专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2017019171A1 SYSTEM AND METHOD FOR DYNAMIC CARE AREA GENERATION ON AN INSPECTION TOOL 审中-公开
标题翻译：检测工具动态护理领域的系统与方法
公开(公告)号：WO2017019171A1
公开(公告)日：2017-02-02
申请号：PCT/US2016/034648
申请日：2016-05-27
申请人： KLA-TENCOR CORPORATION
发明人： RAMACHANDRAN, Vijayakumar , SANAPALA, Ravikumar , ANANTHA, Vidyasagar , MEASOR, Phillip , MANEPALLI, Rajesh
IPC分类号： H01L21/66
CPC分类号： H01L22/20 , H01L22/12
摘要： A defect inspection system includes an inspection sub-system and a controller communicatively coupled to the detector. The inspection sub-system includes an illumination source configured to generate a beam of illumination, a set of illumination optics to direct the beam of illumination to a sample, and a detector configured to collect illumination emanating from the sample. The controller includes a memory device and one or more processors configured to execute program instructions. The controller is configured to determine one or more target patterns corresponding to one or more features on the sample, define one or more care areas on the sample based on the one or more target patterns and design data of the sample stored within the memory device of the controller, and identify one or more defects within the one or more care areas of the sample based on the illumination collected by the detector.
摘要翻译：缺陷检查系统包括检测子系统和通信地耦合到检测器的控制器。检查子系统包括被配置为产生照射束的照明源，一组用于将照射束引导到样品的照明光学器件，以及被配置为收集从样品发出的光的检测器。控制器包括存储器设备和被配置为执行程序指令的一个或多个处理器。控制器被配置为确定与样本上的一个或多个特征相对应的一个或多个目标模式，基于存储在存储器装置内的样本的一个或多个目标模式和样本的设计数据来定义样本上的一个或多个保养区域控制器，并且基于由检测器收集的照明来识别样品的一个或多个护理区域内的一个或多个缺陷。

2. 发明申请

WO2018089216A1 SYSTEM AND METHOD FOR GENERATION OF WAFER INSPECTION CRITICAL AREAS 审中-公开
标题翻译：用于生成晶片检测关键区域的系统和方法
公开(公告)号：WO2018089216A1
公开(公告)日：2018-05-17
申请号：PCT/US2017/058887
申请日：2017-10-27
申请人： KLA-TENCOR CORPORATION
发明人： UPPALURI, Prasanti , MANEPALLI, Rajesh , KULKARNI, Ashok V. , BANERJEE, Saibal , KIRKLAND, John
IPC分类号： H01L21/66 , H01L21/67
CPC分类号： G06T7/0004 , G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01L22/12
摘要： A method includes receiving one or more sets of wafer data, identifying one or more primitives from one or more shapes in one or more layers in the one or more sets of wafer data, classifying each of the one or more primitives as a particular primitive type, identifying one or more primitive characteristics for each of the one or more primitives, generating a primitive database of the one or more primitives, generating one or more rules based on the primitive database, receiving one or more sets of design data, applying the one or more rules to the one or more sets of design data to identify one or more critical areas, and generating one or more wafer inspection recipes including the one or more critical areas for an inspection sub-system.
摘要翻译：一种方法包括接收一组或多组晶圆数据，从一组或多组晶圆数据中的一个或多个层中的一个或多个形状中识别一个或多个基元，将一组或多组晶圆数据中的每一个或多个基元作为一个特定的原语类型，识别一个或多个原语的特征为每个所述一个或多个原语，生成所述一个或多个基元的原语数据库，基于原始数据库上生成一个或多个规则，接收一个或多个将一个或多个规则应用于一组或多组设计数据以识别一个或多个关键区域，并且生成包括用于检查子系统的一个或多个关键区域的一个或多个晶片检查配方。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式