专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2003043059A2 ADVANCED PROCESS CONTROL FOR IMMERSION PROCESSING 审中-公开
标题翻译：高级加工过程控制
公开(公告)号：WO2003043059A2
公开(公告)日：2003-05-22
申请号：PCT/US2002/035748
申请日：2002-11-07
申请人： FSI INTERNATIONAL, INC.
发明人： SIEFERING, Kevin, L. , GROTHE, Phillip, A. , BECKER, David, S.
IPC分类号： H01L21/00
CPC分类号： H01L21/67253 , H01L21/67086 , Y10T137/2509
摘要： The present invention provides immersion chemical processing systems capable of providing a desired blend of at least two chemicals to an immersion bath as well as methods of treating substrates immersively. The system is capable of producing a blend with one or more desired properties extremely accurately due at least in part to the capability of the system to monitor at least one property of the blend or at least one parameter of the immersion process and to utilize the information gathered to provide dynamic closed-loop feedback control of one or more process parameters known to relate to the same.
摘要翻译：本发明提供能够提供至少两种化学物质至浸液的所需混合物的浸没式化学处理系统，以及沉浸式处理底物的方法。该系统能够至少部分地由于系统监测混合物的至少一个性质或浸入过程的至少一个参数的能力以及使用该信息而能够非常准确地产生具有一种或多种期望特性的混合物聚集以提供已知与之相关的一个或多个过程参数的动态闭环反馈控制。

2. 发明申请

WO2003043059A3 ADVANCED PROCESS CONTROL FOR IMMERSION PROCESSING 审中-公开
公开(公告)号：WO2003043059A3
公开(公告)日：2003-05-22
申请号：PCT/US2002/035748
申请日：2002-11-07
申请人： FSI INTERNATIONAL, INC.
发明人： SIEFERING, Kevin, L. , GROTHE, Phillip, A. , BECKER, David, S.
IPC分类号： H01L21/00
摘要： The present invention provides immersion chemical processing systems capable of providing a desired blend of at least two chemicals to an immersion bath as well as methods of treating substrates immersively. The system is capable of producing a blend with one or more desired properties extremely accurately due at least in part to the capability of the system to monitor at least one property of the blend or at least one parameter of the immersion process and to utilize the information gathered to provide dynamic closed-loop feedback control of one or more process parameters known to relate to the same.

3. 发明申请

WO1998028107A1 ROTATABLE AND TRANSLATABLE SPRAY NOZZLE 审中-公开
标题翻译：可旋转和可翻译的喷雾喷嘴
公开(公告)号：WO1998028107A1
公开(公告)日：1998-07-02
申请号：PCT/US1997023368
申请日：1997-12-19
申请人： FSI INTERNATIONAL, INC.
发明人： FSI INTERNATIONAL, INC. , WAGENER, Thomas, J. , SIEFERING, Kevin, L. , KUNKEL, Pamela, A. , WEYGAND, James, F. , THOMES, Gregory, P.
IPC分类号： B24C01/00
CPC分类号： H01L21/67051 , B05B1/005 , B05B1/20 , B24C1/003 , B24C3/322 , B24C5/04
摘要： A nozzle (18) having a series of orifices (40) along a longitudinal length of the nozzle for processing a substrate (1, 12) and which is rotatably adjustable. By the nozzle design of the present invention, liquid is properly distributed along the longitudinal length of the nozzle (18) independently of the angle of the aerosol spray. This allows for the generation of a uniform aerosol stream that is independent of spray angle. The nozzle design of the present invention improves the uniform distribution of liquid within the nozzle (18), which in addition to providing a more uniform liquid pooling, also substantially eliminates temporal non-uniformities across the nozzle length. Moreover, the present invention is also directed to a nozzle (18) that is translatable in the direction (B) toward or away from the substrate (1, 12) to be processed or parallel to the substrate surface. The nozzle (18) includes a series of impingement orifices (40) provided in a longitudinal direction along at least a part of the nozzle, wherein the nozzle has an interior longitudinally divided into first and second internal cavities (104, 106) with plural openings (108) between the first and second internal cavities (104, 106), and the openings (108) between the first and second cavities are oriented at a different radial angle from the longitudinal axis than the radial angle of the impingement orifices. Preferably, the nozzle (18) comprises an inner tube (100) and an outer tube (90) operatively supported and connected with respect to one another. The present invention is also directed to the combination of such a nozzle (18) that is rotationally (A) and translatable (B) adjustable independently from one another.
摘要翻译：一种喷嘴（18），其具有沿着所述喷嘴的纵向长度的一系列孔口（40），用于处理基板（1,2）并且可旋转地调节。通过本发明的喷嘴设计，独立于气溶胶喷雾的角度，液体沿着喷嘴（18）的纵向长度适当地分布。这允许产生独立于喷雾角度的均匀气溶胶流。本发明的喷嘴设计改善了喷嘴（18）内的液体的均匀分布，除了提供更均匀的液体汇集之外，基本上消除了喷嘴长度上的时间不均匀性。此外，本发明还涉及一种喷嘴（18），该喷嘴可以朝向或远离待处理或平行于衬底表面的衬底（1,2）的方向（B）移动。喷嘴（18）包括沿喷嘴的至少一部分沿长度方向设置的一系列冲击孔（40），其中喷嘴具有纵向分成具有多个开口的第一和第二内部空腔（104,106）的内部（108）在第一和第二内部空腔（104,106）之间，并且第一和第二空腔之间的开口（108）被定向成与所述纵向轴线不同于所述冲击孔的径向角度的径向角度。优选地，喷嘴（18）包括可操作地支撑并相对于彼此连接的内管（100）和外管（90）。本发明还涉及这样一种旋转（A）和可平移（B）的喷嘴（18）的组合，可以彼此独立地调节。

