专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2010114331A2 METHOD FOR MANUFACTURING A LIGHT-WEIGHT HEAT INSULATING BATHTUB AND A LIGHT-WEIGHT HEAT INSULATING BATHTUB THEREBY 审中-公开
标题翻译：轻量热绝热电池和轻量热绝缘电池的制造方法
公开(公告)号：WO2010114331A2
公开(公告)日：2010-10-07
申请号：PCT/KR2010002040
申请日：2010-04-02
申请人： KIM KYUNG-JUN , LEE JONG-KWAN
发明人： KIM KYUNG-JUN , LEE JONG-KWAN
IPC分类号： B29C44/16 , A47K3/02 , B29C44/12
CPC分类号： A47K3/02 , B29C44/129 , B29K2075/00 , B29L2031/7692
摘要： The present invention relates to a method for manufacturing a light-weight heat insulating bathtub and to a light-weight heat insulating bathtub thereby. In particular, the preset invention relates to a manufacturing method of a bathtub, comprising a first step of forming an interior shape of the bathtub by molding a polycarbonate plate, and forming a structured layer with a rugged pattern on one side of the plate used as a bottom surface of the interior of the bathtub, a second step of applying an polycarbonate-based adhesive to the side of the structured layer with the rugged pattern and a third step of forming a soft polyurethane foam layer by foaming polyurethane onto the side to which the adhesive is applied, with the soft polyurethane foam layer configuring an outer shape of the bathtub and further including a deformation prevention frame that is provided to an outer lateral plane and extends in a vertical direction of the bathtub; and to a light-weight heat insulating bathtub manufactured by the method. Therefore, compared with conventional bathtubs having a total weight of 60 to 70kg, the light-weight bathtub of the present invention weighs much less, e.g. 15 to 20 kg, and such bathtubs are easy to carry, exhibit excellent insulation efficiency and heat insulation effects, are highly resistant to shock and scratches, present excellent durability by inhibiting interlayer separations, and minimize the defect ratio by preventing deformation after a curing process in the manufacturing procedure.
摘要翻译：本发明涉及一种用于制造轻质隔热浴缸的方法和一种轻质隔热浴缸。特别地，本发明涉及一种浴缸的制造方法，包括：通过模制聚碳酸酯板形成浴缸的内部形状的第一步骤，并且在用作板的一侧上形成具有凹凸图案的结构化层浴缸内部的底部表面，第二步骤，以坚固的图案将聚碳酸酯基粘合剂施加到结构化层侧;第三步骤，通过将聚氨酯泡沫层发泡到其一侧上形成软质聚氨酯泡沫层，施加粘合剂，软质聚氨酯泡沫层构成浴缸的外部形状，并且还包括设置在外侧面并沿浴缸的垂直方向延伸的变形防止框架; 以及通过该方法制造的轻质隔热浴。因此，与总重量为60〜70kg的常规浴缸相比，本发明的轻质浴缸重量少得多，例如，这样的浴缸容易携带，具有优异的绝缘效率和隔热效果，耐冲击和划伤，通过抑制层间隔离具有优异的耐久性，并且通过防止固化过程后的变形使缺陷率最小化在制造过程中。

