明申请

WO2007096463A2 ELEMENT 审中-公开
标题翻译：元件
公开(公告)号：WO2007096463A2
公开(公告)日：2007-08-30
申请号：PCT/FI2007/000048
申请日：2007-02-23
申请人： PICODEON LTD OY , LAPPALAINEN, Reijo , RUUTTU, Jari , MYLLYMÄKI, Vesa , YLÄTALO, Sampo , MÄKITALO, Juha , PULLI, Lasse
发明人： LAPPALAINEN, Reijo , RUUTTU, Jari , MYLLYMÄKI, Vesa , YLÄTALO, Sampo , MÄKITALO, Juha , PULLI, Lasse
CPC分类号： C23C14/28 , B23K26/0624 , B23K26/1224 , B23K26/123 , B23K26/142 , B23K26/702 , B23K2201/40 , B23K2203/16 , F25B21/02 , H01L35/28 , H01L2924/0002 , H01L2924/00
摘要： The invention discloses an element, a manufacturing method and equipment for it, and a use of the element, the element comprising an electrically conductive filmy structure formed of at least one film material for producing a thermal effect in the filmy structure with the help of an electric current.
摘要翻译：本发明公开了一种元件，其制造方法和设备以及该元件的用途，该元件包括由至少一种薄膜材料形成的导电薄膜结构，用于在在电流帮助下的薄膜结构。

2. 发明申请

WO2008102062A3 METHOD AND ARRANGEMENT FOR PHOTON ABLATION OF A TARGET 审中-公开
公开(公告)号：WO2008102062A3
公开(公告)日：2008-08-28
申请号：PCT/FI2008/050083
申请日：2008-02-22
申请人： PICODEON LTD OY , RUUTTU, Jari , MYLLYMÄKI, Vesa , LAPPALAINEN, Reijo , PULLI, Lasse , MÄKITALO, Juha , YLÄTALO, Sampo
发明人： RUUTTU, Jari , MYLLYMÄKI, Vesa , LAPPALAINEN, Reijo , PULLI, Lasse , MÄKITALO, Juha , YLÄTALO, Sampo
IPC分类号： C23C14/28 , H01J37/32 , B23K26/02
摘要： The invention relates in general level to radiation transference techniques as applied for utilisation of material handling. The invention relates to a radiation source arrangement comprising a path of radiation transference, or an improved path of radiation transference, which path comprises a scanner or an improved scanner. The invention also concerns a target material suitable for vaporization and/or ablation. The invention concerns an improved scanner. The invention concerns also to a vacuum vaporization/ablation arrangement that has a radiation source arrangement according to invention. The invention concerns also a target material unit, to be used in coating and/or manufacturing target material.

3. 发明申请

WO2007104831A1 IGNITER, FUEL AND REACTOR 审中-公开
标题翻译： IGNITER，燃料和反应堆
公开(公告)号：WO2007104831A1
公开(公告)日：2007-09-20
申请号：PCT/FI2007/000063
申请日：2007-03-14
申请人： PICODEON LTD OY , LAPPALAINEN, Reijo , PULLI, Lasse , MÄKITALO, Juha , YLÄTALO, Sampo , MYLLYMÄKI, Vesa
发明人： LAPPALAINEN, Reijo , PULLI, Lasse , MÄKITALO, Juha , YLÄTALO, Sampo , MYLLYMÄKI, Vesa
IPC分类号： G21B1/00 , G21B3/00
CPC分类号： G21B1/00 , G21B1/057 , Y02E30/128
摘要： The invention discloses an igniter, a fuel, and a reactor in which the former two can be used in order to achieve a fuel reaction. The igniter arrangement comprises an electromagnetic holder means (101) to hold, in a non-contacting manner, a reactant (104) in the reaction volume of the igniter, a temperature regulating means (102) for controlling the temperature of the reactant (104), and a radiation means (103) for radiating the reactant in order to initiate a reaction in the said reaction volume. The reactor includes an igniter arrangement for initiating a nuclear reaction in a reactant in a reaction volume of the reactor, a feeding means (201) for feeding a nuclear fuel into the said reaction volume, and a heat exchanger arrangement (202) for transmitting heat out of the reaction volume. The invention also discloses an arrangement for controlling a reaction.
摘要翻译：本发明公开了一种点火器，燃料和反应器，其中前者可用于实现燃料反应。点火器装置包括电磁保持器装置（101），其以非接触的方式保持点火器的反应体积中的反应物（104），用于控制反应物（104）的温度的温度调节装置（102））和用于辐射反应物以便引发所述反应体积中的反应的辐射装置（103）。反应器包括用于在反应器的反应体积中的反应物中引发核反应的点火装置，用于将核燃料进料到所述反应体积中的进料装置（201）和用于传递热量的热交换器装置超出反应体积。本发明还公开了一种用于控制反应的装置。

4. 发明申请

WO2007096485A3 COATING ON A METAL SUBSTRATE AND A COATED METAL PRODUCT 审中-公开
公开(公告)号：WO2007096485A3
公开(公告)日：2007-08-30
申请号：PCT/FI2007/050106
申请日：2007-02-23
申请人： PICODEON LTD OY , RUUTTU, Jari , MYLLYMÄKI, Vesa , LAPPALAINEN, Reijo , PULLI, Lasse , MÄKITALO, Juha
发明人： RUUTTU, Jari , MYLLYMÄKI, Vesa , LAPPALAINEN, Reijo , PULLI, Lasse , MÄKITALO, Juha
IPC分类号： B23K26/06 , C23C14/28
摘要： The invention relates in general level to a method for coating metal products comprising large surface areas. The invention also relates to coat metal products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner comprising at least one mirror for reflecting said laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, excellent coating properties and overall low manufacturing costs.

