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1. 发明申请

WO2005007924A1 SPUTTERING TARGET CONSTRUCTIONS 审中-公开
标题翻译：溅射目标结构
公开(公告)号：WO2005007924A1
公开(公告)日：2005-01-27
申请号：PCT/US2004/021362
申请日：2004-07-02
申请人： HONEYWELL INTERNATIONAL INC. , HORT, Werner, H. , JAEYEON, Kim
发明人： HORT, Werner, H. , JAEYEON, Kim
IPC分类号： C23C14/34
CPC分类号： H01J37/3414 , C23C14/3407 , H01J37/3435
摘要： The invention includes a physical vapor deposition target having an inner radial portion which has a radius extending from a center point of the target to an outer edge of a sputtering region. The deposition target has a flange region surrounding the inner radial portion. Two channels are positioned within the flange region with one of the channels being configured to receive an o-ring. The invention also includes a sputtering target having a flange region with a planar flange surface and having an o-ring channel disposed within the flange region. The o-ring channel has a pair of opposing channel walls and a base surface with a portion of the base surface being non-parallel relative to the planar flange surface. Invention further includes a physical vapor deposition target backing plate having an o-ring groove and a stress relief groove, and target assemblies which utilize such backing plate.
摘要翻译：本发明包括具有内径向部分的物理气相沉积靶，其具有从靶的中心点延伸到溅射区的外边缘的半径。沉积靶具有围绕内部径向部分的凸缘区域。两个通道位于凸缘区域内，其中一个通道被配置为接收O形环。本发明还包括具有凸缘区域的溅射靶，其具有平坦的凸缘表面并且具有设置在凸缘区域内的O形环通道。 O形环通道具有一对相对的通道壁和基部表面，其中基部表面的一部分相对于平面凸缘表面不平行。本发明还包括具有O形环槽和应力释放槽的物理气相沉积靶背衬板和利用这种背板的靶组件。

2. 发明申请

WO2005026408A2 METHODS OF TREATING DEPOSITION PROCESS COMPONENTS TO FORM PARTICLE TRAPS, AND DEPOSITION PROCESS COMPONENTS HAVING PARTICLE TRAPS THEREON 审中-公开
标题翻译：处理形成颗粒物的沉积工艺组分的方法和具有颗粒物的沉积过程组分
公开(公告)号：WO2005026408A2
公开(公告)日：2005-03-24
申请号：PCT/US2004/029387
申请日：2004-09-10
申请人： HONEYWELL INTERNATIONAL INC. , JAEYEON, Kim , SAYLES, Scott, R. , KARDOKUS, Janine, K. , PHELAN, Terry, J.
发明人： JAEYEON, Kim , SAYLES, Scott, R. , KARDOKUS, Janine, K. , PHELAN, Terry, J.
IPC分类号： C23C14/56
CPC分类号： C23C14/564 , B24C1/00 , B24C11/00 , C23C14/3407 , C23C16/4404
摘要： The invention includes methods for forming particle traps along surfaces of PVD components, and comprises PVD components having particle traps thereon. The invention can include utilization of highly soluble media for bead-blasting and/or can include utilization of metallic materials as bead-blasting media. The invention can also include formation of an insert along regions of a backing plate where particle traps are desired, with the insert being of a composition which has better particle-trapping properties than the backing plate.
摘要翻译：本发明包括沿着PVD组分的表面形成颗粒捕集器的方法，并且包括在其上具有颗粒捕集器的PVD组分。本发明可以包括利用用于珠粒喷射的高可溶性介质和/或可以包括使用金属材料作为珠粒喷射介质。本发明还可以包括沿着需要颗粒捕集器的背板的区域形成插入物，其中插入物具有比背板更好的颗粒捕获性质的组合物。

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