2. 发明申请

WO2010123271A2 METHOD FOR MANUFACTURING A RESILIENT BATHTUB, AND RESILIENT BATHTUB 审中-公开
标题翻译：制造可再生能源的方法和弹性电池
公开(公告)号：WO2010123271A2
公开(公告)日：2010-10-28
申请号：PCT/KR2010002492
申请日：2010-04-21
申请人： KIM KYUNG-JUN , LEE JONG-KWAN
发明人： KIM KYUNG-JUN , LEE JONG-KWAN
IPC分类号： B29C44/12 , B29C44/06 , B29C44/16
CPC分类号： B29C44/06 , B29K2995/0015 , B29L2031/7692
摘要： The present invention relates to a method for manufacturing a resilient bathtub and to a resilient bathtub. The present invention relates to a method for manufacturing a bathtub, comprising: a first step of forming an outer structure layer having the shape of the outer periphery of the bathtub; a second step of forming a release layer on the outer surface of an inner mold having a bathtub molding surface corresponding to the inner shape of the bathtub and a flange portion extending outward from the edge of the bathtub molding surface; and a third step of forming a semi-rigid foam layer which fills the gap between the outer structure layer and the release layer and which has a non-foam coating layer, a soft foam layer, and a non-foam coating layer which are sequentially formed between the outer structure layer and the release layer. The present invention also relates to a resilient bathtub. Thus, the present invention provides a bathtub which has an inner surface with a pleasant feeling on contact and a resilience for providing comfort, and which is made of resilient materials for ensuring safety in terms of impacts against same, and which has superior heat insulation properties and thus eliminates the necessity of supplementing warm water during bathing. Particularly, the present invention provides a bathtub having a cushioning function which can be used as a bed or a cradle after bathing when used as a bathtub for infants. In addition, the bathtub of the present invention is manufactured through a simplified manufacturing process, to thereby reduce production losses and manufacturing costs. Thus, the present invention provides an inexpensive resilient bathtub.
摘要翻译：本发明涉及一种用于制造弹性浴缸和弹性浴缸的方法。浴缸的制造方法技术领域本发明涉及一种浴缸的制造方法，其特征在于，包括：形成具有所述浴缸外周形状的外结构层的第一工序; 在具有对应于浴缸的内部形状的浴缸成型面的内模的外表面上形成剥离层的第二步骤和从浴缸成型表面的边缘向外延伸的凸缘部分; 以及形成半刚性泡沫层的第三步骤，其填充外部结构层和剥离层之间的间隙，并且具有非泡沫涂层，软泡沫层和非泡沫涂层，其顺序地形成在外部结构层和剥离层之间。本发明还涉及一种弹性浴缸。因此，本发明提供一种浴缸，其具有接触感好的内表面和提供舒适性的弹性，并且由用于确保对其的冲击的安全性的弹性材料制成，并且具有优异的隔热性能因此消除了在洗澡期间补充温水的必要性。特别地，本发明提供了一种具有缓冲功能的浴缸，当用作婴儿浴缸时，可以用作洗浴后的床或摇篮。此外，本发明的浴缸通过简化的制造工艺制造，从而减少生产损失和制造成本。因此，本发明提供了一种廉价的弹性浴缸。

3. 发明申请

WO0113175A3 PHOTOSENSITIVE RESIN COMPOSITION 审中-公开
标题翻译：光敏树脂组合物
公开(公告)号：WO0113175A3
公开(公告)日：2001-06-14
申请号：PCT/KR0000883
申请日：2000-08-10
申请人： LG CHEMICAL LTD , AHN YONG SIK , KIM KYUNG JUN , HWANG YUN IL
发明人： AHN YONG-SIK , KIM KYUNG-JUN , HWANG YUN-IL
IPC分类号： G03F7/039 , C08F8/00 , C08F290/12 , G03F7/027 , G03F7/033 , G03F7/038
CPC分类号： G03F7/033 , G03F7/0388
摘要： The present invention relates to a photosensitive resin composition capable of being developed by an alkaline aqueous solution, and provides a photosensitive resin which has superior resolving power by having a chemical bond between a binder resin and a crosslinking compound as well as a chemical bond between binder resin chains at an exposed area during an exposure process, thus maximizing a solubility difference between an exposed area and a non-exposed area during a developing process, and which has process benefits as well as superior film characteristics by reducing a consumed amount of a crosslinking compound, thus minimizing total amount of UV irradiation necessary.
摘要翻译：本发明涉及能够通过碱性水溶液显影的感光性树脂组合物，并且提供一种感光性树脂，其通过在粘合剂树脂和交联性化合物之间具有化学键以及粘合剂之间的化学键而具有优异的分辨能力在曝光过程中暴露区域的树脂链，因此在显影过程期间曝光区域与非曝光区域之间的溶解度差异最大化，并且通过降低消耗的交联量而具有加工益处以及优异的膜特性化合物，从而使所需的UV照射总量最小化。

