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    • 3. 发明申请
    • SEMICONDUCTOR DEVICE WITH UNDER-FILLED HEAT EXTRACTOR
    • 具有下填充热萃取器的半导体器件
    • WO2008011210A1
    • 2008-01-24
    • PCT/US2007/067916
    • 2007-05-01
    • FREESCALE SEMICONDUCTOR INC.CHUNG, Young SirBAIRD, Robert W.
    • CHUNG, Young SirBAIRD, Robert W.
    • H01L21/02
    • H01L29/0657H01L21/84H01L23/3677H01L2924/0002H01L2924/12044H01L2924/3011H01L2924/00
    • Structure (40, 61-13, 61-15, 61-18, 61-19) and method (60-5... 60-19, 100, 200) are provided for a semiconductor device (40, 61-13, 61-15, 61-18, 61-19) with under-filled heat extractor(s) (46, 46', 78, 78'). The device (40, 61-13, 61-15, 61-18, 61-19) comprises a substrate (48, 72) with upper (37) and lower (63, 73) surfaces. A semiconductor (38, 72) is located proximate the upper surface (37) with a device region (26) therein. One or more cavities (67, 77) underlying the device region (26) are etched in the substrate (48, 72) from the lower surface (63, 73). A higher thermal conductivity material (68) versus the substrate (48, 72) fills the one or more cavities (67) and has an exposed surface (69, 69', 79, 79') underlying the device region (26) at or beyond the lower surface (63, 73). This provides the under-filled heat extractor(s) (46, 46', 78, 78'). A composite substrate (48) is preferred, having a first semiconductor (38) extending to the upper surface (37) containing the device region (26), a second semiconductor (42) extending to the lower surface (63) and an insulating layer (36) therebetween, wherein the one or more cavities (67) extend from the lower surface (63) to the insulating layer (36) and the etch depth (671) is self limiting.
    • 提供了一种半导体器件(40,61-13,61-19,61-15,61-18,61-19)和方法(60-5 ... 60-19,100,200) (46,46',78,78')。 装置(40,61-13,61-15,61-18,61-19)包括具有上(37)和下(63,73)表面的基底(48,72)。 半导体(38,72)位于靠近上表面(37)处,其中具有器件区域(26)。 下部表面(63,73)在衬底(48,72)中蚀刻位于器件区域(26)下面的一个或多个腔体(67,77)。 较高的导热材料(68)相对于基底(48,72)填充一个或多个空腔(67),并且在装置区域(26)下方的暴露表面(69,69',79,79')处于或 超出下表面(63,73)。 这提供了未填充的散热器(46,46',78,78')。 复合衬底(48)是优选的,具有延伸到包含器件区域(26)的上表面(37)的第一半导体(38),延伸到下表面(63)的第二半导体(42)和绝缘层 (36),其中所述一个或多个空腔(67)从所述下表面(63)延伸到所述绝缘层(36),并且所述蚀刻深度(671)是自限制的。
    • 7. 发明申请
    • MAGNETIC TUNNEL JUNCTION SENSOR METHOD
    • 磁性隧道结传感器方法
    • WO2007018811A2
    • 2007-02-15
    • PCT/US2006/025259
    • 2006-06-28
    • FREESCALE SEMICONDUCTORCHUNG, Young SirBAIRD, Robert W.
    • CHUNG, Young SirBAIRD, Robert W.
    • H01L21/00
    • G01R33/093B82Y25/00B82Y40/00G01R33/098G11C11/16H01F41/307
    • Methods and apparatus are provided for sensing physical parameters. The apparatus (30) comprises a magnetic tunnel junction (MTJ) (32) and a magnetic field source (34) whose magnetic field (35) overlaps the MTJ and whose proximity to the MTJ varies in response to an input to the sensor. The MTJ comprises first and second magnetic electrodes (36, 38) separated by a dielectric (37) configured to permit significant tunneling conduction therebetween. The first magnetic electrode has its spin axis pinned and the second magnetic electrode has its spin axis free. The magnetic field source is oriented closer to the second magnetic electrode than the first magnetic electrode. The overall sensor dynamic range is extended by providing multiple electrically coupled sensors receiving the same input but with different individual response curves and desirably but not essentially formed on the same substrate.
    • 提供了用于感测物理参数的方法和设备。 装置(30)包括磁性隧道结(MTJ)(32)和磁场源(34),磁性源的磁场(35)与MTJ重叠,并且其与MTJ的接近度响应于到传感器的输入而变化。 MTJ包括由电介质(37)分开的第一和第二磁电极(36,38),电介质(37)配置为允许其间的显着的隧道传导。 第一磁性电极的自旋轴固定,第二磁性电极的自旋轴自由。 磁场源比第一磁性电极更靠近第二磁性电极。 整个传感器动态范围通过提供多个电耦合传感器来扩展,所述多个电耦合传感器接收相同的输入但具有不同的单独响应曲线并且理想地但不基本形成在相同衬底上。
    • 8. 发明申请
    • TUNNEL JUNCTION SENSOR WITH MAGNETIC CLADDING
    • 隧道式连接传感器
    • WO2007016010A2
    • 2007-02-08
    • PCT/US2006/028574
    • 2006-07-24
    • FREESCALE SEMICONDUCTORCHUNG, Young SirBAIRD, Robert W.
