专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2011044198A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS 审中-公开
标题翻译：负责成像的元素
公开(公告)号：WO2011044198A1
公开(公告)日：2011-04-14
申请号：PCT/US2010/051578
申请日：2010-10-06
申请人： EASTMAN KODAK COMPANY , SIMPSON, Christopher , MULLER, Ursula , BAUMANN, Harold , DWARS, Udo
发明人： SIMPSON, Christopher , MULLER, Ursula , BAUMANN, Harold , DWARS, Udo
IPC分类号： G03F7/031 , B41C1/10 , G03F7/105
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/105 , Y10T428/24479
摘要： Negative-working imageable elements can be imaged and processed to provide lithographic printing plates. These imageable elements are sensitive to infrared radiation but are insensitive to "white" light and thus can be more easily handled under white light conditions. These properties are possible by incorporating a filter dye having a λ max of from 300 to 500 run into the imageable layer of the imageable elements.
摘要翻译：可以对负面工作的可成像元件进行成像和处理以提供平版印刷版。这些可成像元件对红外辐射敏感，但对“白”光不敏感，因此可以在白光条件下更容易处理。通过将具有300-500nm的λmax的滤光染料掺入到可成像元件的可成像层中，这些性质是可能的。

2. 发明申请

WO2010104560A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH OVERCOAT 审中-公开
标题翻译：负责工作的图像元素与OVERCOAT
公开(公告)号：WO2010104560A1
公开(公告)日：2010-09-16
申请号：PCT/US2010/000695
申请日：2010-03-08
申请人： EASTMAN KODAK COMPANY , SIMPSON, Christopher , BAUMANN, Harold , DWARS, Udo , STREHMEL, Bernd
发明人： SIMPSON, Christopher , BAUMANN, Harold , DWARS, Udo , STREHMEL, Bernd
IPC分类号： G03F7/09 , G03F7/11
CPC分类号： G03F7/092 , G03F7/11 , Y10T428/24802
摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.
摘要翻译：负性可成像元件可用于提供平版印刷版。可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。

3. 发明申请

WO2010008514A1 NEGATIVE-WORKING IMAGING ELEMENTS AND METHODS OF USE 审中-公开
标题翻译：负面工作成像元素和使用方法
公开(公告)号：WO2010008514A1
公开(公告)日：2010-01-21
申请号：PCT/US2009/004046
申请日：2009-07-13
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harold , DWARS, Udo , SIMPSON, Christopher , STREHMEL, Bernd , FLUGEL, Michael
发明人： BAUMANN, Harold , DWARS, Udo , SIMPSON, Christopher , STREHMEL, Bernd , FLUGEL, Michael
IPC分类号： G03F7/033 , G03F7/11 , B41C1/10 , G03F7/031
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035
摘要： Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound, an aerobic free radical inhibitor, optionally a polymeric binder that is not a free radically polymerizable component, and an anaerobic free radical inhibitor. The molar ratio of the anaerobic free radical inhibitor to the aerobic free radical inhibitor is at least 1 :1. This combination of inhibitors provides increased shelf life and good latent image stability particularly when the element includes a polymeric topcoat layer that functions as an oxygen barrier.
摘要翻译：负性工作的可成像元件如平版印刷版前体包括可自由基聚合的组分，引发剂组合物，其能够产生足够的自由基，以便在存在可见光辐射的情况下暴露于成像辐射时引发可自由基聚合的组分的聚合辐射吸收化合物，辐射吸收化合物，需氧自由基抑制剂，任选的不是可自由基自由基组分的聚合物粘合剂和厌氧自由基抑制剂。厌氧自由基抑制剂与好氧自由基抑制剂的摩尔比至少为1:1。这种抑制剂的组合提供了增加的保质期和良好的潜影稳定性，特别是当元件包括用作氧阻隔层的聚合物顶涂层时。

4. 发明申请

WO2013043421A2 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS 审中-公开
标题翻译：负离子平版印刷机前驱板
公开(公告)号：WO2013043421A2
公开(公告)日：2013-03-28
申请号：PCT/US2012/054705
申请日：2012-09-12
申请人： EASTMAN KODAK COMPANY , BALBINOT, Domenico , BAUMANN, Harald , DWARS, Udo , JAREK, Mathias , SIMPSON, Christopher
发明人： BALBINOT, Domenico , BAUMANN, Harald , DWARS, Udo , JAREK, Mathias , SIMPSON, Christopher
IPC分类号： G03F7/029
CPC分类号： G03F7/029 , B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/031
摘要： A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye comprising an infrared radiation absorbing cation and a counter anion, and a polymeric binder. The salt formed between the infrared radiation absorbing cation and a tetraphenyl borate has solubility in 2-methoxy propanol at 20°C that is greater than or equal to 3.5 g/1. The use of these infrared radiation absorbing dyes in the imageable layers provides a reduced tendency of these dyes to crystallize in the presence of tetraaryl borate counter anions.
摘要翻译：平版印刷版原版包括可成像层，其包含可自由基聚合的组分，在暴露于成像红外辐射时能够产生自由基的引发剂组合物，包含红外辐射吸收阳离子和抗衡阴离子的红外辐射吸收染料，以及聚合物粘合剂。在红外辐射吸收阳离子和四苯基硼酸盐之间形成的盐在20℃下在2-甲氧基丙醇中具有大于或等于3.5g / l的溶解度。在可成像层中使用这些红外辐射吸收染料提供这些染料在硼酸四芳基酯阴离子存在下结晶的趋势。