4. 发明申请

WO2003041880A1 SEMICONDUCTOR WAFER CLEANING SYSTEMS AND METHODS 审中-公开
标题翻译：半导体清洗系统和方法
公开(公告)号：WO2003041880A1
公开(公告)日：2003-05-22
申请号：PCT/US2002/036168
申请日：2002-11-12
申请人： FSI INTERNATIONAL, INC.
发明人： HERBST, Tim, W. , MACIEJ, Todd , GAST, Tracy, A. , WAGENER, Thomas, J. , SIEFERING, Kevin, L.
IPC分类号： B08B3/00
CPC分类号： H01L21/67313 , H01L21/67057 , H01L21/67086 , Y10S134/902
摘要： A microelectronic substrate handling device comprising first and second support structures spaced from each other, the first support structure having a series of upper teeth defining a series of upper notches extending along a length of the first support structure and a series of lower teeth defining a series of lower notches extending along a length of the first support structure, each of the upper and lower notches opening toward the second support structure, wherein the upper and lower notches are offset from each other by a predetermined offset distance so that an edge of a microelectronic device will fit differently within the upper and lower notches of the first support structure when supported between the first and second support structures.
摘要翻译：一种微电子衬底处理装置，包括彼此间隔开的第一和第二支撑结构，所述第一支撑结构具有一系列上部齿，所述上部齿限定了沿着所述第一支撑结构的长度延伸的一系列上部缺口，以及限定一系列的一系列下部齿下槽口沿着第一支撑结构的长度延伸，每个上槽口和下槽口朝向第二支撑结构开口，其中上下槽口彼此偏移预定的偏移距离，使得微电子的边缘当支撑在第一和第二支撑结构之间时，装置将在第一支撑结构的上部和下部凹口内不同地配合。

5. 发明申请

WO1998010893A1 AERODYNAMIC AEROSOL CHAMBER 审中-公开
标题翻译：航空航天器
公开(公告)号：WO1998010893A1
公开(公告)日：1998-03-19
申请号：PCT/US1997016016
申请日：1997-09-10
申请人： FSI INTERNATIONAL, INC. , INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人： FSI INTERNATIONAL, INC. , INTERNATIONAL BUSINESS MACHINES CORPORATION , NARAYANSWAMI, Natraj , WAGENER, Thomas, J. , SIEFERING, Kevin, L. , CAVALIERE, William, A.
IPC分类号： B24C03/32
CPC分类号： H01L21/67028 , B08B15/023 , B24C1/003 , B24C3/322 , B24C9/003
摘要： An aerosol cleaning apparatus (10) and a method of treating a substrate within such an apparatus prevent contaminant recirculation by controlling the post impingement exhaust flow through control of the aerodynamic behavior of the contaminant laden exhaust stream. By the present invention, the post-impingement exhaust flow is divided into two streams (A, B). A first stream (A) is the main stream flowing initially over the contaminated side of the wafer (12) and carrying most of the suspended contaminants (4) into the exhaust. The second stream (B) flows initially over the cleaned side of the wafer (12) and eventually into the exhaust stream. A flow separator (34) is provided for dividing the post-impingement aerosol spray into plural flow streams (A, B). Additionally, the aerosol chamber (16) can advantageously include a shroud (36) positioned within the aerosol chamber (16) just to the side of the nozzle (18) but further away from the exhaust (20) than the nozzle (18) for restricting flow from the second post-impingement stream around the nozzle and into the first post-impingement stream. In accordance with a preferred embodiment, the apparatus is designed for cleaning the surface of a semiconductor wafer (12) by impinging the surface with a cryogenic aerosol spray.
摘要翻译：气溶胶清洁装置（10）和处理这种装置内的基板的方法通过控制负载污染物排气流的空气动力学行为来控制后冲击排气流来防止污染物再循环。通过本发明，后冲击排气流被分成两股流（A，B）。第一流（A）是最初流过晶片（12）的污染侧的主流，并将大部分悬浮的污染物（4）运送到排气中。第二流（B）最初流过晶片（12）的清洁侧并且最终流入排气流中。提供流动分离器（34），用于将后冲击气溶胶喷雾分成多个流动流（A，B）。另外，气溶胶室（16）可以有利地包括位于喷雾室（16）内的护罩（36），其刚好在喷嘴（18）的侧面，但远离排气（20）而不是喷嘴（18），用于限制从喷嘴周围的第二后冲击流流入第一后冲击流。根据优选实施例，该设备被设计用于通过用低温气溶胶喷雾冲击该表面来清洁半导体晶片（12）的表面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式