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1. 发明申请

WO2011090692A2 PRETREATMENT PROCESS FOR ALUMINUM AND HIGH ETCH CLEANER USED THEREIN 审中-公开
标题翻译：在其中使用的铝和高度清洁剂的预处理方法
公开(公告)号：WO2011090692A2
公开(公告)日：2011-07-28
申请号：PCT/US2010062125
申请日：2010-12-27
申请人： HENKEL AG & CO KGAA , KAPIC EDIS , SIENKOWSKI MICHAEL , GOODREAU BRUCE H , CORNEN SOPHIE
发明人： KAPIC EDIS , SIENKOWSKI MICHAEL , GOODREAU BRUCE H , CORNEN SOPHIE
IPC分类号： C23F1/20 , C23F17/00
CPC分类号： C23G1/22 , C11D7/06 , C11D7/265 , C11D7/3245 , C11D11/0029 , C23C22/78 , C23F1/36
摘要： Disclosed is a high etch cleaner for aluminum and aluminum alloy substrates that leads to enhanced corrosion protective performance of a variety of anti-corrosion pretreatments. The cleaner comprises very low levels of silicate of from 0 to 250 ppm, 50 to 500 ppm of at least one chelator selected from EDTA or its salts, NTA or its salts, DTPA or its salts, iminodisuccinic acid or its salts, EDDS or its salts, tartaric acid or its salts, or a mixture thereof, and has a high pH of from 11.0 to 13.5. Preferably the cleaner is used to etch from 0.5 to 4.0 grams per meter squared from the substrates. Substrates treated with the cleaner and then coated with a variety of anti-corrosion pretreatments and outer coatings show enhanced corrosion resistance compared to substrates cleaned with standard cleaners that have low etch rates, high silicate levels and no chelating agents followed by anti-corrosion pretreatments and outer coatings.
摘要翻译：公开了用于铝和铝合金基底的高蚀刻清洁剂，其导致各种防腐蚀预处理的增强的防腐蚀性能。该清洁剂包含非常低含量的0-250ppm硅酸盐，50-500ppm至少一种螯合剂，选自EDTA或其盐，NTA或其盐，DTPA或其盐，亚氨基二琥珀酸或其盐，EDDS或其盐盐，酒石酸或其盐，或其混合物，并且具有11.0至13.5的高pH。优选地，清洁器用于从基底每平方米0.5到4.0克的蚀刻。与使用标准清洁剂清洁的基材相比，使用清洁剂处理过的基材经过多种防腐蚀预处理和外涂层处理后表现出更强的耐腐蚀性，标准清洁剂的蚀刻速率较低，硅酸盐含量较高，不含螯合剂，接着进行防腐蚀预处理，外涂层。

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