5. 发明申请

WO2007116124A1 METHOD FOR ADJUSTING ABLATION THRESHOLD 审中-公开
标题翻译：调整阈值的方法
公开(公告)号：WO2007116124A1
公开(公告)日：2007-10-18
申请号：PCT/FI2007/000094
申请日：2007-04-12
申请人： PICODEON LTD OY , LAPPALAINEN, Reijo , RUUTTU, Jari , MYLLYMÄKI, Vesa , MÄKITALO, Juha , PULLI, Lasse
发明人： LAPPALAINEN, Reijo , RUUTTU, Jari , MYLLYMÄKI, Vesa , MÄKITALO, Juha , PULLI, Lasse
IPC分类号： B23K26/42
CPC分类号： B23K26/364 , H01L2924/0002 , H01L2924/00
摘要： The invention pertains to a method for lowering the ablation threshold of a laser-ablated material by having on a surface of the laser-ablated material a structuring which reduces the reflection of a laser beam. The ablation threshold can be further lowered by heating the material as well as by chemically modifying the material or its surface, even slightly. The invention facilitates industrial implementation of machining of a number of various surfaces and materials. The invention also pertains to target materials to be ablated.
摘要翻译：本发明涉及通过在激光烧蚀材料的表面上具有减少激光束反射的结构的方式来降低激光烧蚀材料的消融阈值的方法。通过加热材料以及通过化学改变材料或其表面，甚至可以进一步降低烧蚀阈值。本发明有利于工业实施多种各种表面和材料的加工。本发明还涉及要消融的靶材料。

6. 发明申请

WO2007096483A2 COATING ON A STONE OR CERAMIC SUBSTRATE AND A COATED STONE OR CERAMIC PRODUCT 审中-公开
标题翻译：涂层在石材或陶瓷基材和涂层石材或陶瓷产品上
公开(公告)号：WO2007096483A2
公开(公告)日：2007-08-30
申请号：PCT/FI2007/050104
申请日：2007-02-23
申请人： PICODEON LTD OY , LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , RUUTTU, Jari , MÄKITALO, Juha
发明人： LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , RUUTTU, Jari , MÄKITALO, Juha
CPC分类号： C23C14/28 , B23K26/0821 , C23C14/20 , Y10T428/24355 , Y10T428/25 , Y10T428/256 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/273 , Y10T428/31678
摘要： The invention relates in general level to a method for coating stone or ceramic products comprising large surface areas. The invention also relates to coated stone or ceramic products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner comprising at least one mirror for reflecting said laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, low vacuum conditions accomplishing coating of said stone or ceramic products, excellent coating properties and overall low manufacturing costs.
摘要翻译：本发明一般涉及包括大表面积的石材或陶瓷制品的方法。本发明还涉及通过该方法制造的涂覆石或陶瓷产品。通过使用超短脉冲激光沉积来进行涂层，其中脉冲激光束用包括至少一个用于反射所述激光束的反射镜的旋转光学扫描仪扫描。本发明具有工业上和质量上有利的效果，例如高涂层生产速率，完成所述石材或陶瓷产品的涂覆的低真空条件，优异的涂层性能和总的低制造成本。

7. 发明申请

WO2007096465A1 METHOD FOR PRODUCING SURFACES AND MATERIALS BY LASER ABLATION 审中-公开
标题翻译：通过激光去除生产表面和材料的方法
公开(公告)号：WO2007096465A1
公开(公告)日：2007-08-30
申请号：PCT/FI2007/000050
申请日：2007-02-23
申请人： PICODEON LTD OY , LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , MÄKITALO, Juha
发明人： LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , MÄKITALO, Juha
IPC分类号： B23K26/36
CPC分类号： B23K26/12 , B23K26/1224 , B23K26/123 , B23K26/361 , C23C14/0611 , C23C14/081 , C23C14/083 , C23C14/086 , C23C14/087 , C23C14/28
摘要： The invention relates to a laser ablation coating method, where the laser ablation is carried out in a space with 10 -3 atmospheres at most. A low vacuum level enables an advantageous industrial production of surfaces without remarkably weakening the quality features of the deposited surfaces. The invention also relates to a method for producing nano particles, so that target material is ablated by pulse laser for generating nano particles in a space with 10 -3 atmospheres at most.
摘要翻译：本发明涉及激光烧蚀涂覆方法，其中激光烧蚀最多在具有10 -3个气氛的空间中进行。低真空度能够有利于工业生产表面，而不会显着削弱沉积表面的质量特征。本发明还涉及一种用于制造纳米颗粒的方法，使得目标材料通过脉冲激光烧蚀，以在最多具有10 -3个气氛的空间中产生纳米颗粒。

