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    • 2. 发明申请
    • GAS STREAM TREATMENT PROCESS
    • 气流处理工艺
    • WO2011127105A2
    • 2011-10-13
    • PCT/US2011/031318
    • 2011-04-06
    • NALCO COMPANYKEISER, Bruce A.ERGANG, Nicholas S.MIMNA, Richard
    • KEISER, Bruce A.ERGANG, Nicholas S.MIMNA, Richard
    • B01D53/14B01D53/46B01D46/00B03C3/00
    • B03C3/017B01D53/02B01D53/64B01D2253/106B01D2253/1128B01D2253/25B01D2257/602B01D2258/0283B01D2258/0291B03C3/011
    • A process of treating a gas stream containing mercury is disclosed. The method comprises: applying a sorbent into said gas stream ahead of a particulate matter collection device, in order to adsorb at least a portion of a mercury containing compound, wherein said sorbent contains a composition comprising a compound having the following formula (SiO 2 )x(OH) y M z S a F: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01 100 %; and wherein the molar ratio of y/x is equal to 0.01 0.5, the molar ratio of x/z is equal to 3 300, and the molar ratio of a/z is 1 5.
    • 公开了一种处理含有汞的气流的方法。 该方法包括:将吸附剂施加到颗粒物质收集装置之前的所述气流中,以便吸附至少一部分含汞化合物,其中所述吸附剂含有包含具有下式(SiO 2)x的化合物的组合物 (OH)yMzSaF:其中M是以下金属或准金属阳离子中的至少一种:硼,镁,铝,钙,钛,钒,锰,铁,钴,镍,铜,锌,锆,钼,钯,银 ,镉,锡,铂,金和铋; 其中S是选自以下至少一种的硫基物质:硫化物盐,二硫代氨基甲酸盐,基于聚合物的二硫代氨基甲酸盐和多硫化物盐; 其中F任选存在,并且所述F为以下至少一种:官能化的有机硅烷,含硫有机硅烷,含胺的有机硅烷和含烷基的有机硅烷,表面积覆盖率为0.01 100%; 并且其中y / x的摩尔比等于0.01 0.5,x / z的摩尔比等于3 300,并且a / z的摩尔比为15。
    • 3. 发明申请
    • GAS STREAM TREATMENT PROCESS
    • 气流处理工艺
    • WO2011127105A3
    • 2012-02-09
    • PCT/US2011031318
    • 2011-04-06
    • NALCO COKEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • KEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • B01D53/14B01D46/00B01D53/46B03C3/00
    • B03C3/017B01D53/02B01D53/64B01D2253/106B01D2253/1128B01D2253/25B01D2257/602B01D2258/0283B01D2258/0291B03C3/011
    • A process of treating a gas stream containing mercury is disclosed. The method comprises: applying a sorbent into said gas stream ahead of a particulate matter collection device, in order to adsorb at least a portion of a mercury containing compound, wherein said sorbent contains a composition comprising a compound having the following formula (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01 100 %; and wherein the molar ratio of y/x is equal to 0.01 0.5, the molar ratio of x/z is equal to 3 300, and the molar ratio of a/z is 1 5.
    • 公开了一种处理含有汞的气流的方法。 该方法包括:将吸附剂施加到颗粒物质收集装置之前的所述气流中,以便吸附至少一部分含汞化合物,其中所述吸附剂含有包含具有下式(SiO 2)x的化合物的组合物 (OH)yMzSaF:其中M是以下金属或准金属阳离子中的至少一种:硼,镁,铝,钙,钛,钒,锰,铁,钴,镍,铜,锌,锆,钼,钯,银 ,镉,锡,铂,金和铋; 其中S是选自以下至少一种的硫基物质:硫化物盐,二硫代氨基甲酸盐,基于聚合物的二硫代氨基甲酸盐和多硫化物盐; 其中F任选存在,并且所述F为以下至少一种:官能化的有机硅烷,含硫有机硅烷,含胺的有机硅烷和含烷基的有机硅烷,表面积覆盖率为0.01 100%; 并且其中y / x的摩尔比等于0.01 0.5,x / z的摩尔比等于3 300,并且a / z的摩尔比为15。
    • 5. 发明申请
    • SULFUR CONTAINING SILICA PARTICLE
    • 含硫硅胶颗粒
    • WO2011127230A2
    • 2011-10-13
    • PCT/US2011031496
    • 2011-04-07
    • NALCO COKEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • KEISER BRUCE AERGANG NICHOLAS SMIMNA RICHARD
    • C01B33/20B01J20/10B01J21/08C01B33/18C09C1/30
    • C09C1/30C01G3/006C01P2002/54C01P2006/12C01P2006/14C08K3/36C09C3/00C09D7/61C09D7/69
    • A silica containing composition is disclosed. The composition comprises a compound having the following formula: (SiO2)x(OH)yMzSaF: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts;wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01 100 %; and wherein the molar ratio of y/x is equal to 0.01 0.5, the molar ratio of x/z is equal to 3 300, and the molar ratio of a/z is 1 5.
