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1. 发明申请

WO2007017162A2 DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER 审中-公开
标题翻译：双层热敏成像元件与聚乙烯顶层
公开(公告)号：WO2007017162A2
公开(公告)日：2007-02-15
申请号：PCT/EP2006/007618
申请日：2006-08-01
申请人： KODAK POLYCHROME GRAPHICS GMBH , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard , GLATT, Horst , FRANK, Dietmar
发明人： SAVARIAR-HAUCK, Celin , HAUCK, Gerhard , GLATT, Horst , FRANK, Dietmar
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： Thermally imageable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline developer, wherein the first polymer is different from the second polymer and the second polymer comprises vinyl acetal repeating units and pendant acidic groups selected from COOH, -SO 3 H, -PO 3 H 2 , -PO 4 H 2 , aromatic OH and groups having acidic amide or imide groups.
摘要翻译：描述了可热成像元件，其包括在具有亲水表面的基底上（a）第一层，其包含在含水碱性显影剂中可溶或可溶胀的第一聚合物，并且不溶于低极性的有机溶剂，和（b）包含第二聚合物可溶或在水性碱性显影剂中可膨胀，其中第一聚合物不同于第二聚合物，第二聚合物包含乙烯基缩醛重复单元和选自COOH，-SO 3 H，-PO 3， 3个H 2，-PO 4 H 2，芳香族OH和具有酸性酰胺或酰亚胺基团的基团。

2. 发明申请

WO2005039878A1 PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS 审中-公开
标题翻译：生产感应性成像元件的方法
公开(公告)号：WO2005039878A1
公开(公告)日：2005-05-06
申请号：PCT/EP2004/011379
申请日：2004-10-11
申请人： KODAK POLYCHROME GRAPHICS GMBH , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard , FRANK, Dietmar
发明人： SAVARIAR-HAUCK, Celin , HAUCK, Gerhard , FRANK, Dietmar
IPC分类号： B41C1/10
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368
摘要： The invention relates to a process for the production of a heat-sensitive imageable element comprising: (a) providing a substrate, (b) applying a first coating solution, comprising at least one photothermal conversion material, at least one polymer A soluble or swellable in an aqueous alkaline developer and at least one solvent, (c) drying, (d) applying a second coating solution, comprising at least one cross-linkable polyfunctional enolether, at least one polymer B comprising hydroxy groups and/or carboxy groups, and at least one solvent, wherein the polymer used in the first coating solution does not dissolve in this solvent, wherein the second coating solution does not contain a photothermal conversion material, and (e) drying at a temperature of at least 60°C.
摘要翻译：本发明涉及一种用于生产热敏可成像元件的方法，包括：（a）提供基底，（b）施加包含至少一种光热转换材料的第一涂层溶液，至少一种可溶或可膨胀的聚合物A 在水性碱性显影剂和至少一种溶剂中，（c）干燥，（d）施加包含至少一个可交联的多官能烯烃的至少一种包含羟基和/或羧基的聚合物B的第二涂料溶液，以及至少一种溶剂，其中在第一涂布溶液中使用的聚合物不溶于该溶剂，其中第二涂料溶液不含光热转化材料，和（e）在至少60℃的温度下干燥。