8. 发明申请

WO2007096460A2 SURFACE TREATMENT TECHNIQUE AND SURFACE TREATMENT APPARATUS ASSOCIATED WITH ABLATION TECHNOLOGY 审中-公开
标题翻译：表面处理技术与表面处理设备相关的技术
公开(公告)号：WO2007096460A2
公开(公告)日：2007-08-30
申请号：PCT/FI2007/000045
申请日：2007-02-23
申请人： PICODEON LTD OY , RUUTTU, Jari , LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , MÄKITALO, Juha
发明人： RUUTTU, Jari , LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , MÄKITALO, Juha
IPC分类号： B23K26/36 , G02B26/12 , G06K15/12
CPC分类号： B23K26/0084 , B23K26/0624 , B23K26/0821 , B23K26/364 , B23K2201/12
摘要： The invention relates to a surface-treatment technique in association with ablation, a surface-treatment apparatus and a turbine scanner. The invention also relates to a method of producing a coating, a radiation transmission line, a copying unit and a printing unit. The invention further relates to an arrangement for adjusting the radiation power of a radiation source in a radiation transmission line and a laser apparatus.
摘要翻译：本发明涉及与消融相结合的表面处理技术，表面处理装置和涡轮扫描仪。本发明还涉及一种制造涂层，辐射传输线，复印单元和印刷单元的方法。本发明还涉及一种用于调节辐射传输线和激光装置中的辐射源的辐射功率的装置。

9. 发明申请

WO2007096487A1 SEMICONDUCTOR AND AN ARRANGEMENT AND A METHOD FOR PRODUCING A SEMICONDUCTOR 审中-公开
标题翻译：半导体和布置方法以及制造半导体的方法
公开(公告)号：WO2007096487A1
公开(公告)日：2007-08-30
申请号：PCT/FI2007/050108
申请日：2007-02-23
申请人： PICODEON LTD OY , LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , RUUTTU, Jari , MÄKITALO, Juha
发明人： LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , RUUTTU, Jari , MÄKITALO, Juha
IPC分类号： C23C14/04 , C23C14/28 , B23K26/06
CPC分类号： C23C14/28 , B23K26/0821 , C23C14/20 , Y10T428/24355 , Y10T428/25 , Y10T428/256 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/273 , Y10T428/31678
摘要： The present invention relates generally to semiconductors, material layers within semiconductors, a production method of semiconductors, and a manufacturing arrangement for producing semiconductors. A semiconductor according to the invention comprises at least one layer with a surface, produced by laser ablation, wherein the uniform surface area to be produced comprises at least an area 0.2 dm 2 and the layer has been produced by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner comprising at least one mirror for reflecting said laser beam.
摘要翻译：本发明一般涉及半导体，半导体内的材料层，半导体的制造方法以及半导体的制造装置。根据本发明的半导体包括至少一个具有表面的层，通过激光烧蚀产生，其中要产生的均匀表面积包括至少一个面积为0.2dm 2的层，并且该层由采用超短脉冲激光沉积，其中用旋转光学扫描仪扫描脉冲激光束，所述旋转光学扫描器包括至少一个反射所述激光束的反射镜。

10. 发明申请

WO2007096481A1 COATING ON A GLASS SUBSTRATE AND A COATED GLASS PRODUCT 审中-公开
标题翻译：涂在玻璃基材和涂层玻璃制品上
公开(公告)号：WO2007096481A1
公开(公告)日：2007-08-30
申请号：PCT/FI2007/050102
申请日：2007-02-23
申请人： PICODEON LTD OY , LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , RUUTTU, Jari , MÄKITALO, Juha
发明人： LAPPALAINEN, Reijo , MYLLYMÄKI, Vesa , PULLI, Lasse , RUUTTU, Jari , MÄKITALO, Juha
IPC分类号： B23K26/06 , C23C14/04 , C23C14/28
CPC分类号： C23C14/28 , B23K26/0821 , C23C14/20 , Y10T428/24355 , Y10T428/25 , Y10T428/256 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/273 , Y10T428/31678
摘要： The invention relates in general level to a method for coating glass products comprising large surface areas. The invention also relates to coated glass products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner comprising at least one mirror for reflecting said laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, excellent coating properties and overall low manufacturing costs.
摘要翻译：本发明一般涉及包括大表面积的玻璃制品的涂覆方法。本发明还涉及通过该方法制造的涂覆玻璃制品。涂层通过采用超短脉冲激光沉积来进行，其中脉冲激光束用包括至少一个反射所述激光束的反射镜的旋转光学扫描器进行扫描。本发明具有工业上和质量上有利的效果，例如高涂层生产率，优异的涂层性能和整体低的制造成本。

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