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1. 发明申请

WO2006056905A3 LITHOGRAPHIC METHOD 审中-公开
标题翻译：光刻方法
公开(公告)号：WO2006056905A3
公开(公告)日：2007-08-30
申请号：PCT/IB2005053700
申请日：2005-11-10
申请人： KONINKL PHILIPS ELECTRONICS NV , VAN STEENWINCKEL DAVID , ZANDBERGEN PETER
发明人： VAN STEENWINCKEL DAVID , ZANDBERGEN PETER
IPC分类号： G03F7/30 , G03F7/32
CPC分类号： G03F7/30 , G03F7/095 , G03F7/32
摘要： A method of achieving frequency doubled lithographic patterning is described. An optical pattern (16) having a first period (p 1 ) is used to expose conventional acid-catalysed photoresist (18) on substrate (20), leaving regions of high exposure (24), regions of low exposure (26) and intermediate regions (22). Processing proceeds leaving regions (24) which received high exposure very polar, i.e. hydrophilic, regions (26) of low exposure very apolar, i.e. hydrophobic, and the intermediate regions having intermediate polarity. A developer of intermediate polarity such as propylene glycol methyl ether acetate is then used to dissolve only the intermediate regions (22) leaving photoresist patterned to have a pitch (p 2 ) half that of the optical period (p 1 ). Alternatively, the photoresist is removed from the apolar and polar regions leaving only the intermediate regions (22) again with the same pitch (p 2 ) half that of the optical period (p 1 ).
摘要翻译：描述了实现倍频光刻图案化的方法。使用具有第一周期（p <1> 1）的光学图案（16）来曝光基底（20）上的常规酸催化光致抗蚀剂（18），留下高曝光区域（24）低暴露（26）和中间区域（22）。处理进行离开区域（24），其接收高暴露非常极性，即亲水性低暴露非极性，即疏水性的区域（26），并且具有中等极性的中间区域。然后使用中等极性的显影剂，例如丙二醇甲基醚乙酸酯，仅溶解中间区域（22），使光致抗蚀剂图案化成具有光学周期（p）的一半的间距（p <2> 2） _{1 ）。或者，光致抗蚀剂从非极性区域和极性区域移除，仅使中间区域（22）再次以光学周期（p 1 ）。}

2. 发明申请

WO2006137011A3 METHODS AND DEVICES FOR CHARACTERIZING POLARIZATION OF ILLUMINATION SYSTEM 审中-公开
标题翻译：用于表征照明系统极化的方法和装置
公开(公告)号：WO2006137011A3
公开(公告)日：2007-07-05
申请号：PCT/IB2006051979
申请日：2006-06-20
申请人： KONINKL PHILIPS ELECTRONICS NV , AKSENOV YURI , DIRKSEN PETER , ZANDBERGEN PETER , BENNDORF MICHAEL , VAN STEENWINCKEL DAVID
发明人： AKSENOV YURI , DIRKSEN PETER , ZANDBERGEN PETER , BENNDORF MICHAEL , VAN STEENWINCKEL DAVID
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F7/7085 , G03F1/44 , G03F7/70058 , G03F7/70566
摘要： In a method for evaluating the polarization state of an illumination system (52) in an optical system (50), a mask (56) is provided in the optical system (50) such that an illumination beam incident on the mask (56) is adapted such as to substantially differently diffract incident components of a light beam having different polarization states. An image of the mask (56) is then obtained, using an illumination beam of the illumination system (52) of the optical system (50). The obtained image, being either an intensity plot or a structure created in a resist layer by exposing the resist layer with the image of the mask (56), is then used to extract polarization related information about the illumination system (52). The image used for evaluating may be a diffraction image of the mask.
摘要翻译：在用于评估光学系统（50）中的照明系统（52）的偏振状态的方法中，在光学系统（50）中设置掩模（56），使得入射到掩模（56）上的照明光束是适于使得具有不同极化状态的光束的入射分量基本不同的衍射。然后使用光学系统（50）的照明系统（52）的照明光束获得掩模（56）的图像。所获得的图像是强度图或通过用掩模（56）的图像曝光抗蚀剂层在抗蚀剂层中产生的结构，然后用于提取关于照明系统（52）的偏振相关信息。用于评估的图像可以是掩模的衍射图像。