    • 公开了含二氧化硅的组合物。 该组合物包含具有下式的化合物:(SiO 2)x(OH)yMzSaF:其中M是以下金属或准金属阳离子中的至少一种:硼,镁,铝,钙,钛,钒,锰,铁,钴 ,镍,铜,锌,锆,钼,钯,银,镉,锡,铂,金和铋; 其中S是选自以下至少一种的硫基物质:硫化物盐,二硫代氨基甲酸盐,基于聚合物的二硫代氨基甲酸盐和多硫化物盐;其中F任选地存在,并且所述F是以下至少一种:官能化的有机硅烷, 含有机硅烷,含胺有机硅烷和含烷基的有机硅烷,表面积为0.01 100%; 并且其中y / x的摩尔比等于0.01 0.5,x / z的摩尔比等于3 300,并且a / z的摩尔比为15。
    • 8. 发明申请
    • SULFUR CONTAINING SILICA PARTICLE
    • 含硫的硅胶颗粒
    • WO2013043626A1
    • 2013-03-28
    • PCT/US2012/055964
    • 2012-09-19
    • NALCO COMPANYERGANG, Nicholas SSARATOVSKY, IanCHEN, Hung-Ting
    • ERGANG, Nicholas SSARATOVSKY, IanCHEN, Hung-Ting
    • C01B33/06C01B33/12C01G3/00C01B17/42
    • C01B17/42C01B17/20C01B21/12C01B33/12C01B33/20
    • A silica containing composition is disclosed. The composition comprises a compound having the following formula: (SiO 2 ) x (OH) y M z S a FB: wherein M is at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; wherein S is a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts;wherein F optionally exists and said F is at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of about 0.01 to about 100 %; wherein the molar ratio of y/x is equal to about 0.01 to about 0.5, the molar ratio of x/z is equal to about 0.5 to about 300 or from about 0.5 to about 100, and the molar ratio of a/z is about 0.5 to about 5; and wherein B is a hygroscopic solid at a water to solid molar ratio of 0.1-6 and preferably comprises at least one alkaline earth oxide or lanthanide oxide.
    • 公开了含二氧化硅的组合物。 该组合物包含具有下式的化合物:(SiO 2)x(OH)y M z S S FB:其中M为以下金属或准金属阳离子中的至少一种:硼,镁,铝,钙,钛,钒,锰,铁,钴,镍,铜,锌,锆, 钼,钯,银,镉,锡,铂,金和铋; 其中S是选自以下中的至少一种的基于硫的物质:硫化物盐,二硫代氨基甲酸盐,基于聚合物的二硫代氨基甲酸盐和聚硫化物盐;其中F任选地存在并且所述F为以下中的至少一种:官能化有机硅烷, 含硫有机硅烷,含胺有机硅烷和含烷基有机硅烷,其表面积覆盖率为约0.01至约100%; 其中y / x的摩尔比等于约0.01至约0.5,x / z的摩尔比等于约0.5至约300或约0.5至约100,并且a / z的摩尔比为约 0.5至约5; 并且其中B是水与固体的摩尔比为0.1-6的吸湿性固体,并且优选包含至少一种碱土氧化物或镧系元素氧化物。
    • 9. 发明申请
    • SILICA PARTICLE MANUFACTURING PROCESS
    • WO2011127104A3
    • 2011-10-13
    • PCT/US2011/031317
    • 2011-04-06
    • NALCO COMPANYKEISER, Bruce A.ERGANG, Nicholas S.MIMNA, RichardSHOWALTER, Brett M.