4. 发明申请

WO2009110764A2 POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION 审中-公开
标题翻译：正性光敏聚酰亚胺组合物
公开(公告)号：WO2009110764A2
公开(公告)日：2009-09-11
申请号：PCT/KR2009001121
申请日：2009-03-06
申请人： LG CHEMICAL LTD , SEONG HYE-RAN , PARK CHAN-HYO , OH DONG-HYUN , SHIN HYE-IN , KIM KYUNG-JUN , SHIN SE-JIN
发明人： SEONG HYE-RAN , PARK CHAN-HYO , OH DONG-HYUN , SHIN HYE-IN , KIM KYUNG-JUN , SHIN SE-JIN
IPC分类号： G03F7/039
CPC分类号： G03F7/0233 , H01L51/5237 , H01L51/5253
摘要： The present invention relates to a positive photosensitive polyimide composition that includes polyimide, a polyamic acid, and a photoactive compound. An organic insulating layer for organic light-emitting devices (OLED), which includes the positive photosensitive polyimide composition, may control a taper angle and outgassing, and has excellent adhesion in respects to a substrate, water repellent control ability, and storage stability and the like.
摘要翻译：本发明涉及包括聚酰亚胺，聚酰胺酸和光敏化合物的正型光敏聚酰亚胺组合物。包含正性光敏聚酰亚胺组合物的有机发光器件（OLED）用有机绝缘层可以控制锥角和释气，并且相对于基板具有优异的粘附性，防水控制能力和储存稳定性，并且喜欢。

5. 发明申请

WO2009125945A3 PHOTORESIST STRIPPER COMPOSITION, AND A PHOTORESIST PEELING METHOD EMPLOYING THE SAME 审中-公开
标题翻译：光刻胶剥离剂组合物和采用相同光刻胶剥离方法
公开(公告)号：WO2009125945A3
公开(公告)日：2009-12-30
申请号：PCT/KR2009001728
申请日：2009-04-03
申请人： LG CHEMICAL LTD , PARK MIN-CHOON , MIN SUNG-JOON , KIM KYUNG-JUN , HAN HEE , KWON HYOK-JOON
发明人： PARK MIN-CHOON , MIN SUNG-JOON , KIM KYUNG-JUN , HAN HEE , KWON HYOK-JOON
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , G03F7/426
摘要： The present invention relates to a stripper composition for photoresists. More specifically, the present invention relates to a photoresist stripper composition which has an outstanding photoresist peeling ability and is able to peel large volumes of photoresist even in relatively small amounts, and which can be employed even under high-temperature processing conditions, and which also does not react with other components within the composition and does not produce unnecessary by-products. The present invention also relates to a photoresist peeling method employing the photoresist stripper composition.
摘要翻译：本发明涉及光刻胶剥离剂组合物。更具体地说，本发明涉及一种光致抗蚀剂剥离剂组合物，其具有优异的光刻胶剥离能力并且即使在相对较小的量下也能够剥离大量的光刻胶，并且甚至在高温处理条件下也可以使用，并且还不与组合物中的其他组分反应并且不产生不必要的副产物。本发明还涉及采用光刻胶剥离剂组合物的光刻胶剥离方法。