    • CHUNG, Young SirBAIRD, Robert W.
    • G11B5/127G11B5/33
    • G01R33/06B82Y25/00G01R33/093G01R33/098
    • Methods and apparatus are provided for sensing physical parameters. The apparatus (30) comprises a magnetic tunnel junction (MTJ) [32] and a magnetic field source (34) whose magnetic field (35) overlaps the MTJ and whose proximity to the MTJ varies in response to an input to the sensor. A magnetic shield (33) is provided at least on a face of the MFS away from the MTJ. The MTJ comprises first and second magnetic electrodes (36, 38) separated by a dielectric (37) configured to permit significant tunneling conduction therebetween. The first magnetic region has its spin axis pinned and the second magnetic electrode has its spin axis free. The magnetic field source is oriented closer to the second magnetic electrode than the first magnetic electrode. The overall sensor dynamic range is extended by providing multiple electrically coupled sensors receiving the same input but with different individual response curves and desirably but not essentially formed on the same substrate.
    • 提供了用于感测物理参数的方法和装置。 该装置(30)包括一个磁性隧道结(MTJ)[32]和一个磁场源(34),其磁场(35)与MTJ重叠,并且其与MTJ的接近度响应于传感器的输入而变化。 至少在远离MTJ的MFS的面上设置磁屏蔽(33)。 MTJ包括由电介质(37)分开的第一和第二磁极(36,38),其被配置为允许它们之间的显着的隧道传导。 第一磁性区域的自旋轴被固定,第二磁极的自由轴自由。 磁场源比第一磁极更靠近第二磁极。 通过提供多个电耦合传感器来接收相同的输入但是具有不同的单个响应曲线并且期望地但不是基本上形成在相同的基板上来扩展总传感器动态范围。
    • 10. 发明申请
    • SUPERJUNCTION TRENCH DEVICE AND METHOD
    • 超级接合装置和方法
    • WO2008024572A2
    • 2008-02-28
    • PCT/US2007/073837
    • 2007-07-19
    • FREESCALE SEMICONDUCTOR INC.DE FRESART, Edouard D.BAIRD, Robert W.
    • DE FRESART, Edouard D.BAIRD, Robert W.
    • H01L21/336
    • H01L29/7813H01L29/0634H01L29/1054H01L29/165H01L29/42368H01L29/66734
    • Semiconductor structures and methods are provided for a semiconductor device (40) employing a superjunction structure (41) and overlying trench (91) with embedded control gate (48). The method comprises, forming (52-6, 52-9) interleaved first (70-1, 70-2, 70-3, 70-4, etc.) and second (74-1, 74-2, 74-3, etc.) spaced-apart regions of first (70) and second (74) semiconductor materials of different conductivity type and different mobilities so that, in a first embodiment, the second semiconductor material (74) has a higher mobility for the same carrier type than the first semiconductor material (70), and providing (52-14) an overlying third semiconductor material (82) in which a trench (90, 91) is formed with sidewalls (913) having thereon a fourth semiconductor material (87) that has a higher mobility than the third material (82), adapted to carry current (50) between source regions (86), through the fourth (87) semiconductor material in the trench (91) and the second semiconductor material (74) in the device drift space (42) to the drain (56). In a further embodiment, the first (70) and third (82) semiconductor materials are relaxed materials and the second (74) and fourth (87) semiconductor materials are strained semiconductor materials.
    • 半导体结构和方法被提供用于采用超级结结构(4​​1)并覆盖具有嵌入式控制栅极(48)的沟槽(91)的半导体器件(40)。 该方法包括:形成(52-6,52-9)交错的第一(70-1,70-2,70-3,70-4等)和第二(74-1,74-2,74-3) 等)第一半导体材料(70)和第二半导体材料(74)的不同导电类型和不同迁移率的半导体材料的间隔开的区域,使得在第一实施例中,第二半导体材料(74)对于同一载体 (70),以及提供(52-14)其中形成沟槽(90,91)的上覆的第三半导体材料(82),其上具有第四半导体材料(87)的侧壁(913) ,其具有比第三材料(82)更高的迁移率,适于在源极区域(86)之间,沟槽(91)中的第四(87)半导体材料和第二半导体材料(74)中承载电流(50) 器件漂移空间(42)流向漏极(56)。 在另一实施例中,第一(70)和第三(82)半导体材料是松弛材料,第二(74)和第四(87)半导体材料是应变半导体材料。