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1. 发明申请

WO2014170697A1 CRACKER VALVE CONTROL 审中-公开
标题翻译：破碎阀控制
公开(公告)号：WO2014170697A1
公开(公告)日：2014-10-23
申请号：PCT/GB2014/051241
申请日：2014-04-22
申请人： GENCOA LTD , NANO4ENERGY SLNE
发明人： BELLIDO-GONZALEZ, Victor , MONAGHAN, Dermot Partick , BRINDLEY, Joseph , DANIEL, Benoit , FERNÁNDEZ, Iván , WENNBERG, Ambiörn , BRIONES, Fernando
IPC分类号： C23C14/24 , C30B23/00 , C30B23/06
CPC分类号： C23C14/24 , C23C14/0021 , C23C14/0036 , C23C14/243 , C23C16/455 , C23C16/45523 , C30B23/005 , C30B23/066 , H01J37/32449 , H01J37/3405
摘要： This invention relates to the control of cracker valves for the injection of reactants into a reaction system and the control method of such valves, reactants, processes and systems. The present invention also relates to sensors, actuators and algorithms involved in such systems. According to the present invention a control feedbackmethod of cracker valve is disclosed. Cracker valves could be operated in continuous or pulsed mode or a combination of those modes. Pulsed frequencies of vapour in the process of the present invention could be, although not exclusively, from 1 Hz to 100 kHz. Different pulsed packages are also part of the present invention. The frequency (or period), time on/off, amplitude, maximum and minimum input values and phase of each pulse could also be varied according to the present invention. A feedback controller able to control in open loop or closed loop mode the totality or any one of the pulses is also part of the present invention.
摘要翻译：本发明涉及用于将反应物注入反应体系的裂化器阀的控制以及这些阀，反应物，过程和系统的控制方法。本发明还涉及这种系统中涉及的传感器，致动器和算法。根据本发明，公开了一种裂解阀的控制反馈方法。破碎阀可以连续或脉冲模式或这些模式的组合操作。在本发明的方法中，蒸气的脉冲频率虽然不是排他地可以是1Hz至100kHz。不同的脉冲包装也是本发明的一部分。根据本发明，频率（或周期），时间开/关，振幅，最大和最小输入值以及每个脉冲的相位也可以变化。能够以开环或闭环模式控制的反馈控制器的总体或任何一个脉冲也是本发明的一部分。

2. 发明申请

WO2019038531A1 IMPROVEMENTS IN AND RELATING TO COATING PROCESSES 审中-公开
公开(公告)号：WO2019038531A1
公开(公告)日：2019-02-28
申请号：PCT/GB2018/052369
申请日：2018-08-21
申请人： GENCOA LTD , NANO4ENERGY SLNE
发明人： BELLIDO-GONZALEZ, Victor , FERNÁNDEZ, Iván , WENNBERG, Ambiörn , MONAGHAN, Dermot Partick
IPC分类号： H01J37/32 , H01J37/34 , C23C14/34 , C23C14/35
摘要： An apparatus (lb) and method of depleting a plasma of electrons in a plasma coating apparatus is disclosed. The invention involves generating a plasma comprising ions (9), particulate material (5) and electrons (6) adjacent a target (4); forming a plasma trap (52) to constrain the plasma near to the target (4), and depleting the plasma of electrons by: providing an additional magnetic field (8b) that is superimposed over the magnetic field of the plasma trap (3, 52), which extends beyond a boundary layer (52) of the plasma trap, and which draws electrons (6) from, or near to, the boundary layer (52) of the plasma trap away from the target (4). The invention proposes applying a baseline voltage (50) to the target (4); and by applying periodic voltage pulses (13b) to the target (4). The additional magnetic field (8b) depletes the plasma of electrons, such that when a voltage pulse (13b) is applied to the target (4), ions (9) can be ejected from the plasma with reduced electron shielding. This has been shown to improve ion bombardment and reduce adverse electron bombardment effects.

3. 发明申请

WO2014170503A1 PULSED VALVE CRACKER EFFUSION CELL 审中-公开
标题翻译：脉冲阀破碎机冲击细胞
公开(公告)号：WO2014170503A1
公开(公告)日：2014-10-23
申请号：PCT/EP2014/058142
申请日：2014-04-22
申请人： NANO4ENERGY SLNE
发明人： BRIONES, Fernando , FERNÁNDEZ, Iván , WENNBERG, Ambiörn
IPC分类号： C23C14/24 , C30B23/00 , C30B23/06
CPC分类号： C23C14/24 , C23C14/243
摘要： A pulsed valve cracker effusion cell comprising an evaporation chamber (11), a delivery system (13) and a conduit (20) in fluid communication with the evaporation chamber (11) and the delivery system (13), a high temperature heating element located in the conduit and a flow controller (17) for controlling the flux of a gas into the delivery system (13), characterised by the flow controller (17) comprising an on/off valve and a controller for controlling the on/off state of the valve. This invention relates to a pulsed valve cracker effusion cell for the injection of vapours generated by solid or liquid sublimation into a process system, mainly a vacuum system. The present invention also relates to the regulation of the vapour flow by means of an intermittent valve (17). The invention has been designed for linear and uniform injection of gases from solid or liquid sources, e.g. sulphur, tellurium, selenium etc. as an elemental atomized vapour.
摘要翻译：一种包括蒸发室（11），输送系统（13）和与所述蒸发室（11）和所述输送系统（13）流体连通的导管（20）的脉冲阀裂化器渗出池，位于以及用于控制气体进入输送系统（13）的通量的流量控制器（17），其特征在于，所述流量控制器（17）包括开/关阀和用于控制所述输入/关闭状态的控制器阀门。本发明涉及一种用于将由固体或液体升华产生的蒸汽注入到主要是真空系统的处理系统中的脉冲阀裂化器渗出池。本发明还涉及通过间歇阀（17）调节蒸汽流量。本发明被设计用于从固体或液体源（例如，硫，碲，硒等作为元素雾化蒸气。

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