    • KEISER, Bruce A.ERGANG, Nicholas S.MIMNA, RichardSHOWALTER, Brett M.
    • C01B33/18C01B33/157C09C1/30C09C3/00
    • Methods of forming a silica-based products are disclosed. One method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH less than or equal to a pH of 7; (b) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (c) adjusting the pH of the solution to greater than 7; (d) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 1c; (e) optionally filtering and drying the SCP; and (f) optionally reacting the dried product from step e with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product. Another method comprises: (a) providing a silica containing precursor (SCP) contained in solution that has a pH greater than 7; (b) adjusting the pH of the solution to less than or equal to 7; (c) optionally doping the SCP with one or more metal species, wherein said doping occurs when the solution has a pH less than or equal to a pH of 7; (d) adjusting the pH of the solution to greater than 7; (e) adding an effective amount of salt to the solution so that the conductivity of the solution is greater than or equal to 4 mS, wherein said addition occurs prior to, simultaneous with, or after the pH adjustment in step 2d; (f) optionally filtering and drying the SCP; and (g) optionally reacting the dried product from step f with a functional group and optionally wherein the resultant functionalized dried product is at least one of the following: a functionalized metal oxide-doped or metal sulfide-doped silica product.
    • 10. 发明申请
    • GAS STREAM TREATMENT PROCESS
    • 气流处理工艺
    • WO2013052599A1
    • 2013-04-11
    • PCT/US2012/058646
    • 2012-10-04
    • NALCO COMPANYERGANG, Nicholas SKEISER, Bruce AMIMNA, Richard
    • ERGANG, Nicholas SKEISER, Bruce AMIMNA, Richard
    • B01D53/64B01D53/74B01D53/02B01D53/86
    • B03C3/017B01D53/02B01D53/64B01D2253/106B01D2253/1128B01D2253/25B01D2257/602B01D2258/0283B01D2258/0291B03C3/011
    • A process of treating a gas stream containing at least one mercury compound or species, the process comprising: applying a composition into said gas stream ahead of a particulate matter collection device, wherein said composition contains a compound having the following formula (SiO 2 ) x (OH) y M z S a F, wherein (i) SiO 2 is an optional component; (ii) M comprises at least one of the following metal or metalloid cations: boron, magnesium, aluminum, calcium, titanium, vanadium, manganese, iron, cobalt, nickel, copper, zinc, zirconium, molybdenum, palladium, silver, cadmium, tin, platinum, gold, and bismuth; (iii) S comprises a sulfur-based species selected from at least one of the following: sulfide salts, dithiocarbamates, polymer-based dithiocarbamates, and polysulfide salts; (iii) F is an optional component and if present comprises at least one of the following: a functionalized organosilane, a sulfur-containing organosilane, an amine-containing organosilane, and an alkyl-containing organosilane at a surface area coverage of 0.01 100 %; (iv) the molar ratio of y/x is equal to about 0.01 to about0.5 and the molar ratio of x/z is equal to about 0.1 to about 300 if SiO 2 is present, and if SiO 2 is absent X is 0 and Z is 1; and (v) the molar ratio of a/z is about 0.5 to about 5.
    • 一种处理含有至少一种汞化合物或物质的气流的方法,所述方法包括:将组合物施加到颗粒物质收集装置之前的所述气流中,其中所述组合物含有具有下式(SiO 2)x( OH)yMzSaF,其中(i)SiO 2是任选的组分; (ii)M包括以下金属或准金属阳离子中的至少一种:硼,镁,铝,钙,钛,钒,锰,铁,钴,镍,铜,锌,锆,钼,钯,银, 锡,铂,金和铋; (iii)S包含选自以下至少一种的硫基物质:硫化物盐,二硫代氨基甲酸盐,基于聚合物的二硫代氨基甲酸盐和多硫化物盐; (iii)F是任选的组分,如果存在的话,其包含以下至少一种:官能化的有机硅烷,含硫有机硅烷,含胺的有机硅烷和含烷基的有机硅烷,其表面积覆盖率为0.01 100% ; (iv)如果存在SiO 2,则y / x的摩尔比等于约0.01至约0.5,x / z的摩尔比等于约0.1至约300,如果不存在X 2,则X为0,Z 是1; 和(v)a / z的摩尔比为约0.5至约5。