6. 发明申请

WO2009002058A2 METHOD FOR MANUFACTURING CAPACITOR OF SEMICONDUCTOR 审中-公开
标题翻译：制造半导体电容器的方法
公开(公告)号：WO2009002058A2
公开(公告)日：2008-12-31
申请号：PCT/KR2008003553
申请日：2008-06-23
申请人： LG CHEMICAL LTD , HAN HEE , KIM KYUNG-JUN , CHOI BYUNG-KYU
发明人： HAN HEE , KIM KYUNG-JUN , CHOI BYUNG-KYU
IPC分类号： H01L27/108
CPC分类号： H01L28/60
摘要： The present invention relates to a method of producing a semiconductor capacitor, and more particularly, to a method of producing a semiconductor capacitor, in which an electroless plating is performed during the production of a lower electrode to form a lower electrode.
摘要翻译：本发明涉及一种制造半导体电容器的方法，更具体地说，涉及制造半导体电容器的方法，其中在制造下电极时进行化学镀以形成下电极。

7. 发明申请

WO2012008736A3 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND BLACK BANK OF AN ORGANIC LIGHT-EMITTING DEVICE INCLUDING SAME 审中-公开
标题翻译：有机发光装置的正型感光树脂组合物和黑色银行
公开(公告)号：WO2012008736A3
公开(公告)日：2012-05-03
申请号：PCT/KR2011005106
申请日：2011-07-12
申请人： LG CHEMICAL LTD , KIM SANG-WOO , SHIN SE-JIN , KIM KYUNG-JUN
发明人： KIM SANG-WOO , SHIN SE-JIN , KIM KYUNG-JUN
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0233 , G03F7/20 , H01L27/3246 , H01L27/3251 , H01L51/0018 , H01L51/5284
摘要： The present invention relates to a positive-type photosensitive resin composition and a black bank of an organic light-emitting device including same. More specifically, the positive-type photosensitive resin composition black bank for an organic light-emitting device according to the present invention has a black matrix function without the need for additional processes, so that the manufacturing process for an organic light-emitting device may be simplified and the visibility of same may be dramatically improved.
摘要翻译：本发明涉及一种正型感光性树脂组合物和包含其的有机发光装置的黑色组。更具体地说，根据本发明的有机发光装置的正型感光性树脂组合物黑库具有黑矩阵功能而不需要额外的处理，因此有机发光装置的制造过程可以是简化并且可以显着改善其可视性。

8. 发明申请

WO2011139073A3 NEGATIVE PHOTORESIST COMPOSITION, AND METHOD FOR PATTERNING DEVICE 审中-公开
标题翻译：负面光电组合物，以及用于绘制装置的方法
公开(公告)号：WO2011139073A3
公开(公告)日：2012-03-22
申请号：PCT/KR2011003306
申请日：2011-05-03
申请人： LG CHEMICAL LTD , PARK CHAN-HYO , KIM KYUNG-JUN , KIM YU-NA
发明人： PARK CHAN-HYO , KIM KYUNG-JUN , KIM YU-NA
IPC分类号： G03F7/004 , H01L21/027
CPC分类号： G03F7/0384 , G03F7/0045 , G03F7/0382 , G03F7/30 , G03F7/38 , G03F7/40
摘要： The present invention relates to a negative photoresist composition which shows excellent sensitivity and enables formation of a satisfactory photoresist pattern having a reverse tapered shape, thereby enabling effective patterning of various thin films during a manufacturing process of a device and capable of being easily removed after patterning, and a method for patterning a device. The photoresist composition comprises: an alkali-soluble binder resin; a first photoacid generator containing a halogen atom; a triazine-based second photoacid generator; a crosslinking agent containing an alkoxy structure; and a solvent.
摘要翻译：本发明涉及一种负光致抗蚀剂组合物，其显示出优异的灵敏度并且能够形成具有倒锥形形状的令人满意的光致抗蚀剂图案，从而能够在器件的制造过程中有效地构图各种薄膜，并且能够在图案化之后容易地除去，以及用于图案化装置的方法。光致抗蚀剂组合物包括：碱溶性粘合剂树脂; 含有卤素原子的第一种光致酸产生剂; 基于三嗪的第二光酸产生剂; 含有烷氧基结构的交联剂; 和溶剂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式