3. 发明申请

WO2005064409A2 REMOVABLE PELLICLE FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：可移除胶片用于浸没式光刻
公开(公告)号：WO2005064409A2
公开(公告)日：2005-07-14
申请号：PCT/IB2004052886
申请日：2004-12-22
申请人： KONINKL PHILIPS ELECTRONICS NV , DIRKSEN PETER , MORTON ROBERT D , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , AKSENOV YURI , LAMMERS JEROEN H , VAN WINGERDEN JOHANNES , MARINIER LAURENT
发明人： DIRKSEN PETER , MORTON ROBERT D , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , AKSENOV YURI , LAMMERS JEROEN H , VAN WINGERDEN JOHANNES , MARINIER LAURENT
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70983
摘要： A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the resist through the immersion fluid and through the transparent layer, such that imperfections in the fluid are out of focus as projected on the surface, and subsequently removing the transparent layer. The transparent layer can help distance such imperfections from the focus of the radiation on the surface and so can reduce or eliminate shadowing. Hence the irradiation can be more complete, and defects reduced. It can be particularly effective for imperfections in the form of small bubbles or particles in the immersion fluid especially at the fluid/surface interface for example. The radiation can be for any purpose including inspection, processing, patterning and so on. The removal of the transparent layer can be combined with a step of developing the resist layer.
摘要翻译：一种照射方法来照射浸没在流体（L3）中的抗蚀剂（L2）的感光层，包括施加可去除的透明层（L4，L5），通过浸没流体将辐射投射到抗蚀剂上，并通过透明使得流体中的缺陷如投射在表面上而失焦，随后去除透明层。透明层可以帮助将这种缺陷从辐射的焦点远离在表面上，因此可以减少或消除阴影。因此，照射可以更完整，并且缺陷减少。对于浸入液体中的小气泡或颗粒形式的缺陷，特别是在流体/表面界面处的缺陷可能特别有效。辐射可以用于任何目的，包括检查，加工，图案化等。可以将透明层的去除与显影抗蚀剂层的步骤组合。

4. 发明申请

WO2008015635A2 PHOTOLITHOGRAPHY 审中-公开
标题翻译：光刻
公开(公告)号：WO2008015635A2
公开(公告)日：2008-02-07
申请号：PCT/IB2007053014
申请日：2007-07-31
申请人： NXP BV , KWINTEN HANS , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , VANLEENHOVE ANJA
发明人： KWINTEN HANS , ZANDBERGEN PETER , VAN STEENWINCKEL DAVID , VANLEENHOVE ANJA
IPC分类号： G03F7/004
CPC分类号： G03F7/38
摘要： The invention relates to a method of photolithography comprising the steps of: providing a substrate and forming a layer of a photoresist (100) on the substrate, performing a first exposure (120) in which a predetermined part of the layer of photoresist is irradiated through a mask having a pattern for forming a latent image of said pattern in the layer of the photoresist, performing a pretreatment (130) on the layer of the photoresist to remove a predetermined part of the latent image before performing the fixation (140). The method provides an improved process window. The invention further relates to a photoresist for use within the method of the invention.
摘要翻译：本发明涉及一种光刻方法，该方法包括以下步骤：提供衬底并在衬底上形成光致抗蚀剂层（100），执行第一次曝光（120），其中光致抗蚀剂层的预定部分被照射穿过具有用于在所述光致抗蚀剂层中形成所述图案的潜像的图案的掩模，在执行所述定影之前对所述光致抗蚀剂层执行预处理（130）以去除所述潜像的预定部分（140）。该方法提供了改进的过程窗口。本发明还涉及用于本发明方法中的光刻胶。

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