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    • 2. 发明申请
    • GAS STREAM TREATMENT PROCESS
    • 气流处理工艺
    • WO2011127105A3
    • 2012-02-09
    • PCT/US2011031318
    • 2011-04-06
    • NALCO COKEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • KEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • B01D53/14B01D46/00B01D53/46B03C3/00
    • B03C3/017B01D53/02B01D53/64B01D2253/106B01D2253/1128B01D2253/25B01D2257/602B01D2258/0283B01D2258/0291B03C3/011
    • A process of treating a gas stream containing mercury is disclosed. The method comprises: applying a sorbent into said gas stream ahead of a particulate matter collection device, in order to adsorb at least a portion of a mercury containing compound, wherein said sorbent contains a composition comprising a compound having the following formula (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01 100 %; and wherein the molar ratio of y/x is equal to 0.01 0.5, the molar ratio of x/z is equal to 3 300, and the molar ratio of a/z is 1 5.
    • 公开了一种处理含有汞的气流的方法。 该方法包括:将吸附剂施加到颗粒物质收集装置之前的所述气流中,以便吸附至少一部分含汞化合物,其中所述吸附剂含有包含具有下式(SiO 2)x的化合物的组合物 (OH)yMzSaF:其中M是以下金属或准金属阳离子中的至少一种:硼,镁,铝,钙,钛,钒,锰,铁,钴,镍,铜,锌,锆,钼,钯,银 ,镉,锡,铂,金和铋; 其中S是选自以下至少一种的硫基物质:硫化物盐,二硫代氨基甲酸盐,基于聚合物的二硫代氨基甲酸盐和多硫化物盐; 其中F任选存在,并且所述F为以下至少一种:官能化的有机硅烷,含硫有机硅烷,含胺的有机硅烷和含烷基的有机硅烷,表面积覆盖率为0.01 100%; 并且其中y / x的摩尔比等于0.01 0.5,x / z的摩尔比等于3 300,并且a / z的摩尔比为15。
    • 3. 发明申请
    • SULFUR CONTAINING SILICA PARTICLE
    • 含硫硅胶颗粒
    • WO2011127230A2
    • 2011-10-13
    • PCT/US2011031496
    • 2011-04-07
    • NALCO COKEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • KEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • C01B33/20B01J20/10B01J21/08C01B33/18C09C1/30
    • C09C1/30C01G3/006C01P2002/54C01P2006/12C01P2006/14C08K3/36C09C3/00C09D7/61C09D7/69
    • A silica containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts;wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01 100 %; and wherein the molar ratio of y/x is equal to 0.01 0.5, the molar ratio of x/z is equal to 3 300, and the molar ratio of a/z is 1 5.
    • 公开了含二氧化硅的组合物。 该组合物包含具有下式的化合物:(SiO 2)x(OH)yMzSaF:其中M是以下金属或准金属阳离子中的至少一种:硼,镁,铝,钙,钛,钒,锰,铁,钴 ,镍,铜,锌,锆,钼,钯,银,镉,锡,铂,金和铋; 其中S是选自以下至少一种的硫基物质:硫化物盐,二硫代氨基甲酸盐,基于聚合物的二硫代氨基甲酸盐和多硫化物盐;其中F任选地存在,并且所述F是以下至少一种:官能化的有机硅烷, 含有机硅烷,含胺有机硅烷和含烷基的有机硅烷,表面积为0.01 100%; 并且其中y / x的摩尔比等于0.01 0.5,x / z的摩尔比等于3 300,并且a / z的摩尔比为15。
    • 4. 发明申请
    • SILICA PARTICLE MANUFACTURING PROCESS
    • 二氧化硅颗粒制造工艺
    • WO2011127104A2
    • 2011-10-13
    • PCT/US2011031317
    • 2011-04-06
    • NALCO COKEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARDSHOWALTER BRETT M
    • KEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARDSHOWALTER BRETT M
    • C01B33/18C01B33/157C09C1/30C09C3/00
    • C01B33/18C01B33/1415C01P2006/12C01P2006/14C01P2006/16
    • Methods of forming a silica-based products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (c) adjusting the pH of the solution to greater than 7; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 1c; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (d) adjusting the pH of the solution to greater than 7; (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 2d; (f) optionally filtering and drying the SCP; and (g) optionally reacting the dried product from step f with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product.
    • 公开了形成二氧化硅基产品的方法。 一种方法包括:(a)提供pH小于或等于7的溶液中含有的含二氧化硅的前体(SCP); (b)任选地用一种或多种金属物质掺杂SCP,其中当溶液的pH小于或等于pH7时,发生所述掺杂; (c)将溶液的pH调节至大于7; (d)向溶液中加入有效量的盐使溶液的电导率大于或等于4mS,其中所述添加发生在步骤1c中的pH调节之前,同时或之后, (e)任选地过滤和干燥SCP; 和(f)任选地使来自步骤e的干燥产物与官能团反应,任选地其中所得官能化干燥产物是以下至少一种:官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。 另一种方法包括:(a)提供包含在pH大于7的溶液中的含二氧化硅的前体(SCP); (b)将溶液的pH调节至小于或等于7; (c)任选地用一种或多种金属物质掺杂SCP,其中当溶液的pH小于或等于pH7时,发生所述掺杂; (d)将溶液的pH调节至大于7; (e)向溶液中加入有效量的盐使溶液的电导率大于或等于4mS,其中所述添加发生在步骤2d中的pH调节之前,同时或之后; (f)任选地过滤和干燥SCP; 和(g)任选地使来自步骤f的干燥产物与官能团反应,任选地其中所得官能化干燥产物是以下至少一种:官能化金属氧化物掺杂或金属硫化物掺杂二氧化硅产物。