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1. 发明申请

WO2012061753A3 NANOIMPRINT LITHOGRAPHY FORMATION OF FUNCTIONAL NANOPARTICLES USING DUAL RELEASE LAYERS 审中-公开
标题翻译：纳米颗粒的双层印刷纳米微粒光刻形成
公开(公告)号：WO2012061753A3
公开(公告)日：2012-11-01
申请号：PCT/US2011059402
申请日：2011-11-04
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： SINGH VIKRAMJIT , XU FRANK Y , SREENIVASAN SIDLGATA V
IPC分类号： B82B3/00 , B82B1/00 , B82Y40/00
CPC分类号： G03F7/0002 , A61K9/51 , A61K9/5192 , B82Y5/00 , B82Y10/00 , B82Y15/00 , B82Y40/00 , Y10S977/701 , Y10S977/712 , Y10S977/713
摘要： Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.
摘要翻译：可以使用至少一个纳米压印光刻步骤形成功能纳米颗粒。在一个实施例中，牺牲材料可以使用压印光刻工艺在包括可移除层之间的一个或多个功能层的多层基板上构图。至少一个功能层包括功能材料，例如药物组合物或成像剂。图案可以被进一步蚀刻到多层基底中。然后可去除至少一部分功能材料以提供暴露柱的冠部表面。移除可移除层将柱从图案化结构释放以形成功能性纳米粒子，例如药物或显像剂载体。

2. 发明申请

WO2011143341A3 BACKSIDE CONTACT SOLAR CELL 审中-公开
标题翻译： BACKSIDE联系太阳能电池
公开(公告)号：WO2011143341A3
公开(公告)日：2012-01-26
申请号：PCT/US2011036115
申请日：2011-05-11
申请人： MOLECULAR IMPRINTS INC
发明人： MILLER MICHAEL N , SREENIVASAN SIDLGATA V , XU FRANK Y , SCHMID GERARD
IPC分类号： H01L31/042 , H01L31/18
CPC分类号： H01L31/0682 , H01L31/022441 , H01L31/18 , Y02E10/547
摘要： Variations of interdigitated backside contact (IBC) solar cells having patterned areas formed using nano imprint lithography are described.
摘要翻译：描述了具有使用纳米压印光刻形成的图案区域的叉指背面接触（IBC）太阳能电池的变化。

3. 发明申请

WO2011094672A3 NANOIMPRINT LITHOGRAPHY PROCESSES FOR FORMING NANOPARTICLES 审中-公开
标题翻译：用于形成纳米颗粒的纳米薄膜层析法
公开(公告)号：WO2011094672A3
公开(公告)日：2011-10-27
申请号：PCT/US2011023145
申请日：2011-01-31
申请人： MOLECULAR IMPRINTS INC
发明人： XU FRANK Y , SREENIVASAN SIDLGATA V
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A nanoimprint lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.
摘要翻译：用于形成纳米颗粒的纳米压印光刻方法包括在多层衬底上图案化牺牲材料。在一些情况下，将图案转移到多层基板的可移除层或其中，并且将功能材料设置在多层基板的可移除层上并固化。然后去除功能材料的至少一部分以暴露可移除层的突起，并且功能材料的柱从可除去的层释放以产生纳米颗粒。在其他情况下，多层基板包括功能材料，并且图案被转移到多层基板的可移除层中或其中。去除牺牲层，并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。

4. 发明申请

WO2011094383A3 METHODS AND SYSTEMS OF MATERIAL REMOVAL AND PATTERN TRANSFER 审中-公开
标题翻译：材料去除和图案转移的方法和系统
公开(公告)号：WO2011094383A3
公开(公告)日：2011-09-29
申请号：PCT/US2011022679
申请日：2011-01-27
申请人： MOLECULAR IMPRINTS INC
发明人： SCHMID GERARD , MILLER MICHAEL N , CHOI BYUNG-JIN , RESNICK DOUGLAS J , SREENIVASAN SIDLGATA V , XU FRANK Y , DONALDSON DARREN D
IPC分类号： G03F7/00 , G03F7/42
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/42
摘要： Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
摘要翻译：基板上的聚合材料可以通过暴露于受控组合物的气体气氛中来自能源的真空紫外（VUV）辐射而被移除。在这种去除之后，还描述了用于纳米压印的另外的刻蚀技术。

5. 发明申请

WO2011094317A3 MICRO-CONFORMAL TEMPLATES FOR NANOIMPRINT LITHOGRAPHY 审中-公开
标题翻译：用于纳米压印的微合金模板
公开(公告)号：WO2011094317A3
公开(公告)日：2011-09-29
申请号：PCT/US2011022583
申请日：2011-01-26
申请人： MOLECULAR IMPRINTS INC
发明人： MILLER MICHAEL N , XU FRANK Y , STACEY NICHOLAS A
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.
摘要翻译：微型共形纳米压印光刻模板包括背衬层和粘附到背衬层的纳米图案化层。背衬层的弹性模量超过纳米图案层的弹性模量。微型共形纳米压印光刻模板可以用于从基底上的抗蚀刻剂形成图案化层，该衬底具有微米级缺陷，使得从微米级缺陷的外表面到图案化的排除距离由纳米压印光刻模板形成的层小于缺陷的高度。纳米压印光刻模板可以用于形成多个压印，而不会降低特征保真度。

6. 发明申请

WO2012061816A3 PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES 审中-公开
标题翻译：非凸形纳米结构的图案化
公开(公告)号：WO2012061816A3
公开(公告)日：2012-12-13
申请号：PCT/US2011059604
申请日：2011-11-07
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： SREENIVASAN SIDLGATA V , SINGH VIKRAMJIT , XU FRANK Y , CHOI BYUNG-JIN
IPC分类号： B29C33/42 , B82B1/00 , B82B3/00 , B82Y40/00
CPC分类号： B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
摘要： Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
摘要翻译：描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。该方法可用于直接图案化基板和/或形成压印光刻模板或模具，其随后可用于将纳米形图案直接复制到其他基板中，例如功能性或牺牲性抗蚀剂中以形成功能性纳米颗粒。