3. 发明申请

WO2006063626A2 STABLE HIGH PH DEVELOPER 审中-公开
标题翻译：稳定的高PH开发者
公开(公告)号：WO2006063626A2
公开(公告)日：2006-06-22
申请号：PCT/EP2005/002016
申请日：2005-02-25
申请人： KODAK POLYCHROME GRAPHICS GMBH , SAVARIAR-HAUCK, Celin , KLAMT, Manuel , HUANG, Jianbing
发明人： SAVARIAR-HAUCK, Celin , KLAMT, Manuel , HUANG, Jianbing
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： Developer composition obtainable by (a) providing water, (b) dissolving such an amount of an alkaline component selected from alkali silicates, alkali hydroxides, Na 3 PO 4 , K 3 PO 4 , NR 4 OH, wherein each R is independently selected from C 1 C 4 alkyl groups and C 1 -C 4 hydroxyalkyl groups, and mixtures thereof in the water provided in step (a) that a pH of more than 12 is obtained, and (c) dissolving a stabilizer selected from M 2 CO 3 , MHCO 3 , or a mixture of 2 or more thereof, wherein each M is independently selected from Li, Na, K and NR' 4 and each R' independently represents H or C 1 -C 4 alkyl, in the solution obtained in step (b) wherein the amount of the added stabilizer is such that the amount of the added carbonate anion is 1.5 to 20 wt-%, based on the total weight of the developer composition.
摘要翻译：（a）提供水，（b）溶解选自碱金属硅酸盐，碱金属氢氧化物，Na 3 PO 4，Al 2 O 3，Al 2 O 3和Al 2 O 3的碱性成分的显影剂组合物， 4，K 3 PO 4，NR 4 OH，其中每个R独立地选自C 1 -C 4烷基，（a）中提供的水中的至少一种烷基和C 1 -C 4烷基和C 1 -C 4羟基烷基，以及它们的混合物; 获得大于12的pH，和（c）溶解选自M 2 CO 3，MHCO 3或者其中的稳定剂其中每个M独立地选自Li，Na，K和NR'4并且每个R'独立地表示H或C 1 -C 4烷基，在步骤（b）中获得的溶液中，其中添加的稳定剂的量使得添加的碳酸根阴离子的量基于所述碳酸根阴离子的总重量为1.5至20重量％开发人员构成。

4. 发明申请

WO2005123412A1 MODIFIED POLYMERS AND THEIR USE IN THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATE PRECURSORS 审中-公开
标题翻译：改性聚合物及其在生产平版印刷机前驱体中的应用
公开(公告)号：WO2005123412A1
公开(公告)日：2005-12-29
申请号：PCT/EP2005/006426
申请日：2005-06-15
申请人： KODAK POLYCHROME GRAPHICS GMBH , SAVARIAR-HAUCK, Celin , MONK, Alan, S., V. , ULLRICH, Rene
发明人： SAVARIAR-HAUCK, Celin , MONK, Alan, S., V. , ULLRICH, Rene
IPC分类号： B41M5/36
CPC分类号： B41M5/368 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with -COOH, -SO3H, -P03H2 and/or -PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.
摘要翻译：辐射敏感的负性工作元件包括（a）具有亲水表面的基底和（b）基底的亲水表面上的层，其中所述层包含可通过使（i）聚合物与-COOH反应获得的改性聚合物， SO 3 H，-P 3 H 2和/或-PO 4 H 2，其中所述聚合物可溶于碱性水溶液中，并且所述溶解度不被IR辐射改变，和（ii）与无机或有机阳离子的盐，其中所述改性聚合物可溶于碱性水溶液中，溶解度不受IR辐射改变，所述层可溶于含水碱性显影剂，但通过IR辐射使其不溶于含水碱性显影剂。

