会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明申请
    • ELECTROLESS COPPER DEPOSITION
    • 电镀铜沉积
    • WO2013090099A1
    • 2013-06-20
    • PCT/US2012/068034
    • 2012-12-05
    • LAM RESEARCH CORPORATION
    • DORDI, Yezdi N.JANEK, Richard P.DICTUS, Dries
    • H01L21/285H01L21/28H01L21/3205
    • C23C16/26C23C16/56C23C18/2086C23C18/22C23C18/38H01J37/32082H01J37/3244H01L2924/0002H01L2924/00
    • A method for providing electroless plating is provided. An amorphous carbon barrier layer is formed over the low-k dielectric layer by providing a flow a deposition gas, comprising a hydrocarbon, H 2 and an oxygen free diluent, forming a plasma from the deposition gas, and stopping the flow of the deposition gas. The amorphous carbon barrier layer is conditioned by providing a flow of a conditioning gas comprising H 2 and a diluent, forming a plasma from the conditioning gas, which conditions a top surface of the amorphous carbon barrier layer, and stopping the flow of the conditioning gas. The amorphous carbon barrier layer is functionalized by providing a flow of a functionalizing gas comprising NH 3 or H 2 and N 2 , forming a plasma from the functionalizing gas, and stopping the flow of the functionalizing gas. An electroless process is provided to form an electrode over the barrier layer.
    • 提供了一种提供化学镀的方法。 通过提供包含烃,H 2和无氧稀释剂的沉积气体,从沉积气体形成等离子体并停止沉积气体的流动,在低k电介质层上形成无定形碳阻挡层。 通过提供包含H2和稀释剂的调节气体的流动来调节无定形碳阻挡层,该稀释剂从调节气体形成等离子体,其调节无定形碳阻挡层的顶表面,并停止调节气体的流动。 通过提供包含NH 3或H 2和N 2的官能化气体的流动,从官能化气体形成等离子体并停止官能化气体的流动来使无定形碳阻挡层功能化。 提供无电解方法以在阻挡层上形成电极。