7. 发明申请

WO2011031293A3 NANOSTRUCTURED THIN FILM INORGANIC SOLAR CELLS 审中-公开
标题翻译：纳米薄膜无机太阳能电池
公开(公告)号：WO2011031293A3
公开(公告)日：2012-06-07
申请号：PCT/US2010002288
申请日：2010-08-18
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： YANG SHUQIANG , SREENIVASAN SIDLGATA V , XU FRANK Y
IPC分类号： H01L31/032 , H01L31/0352 , H01L31/0368 , H01L31/052 , H01L31/075 , H01L31/18
CPC分类号： H01L31/03529 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002 , H01L31/0322 , H01L31/03685 , H01L31/056 , H01L31/075 , H01L31/1804 , Y02E10/52 , Y02E10/541 , Y02E10/545 , Y02E10/547 , Y02E10/548 , Y02P70/521
摘要： Inorganic solar cells having a nano-patterned p-n or p-i-n junction to reduce electron and hole travel distance to the separation interface to be less than the magnitude of the drift length or diffusion length, and meanwhile to maintain adequate active material to absorb photons. Formation of the inorganic solar cells may include one or more nano-lithography steps.
摘要翻译：具有纳米图案化的p-n或p-i-n结的无机太阳能电池减少到分离界面的电子和空穴行进距离，以小于漂移长度或扩散长度的大小，同时保持足够的活性材料吸收光子。无机太阳能电池的形成可以包括一个或多个纳米光刻步骤。

8. 发明申请

WO2011143327A3 NANOSTRUCTURED SOLAR CELL 审中-公开
标题翻译：纳米结构太阳能电池
公开(公告)号：WO2011143327A3
公开(公告)日：2012-04-05
申请号：PCT/US2011036094
申请日：2011-05-11
申请人： MOLECULAR IMPRINTS INC , UNIV TEXAS
发明人： YANG SHUQIANG , MILLER MICHAEL N , HILALI MOHAMED , WAN FEN , SCHMID GERARD , WANG LIANG , SREENIVASAN SIDLGATA V , XU FRANK Y
IPC分类号： H01L31/042
CPC分类号： H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要： Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译：描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法，包括具有金字塔纳米结构重复图案的纳米结构太阳能电池，为具有改进的PCE的低成本薄膜太阳能电池提供。

9. 发明申请

WO2010047769A8 REDUCTION OF STRESS DURING TEMPLATE SEPARATION FROM SUBSTRATE 审中-公开
标题翻译：从衬底分离模板期间减少应力
公开(公告)号：WO2010047769A8
公开(公告)日：2010-12-09
申请号：PCT/US2009005692
申请日：2009-10-20
申请人： MOLECULAR IMPRINTS INC
发明人： XU FRANK Y , SREENIVASAN SIDLGATA V
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Separation of an imprint lithography template and a patterned layer in an imprint lithography process may result in stress to features of the template and/or features of the patterned layer. Such stress may be reduced by minimizing open areas on the template, including dummy features within the open areas, and/or selective positioning of features on the template.
摘要翻译：在压印光刻工艺中分离压印光刻模板和图案层可能导致模板的特征和/或图案化层的特征的应力。可以通过使模板上的开放区域最小化，包括开放区域内的虚拟特征和/或特征在模板上的选择性定位来减小这种应力。

10. 发明申请

WO2010044847A4 NANO-PATTERNED ACTIVE LAYERS FORMED BY NANO-IMPRINT LITHOGRAPHY 审中-公开
标题翻译：纳米印刷光刻技术形成纳米图案的主动层
公开(公告)号：WO2010044847A4
公开(公告)日：2010-08-19
申请号：PCT/US2009005598
申请日：2009-10-14
申请人： MOLECULAR IMPRINTS INC
发明人： WAN FEN , XU FRANK Y , SREENIVASAN SIDLGATA V , YANG SHUQIANG
IPC分类号： H01L51/00
CPC分类号： H01L51/0003 , H01L51/0006 , H01L51/0015 , H01L2251/105 , Y02E10/549
摘要： Patterned active layers formed by nano-imprint lithography for use in devices such as photovoltaic cells and hybrid solar cells. One such photovoltaic cell (400) includes a first electrode (406, 408) and a first electrically conductive layer (402, 404) electrically coupled to the first electrode. The first conductive layer (402, 404) has a multiplicity of protrusions (412, 414) and recesses (416, 422) formed by a nano-imprint lithography process. A second electrically conductive layer (402, 404) substantially fills the recesses (416, 422) and covers the protrusions (412, 414) of the first conductive layer (402, 404), and a second electrode (406, 408) is electrically coupled to the second conductive layer (402, 404). A circuit (410) electrically connects the first electrode (406, 408) and the second electrode (406, 408).
摘要翻译：通过纳米压印光刻形成的图案化有源层用于诸如光伏电池和混合太阳能电池的设备中。一个这样的光伏电池（400）包括第一电极（406,408）和电耦合到第一电极的第一导电层（402,404）。第一导电层（402,404）具有通过纳米压印光刻工艺形成的多个凸起（412,414）和凹陷（416,422）。第二导电层（402,404）基本上填充凹槽（416,422）并覆盖第一导电层（402,404）的突起（412,414），并且第二电极（406,408）电气地耦合到第二导电层（402,404）。电路（410）电连接第一电极（406,408）和第二电极（406,408）。

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