5. 发明申请

WO2004020484A1 HEAT-SENSITIVE POSITIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR WITH A HIGH RESISTANCE TO CHEMICALS 审中-公开
标题翻译：具有高耐化学性能的热敏正电极印刷平版印刷机
公开(公告)号：WO2004020484A1
公开(公告)日：2004-03-11
申请号：PCT/EP2003/009550
申请日：2003-08-28
申请人： KODAK POLYCHROME GRAPHICS GMBH , TIMPE, Hans-Joachim , MÜLLER, Ursula , SAVARIAR-HAUCK, Celin
发明人： TIMPE, Hans-Joachim , MÜLLER, Ursula , SAVARIAR-HAUCK, Celin
IPC分类号： C08F8/14
CPC分类号： C08F8/14 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F8/28 , C08F8/46 , C08L59/00 , C08L61/00 , C08F16/06 , C08F216/38 , C08L2666/16
摘要： Heat-sensitive element comprising (a) an optionally pre-treated substrate (b) a positive working heat-sensitive coating comprising (i) at least one novolak resin, (ii) at least one component which reduces the aqueous alkaline developer solubility of novolak, wherein said reduction in solubility is reversed upon the application of heat, and (iii) at least one acidic polyvinyl acetal comprising the structural units (A), (B), (C) (A) (B) (C) and (D) wherein (D) is at least one unit selected from (D-1), (D-2), and (D-3): (D-1) (D-2) (D-3) wherein R 1 is a hydrogen atom or a C 1 -C 4 alkyl group, R 2 is a hydrogen atom or a C 1 -C 18 alkyl group, R 3 is a hydrogen atom or a C 1 -C 4 alkyl group, R 4 is a hydrogen atom or a C 1 -C 4 alkyl group, R 5 is -COOH, -(CH 2 ) a -COOH, -O-(CH 2 ) a -COOH, -SO 3 H, -PO 3 H 2 or -PO 4 H 2 , a is an integer from 1 to 8, and X is selected from -(CR 6 R 7 ) n - and -CR 8 =CR 9 - wherein n is an integer of 1 to 6, each R 6 and R 7 is independently selected from a hydrogen atom and C 1 -C 6 alkyl group, and R 8 and R 9 are independently selected from a hydrogen atom and a C 1- C 6 alkyl group or R 8 and R 9 together with the two carbon atoms to which they are bonded, form an optionally substituted aryl or heteroaryl group, wherein components (i) and (ii) do not have to be present as separate substances but may be used in the form of an appropriately functionalized novolak.
摘要翻译：热敏元件包括（a）任选地预处理的基材（b）正性工作热敏涂层，其包含（i）至少一种酚醛清漆树脂，（ii）降低酚醛清漆的碱性显影剂水溶液的至少一种成分（A），（B），（C）（A）（B）（C）和（C））的至少一种酸性聚乙烯醇缩醛，其中所述溶解度的降低在施加热量时反转， D）其中（D）为选自（D-1），（D-2）和（D-3）中的至少一个单元：（D-1）（D-2） 1>是氢原子或C 1 -C 4烷基，R 2是氢原子或C 1 -C 18烷基，R 3是氢原子或C 1 -C 4烷基，R 4，是氢原子或C 1 -C 4烷基，R 5是-COOH， - （CH 2）a -COOH，-O-（CH 2）a -COOH，-SO 3 H，-PO 3 H 2或-PO 4 H 2，a是 1至8的整数，X选自 - （CR 6 R 7）n - 和CR 8 = CR 9 - ，其中n为1至6的整数，每个R 6 >和R 7独立地选自氢原子 C 1 -C 6烷基，R 8和R 9独立地选自氢原子和C 1 -C 6烷基或R 8和R 9与它们两个碳原子一起形成任选取代的芳基或杂芳基，其中组分（i）和（ii）不必以单独的物质存在，而可以以适当官能化的酚醛清漆的形式使用。

6. 发明申请

WO2009114056A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 审中-公开
标题翻译：具有改进耐磨性的负离子成像元件
公开(公告)号：WO2009114056A1
公开(公告)日：2009-09-17
申请号：PCT/US2009/000896
申请日：2009-02-12
申请人： EASTMAN KODAK COMPANY , HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
发明人： HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
IPC分类号： G03F7/004 , G03F7/075
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

7. 发明申请

WO2011119342A1 LITHOGRAPHIC PROCESSING SOLUTIONS AND METHODS OF USE 审中-公开
标题翻译： LITHOGRAPHIC PROCESSING SOLUTIONS和使用方法
公开(公告)号：WO2011119342A1
公开(公告)日：2011-09-29
申请号：PCT/US2011/027864
申请日：2011-03-10
申请人： EASTMAN KODAK COMPANY , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard , NAKASH, Moshe
发明人： SAVARIAR-HAUCK, Celin , HAUCK, Gerhard , NAKASH, Moshe
IPC分类号： B41C1/10 , B41N3/08
CPC分类号： G03F7/322
摘要： A lithographic processing solution having a pH of less than 12 and comprising at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1 -position of the heterocyclic ring, and having one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. The processing solution can be used to develop multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.
摘要翻译：一种平版印刷加工溶液，其PH值小于12，并且包含至少0.001和至多并且包括1重量％的水溶性或水分散性，非IR敏感性化合物，其具有季氮的杂环部分杂环的1位，并且具有连接到杂环上的一个或多个给电子取代基，其中至少一个给电子取代基连接在2-位。处理溶液可用于开发已经使用红外辐射成像的多层正性平版印刷版原版。

