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1. 发明申请

WO2009011532A2 APPARATUS, METHOD FOR DEPOSITING THIN FILM ON WAFER AND METHOD FOR GAP-FILLING TRENCH USING THE SAME 审中-公开
标题翻译：装置，用于在薄膜上沉积薄膜的方法和使用该方法的填充玻璃的方法
公开(公告)号：WO2009011532A2
公开(公告)日：2009-01-22
申请号：PCT/KR2008004131
申请日：2008-07-14
申请人： IPS LTD , PARK SANG-JUN , HAN CHANG-HEE , LEE HO-YOUNG , JEONG SEONG-HOE
发明人： PARK SANG-JUN , HAN CHANG-HEE , LEE HO-YOUNG , JEONG SEONG-HOE
IPC分类号： H01L21/205
CPC分类号： C23C16/4584 , C23C16/045 , C23C16/4554 , C23C16/45548 , C23C16/45565 , C23C16/45574 , H01J37/3244 , H01J37/32449 , H01J2237/332 , H01J2237/334 , H01L21/02164 , H01L21/02274 , H01L21/0228 , H01L21/31612
摘要： Provided are an apparatus and method for depositing a thin film, and a method for gap-filling a trench in a semiconductor device. The thin film depositing apparatus includes a plurality of substrates provided on the same space inside a reactor, wherein deposition of the thin film and partial etching of the deposited thin film are repeated to form the thin film on the plurality of substrates by exposing the substrates to two or more source gases and an etching gas supplied together at predetermined time intervals while rotating the substrates. According to exemplary embodiments, it is possible to concurrently or alternatively perform deposition and etching of a thin film, so that a thin film with good gap-fill capability can be deposited.
摘要翻译：提供了一种用于沉积薄膜的装置和方法，以及用于在半导体器件中间隙填充沟槽的方法。薄膜沉积设备包括设置在反应器内的相同空间上的多个基板，其中重复沉积薄膜和沉积的薄膜的部分蚀刻，以通过将基板暴露于多个基板而在多个基板上形成薄膜在旋转基板的同时以预定的时间间隔一起供应两种或更多种源气体和蚀刻气体。根据示例性实施例，可以同时或替代地执行薄膜的沉积和蚀刻，使得可以沉积具有良好间隙填充能力的薄膜。

2. 发明申请

WO2010067974A3 APPARATUS FOR TREATING MULTIPLE SUBSTRATES 审中-公开
标题翻译：治疗多种基质的装置
公开(公告)号：WO2010067974A3
公开(公告)日：2010-08-05
申请号：PCT/KR2009007004
申请日：2009-11-26
申请人： IPS LTD , HWANG HUI , HEO PIL-WOONG , SEO TAE-WOOK , PARK SANG-JUN , LEE HO-YOUNG , KIM YOUNG-JUN
发明人： HWANG HUI , HEO PIL-WOONG , SEO TAE-WOOK , PARK SANG-JUN , LEE HO-YOUNG , KIM YOUNG-JUN
IPC分类号： H01L21/205 , H01L21/00
CPC分类号： H01L21/68764 , C23C16/45565 , H01L21/68771
摘要： The present invention relates to an apparatus for treating multiple substrates, having an improved structure to deposit a thin film on substrates with a uniform thickness, and to arrange a shower head in an easy manner. The apparatus for treating multiple substrates according to the present invention comprises: a chamber having an interior with a space for processing; a substrate support which is installed in the space of the chamber, and which has a plurality of mounting portions along the circumferential direction of the upper surface thereof to enable substrates to be mounted in the respective mounting portions; and a shower head which is radially disposed onto the substrate support, and which has a plurality of material gas spray units for spraying material gas onto the substrates. The material gas spray units are equipped with a plurality of nozzles for spraying material gas in such a manner that the amount of material gas being sprayed increases as it goes from the center toward the corner of the substrate support.
摘要翻译：本发明涉及一种用于处理多个基板的设备，其具有改进的结构以在基板上以均匀的厚度沉积薄膜并且以简单的方式布置喷头。根据本发明的用于处理多个基板的设备包括：腔室，其具有用于处理的空间; 衬底支撑件，其安装在腔室的空间中，并且沿着衬底支撑件的上表面的圆周方向具有多个安装部分，以使得衬底能够安装在相应的安装部分中; 以及沿径向布置在基板支撑件上并具有用于将材料气体喷射到基板上的多个材料气体喷射单元的喷头。材料气体喷射单元配备有多个喷射材料气体的喷嘴，使得喷射的材料气体的量随着从基板支撑件的中心朝向角部而增加。

3. 发明申请

WO2009104878A3 VACUUM CLEANER AND DUST SEPARATION APPARATUS THEREOF 审中-公开
标题翻译：真空清洁器和灰尘分离装置
公开(公告)号：WO2009104878A3
公开(公告)日：2009-10-29
申请号：PCT/KR2009000689
申请日：2009-02-12
申请人： LG ELECTRONICS INC , JI HEON-PYEONG , YANG HAE-SEOCK , HYUN YOUNG-MIN , KWON HYUK-JOO , SHIN HYO-CHURL , PARK SANG-JUN , SEO JIN-WOOK
发明人： JI HEON-PYEONG , YANG HAE-SEOCK , HYUN YOUNG-MIN , KWON HYUK-JOO , SHIN HYO-CHURL , PARK SANG-JUN , SEO JIN-WOOK
IPC分类号： A47L9/16
CPC分类号： A47L9/108 , A47L9/00
摘要： Provided is a dust separation apparatus of a vacuum cleaner. The apparatus includes a dust-collecting body defining a dust-storing part, a compressing member configured to compress dust stored in the dust-collecting body, and a lower cover on a lower side of the dust-collecting body, the lower cover opening and closing the dust-storing part.
摘要翻译：提供了一种吸尘器的灰尘分离装置。该装置包括限定了灰尘收集部的灰尘收集主体，构造为压缩存储在灰尘收集主体中的灰尘的压缩构件以及位于灰尘收集主体的下侧的下盖，下盖开口和关闭灰尘储存部分。

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