8. 发明申请

WO2009032080A1 IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 审中-公开
标题翻译：具有改进耐磨性的成像元件
公开(公告)号：WO2009032080A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/009956
申请日：2008-08-21
申请人： EASTMAN KODAK COMPANY , HAUCK, Gerhard , SAVARIAR-HAUCK, Celin
发明人： HAUCK, Gerhard , SAVARIAR-HAUCK, Celin
IPC分类号： B41C1/10 , B41M5/36
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： Single- and multi-layer positive-working imageable elements include an ink receptive outer layer that includes inorganic, non-metallic, inert discrete particles, such as nano-sized silica, aluminum oxide, or titanium dioxide particles. The presence of these particles in the outermost layer improves the abrasion and scratch resistance of the elements.
摘要翻译：单层和多层正性可成像元件包括包含无机，非金属，惰性离散颗粒（例如纳米尺寸二氧化硅，氧化铝或二氧化钛颗粒）的油墨接收外层。这些颗粒在最外层中的存在提高了元件的耐擦伤性和耐划伤性。

9. 发明申请

WO2009008961A1 IMAGEABLE ELEMENTS WITH LOW PH DEVELOPER SOLUBILITY 审中-公开
标题翻译：具有低PH开发者溶解性的成像元素
公开(公告)号：WO2009008961A1
公开(公告)日：2009-01-15
申请号：PCT/US2008/007957
申请日：2008-06-26
申请人： EASTMAN KODAK COMPANY , SAVARIAR-HAUCK, Celin , MONK, Alan, Stanley, Victor , HAUCK, Gerhard
发明人： SAVARIAR-HAUCK, Celin , MONK, Alan, Stanley, Victor , HAUCK, Gerhard
IPC分类号： G03F7/023 , B41C1/10 , B41M5/36
CPC分类号： G03F7/0236 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/106 , Y10S430/127 , Y10S430/145 , Y10S430/146
摘要： Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline developers.
摘要翻译：单层和多层正性可成像元件包括油墨接收外层，其包括作为聚（乙烯基苯酚）的主要聚合物粘合剂或具有某些酸性基团的酚类聚合物。使用这种类型的聚合物粘合剂使得成像元件可在低pH（11个或更少）碱性显影剂中显影。

10. 发明申请

WO2008063387A1 MULTILAYER ELEMENT WITH LOW PH DEVELOPER SOLUBILITY 审中-公开
标题翻译：具有低PH开发者溶解性的多层元件
公开(公告)号：WO2008063387A1
公开(公告)日：2008-05-29
申请号：PCT/US2007/023256
申请日：2007-11-05
申请人： EASTMAN KODAK COMPANY , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard
发明人： SAVARIAR-HAUCK, Celin , HAUCK, Gerhard
IPC分类号： B41C1/10 , G03F7/32
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/322 , Y10S430/106
摘要： A positive-working imageable element comprises inner and outer layers and an infrared radiation absorbing compound such as an IR absorbing dye. The ink receptive outer layer includes a phenolic polymeric binder that is soluble in a developer having a pH of from 7 to 1 1. The use of this type of polymeric binder reduces residue in the developer as elements are processed.
摘要翻译：正性可成像元件包括内层和外层以及红外辐射吸收化合物如IR吸收染料。油墨接收外层包括可溶于pH为7至11的显影剂的酚醛聚合物粘合剂。当加工元素时，使用这种聚合粘合剂可减少显影剂中的残余物。

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