5. 发明申请

WO2013043493A1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS 审中-公开
标题翻译：负离子平版印刷机前驱板
公开(公告)号：WO2013043493A1
公开(公告)日：2013-03-28
申请号：PCT/US2012/055437
申请日：2012-09-14
申请人： EASTMAN KODAK COMPANY , BALBINOT, Domenico , BAUMANN, Harald , DWARS, Udo , JAREK, Mathias , MATZ, James, R. , SIMPSON, Christopher
发明人： BALBINOT, Domenico , BAUMANN, Harald , DWARS, Udo , JAREK, Mathias , MATZ, James, R. , SIMPSON, Christopher
IPC分类号： G03F7/027 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/30
CPC分类号： B41C1/10 , B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/22 , G03F7/004 , G03F7/027 , G03F7/029 , G03F7/031 , G03F7/033 , G03F7/3035
摘要： A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye that is defined by Structure (I) shown in the disclosure, which dyes comprise one or more ethylenically unsaturated polymerizable groups in an organic group that is attached to the methine chain. These infrared radiation absorbing dyes exhibit a reduced tendency to crystallize in the imageable layers in the presence of tetraaryl borate counter anions and therefore provide improved shelf life.
摘要翻译：平版印刷版前体包含可成像层，其包含可自由基聚合的组分，在暴露于成像红外辐射时能够产生自由基的引发剂组合物，由本公开中所示的结构（I）定义的红外辐射吸收染料，染料在与次甲基链连接的有机基团中包含一个或多个烯键式不饱和可聚合基团。这些红外辐射吸收染料在硼酸四芳基酯阴离子存在下，在可成像层中显示出降低的结晶倾向，因此提供了更好的保质期。

6. 发明申请

WO2009073098A1 IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS 审中-公开
标题翻译：具有1H-四唑基的组分的成像元素
公开(公告)号：WO2009073098A1
公开(公告)日：2009-06-11
申请号：PCT/US2008/013014
申请日：2008-11-21
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harald , DWARS, Udo , STREHMEL, Bernd , SIMPSON, Christopher , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard
发明人： BAUMANN, Harald , DWARS, Udo , STREHMEL, Bernd , SIMPSON, Christopher , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard
IPC分类号： G03F7/033 , B41C1/10
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

7. 发明申请

WO2009114056A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 审中-公开
标题翻译：具有改进耐磨性的负离子成像元件
公开(公告)号：WO2009114056A1
公开(公告)日：2009-09-17
申请号：PCT/US2009/000896
申请日：2009-02-12
申请人： EASTMAN KODAK COMPANY , HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
发明人： HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
IPC分类号： G03F7/004 , G03F7/075
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

8. 发明申请

WO2007009580A2 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：光刻胶组合物适用于平版印刷板
公开(公告)号：WO2007009580A2
公开(公告)日：2007-01-25
申请号：PCT/EP2006/006462
申请日：2006-07-03
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harald , STREHMEL, Bernd , PIETSCH, Detlef , DWARS, Udo , EBHARDT, Tanja , DRABER, Axel
发明人： BAUMANN, Harald , STREHMEL, Bernd , PIETSCH, Detlef , DWARS, Udo , EBHARDT, Tanja , DRABER, Axel
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X 1 , X 2 and X 3 are independently selected from straight-chain or cyclic C 4 -C 12 alkylene and C 6 -C 10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R 1 , R 2 and R 3 are independently selected from (II) and (III) with the proviso that (1) n = 0 in at least one of the groups R 1 , R 2 and R 3 , and (2) n > 2 in at least one of the groups R 1 , R 2 and R 3 , and (3) at least one group R 6 is different from H in formula (III).
摘要翻译：辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。

9. 发明申请

WO2006053689A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS 审中-公开
标题翻译：具有低分子或聚合物敏感剂的平版印刷机前驱体（LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC或POLYMERIC SENSITIZERS）
公开(公告)号：WO2006053689A1
公开(公告)日：2006-05-26
申请号：PCT/EP2005/012136
申请日：2005-11-11
申请人： KODAK POLYCHROME GRAPHICS GMBH , STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
发明人： STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
IPC分类号： G03F7/031 , G03F7/029
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π 1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R 1 and R 2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group -NR 3 R 4 and a group -OR 5 , each R 3 , R 4 and R 5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.
摘要翻译：该平版印刷版前体包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物。

10. 发明申请

WO2005054952A1 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON 审中-公开
标题翻译：基于此的辐射敏感组合物和可成像元素
公开(公告)号：WO2005054952A1
公开(公告)日：2005-06-16
申请号：PCT/EP2004/013138
申请日：2004-11-18
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , DWARS, Udo , FLUGEL, Michael
发明人： BAUMANN, Harald , DWARS, Udo , FLUGEL, Michael
IPC分类号： G03F7/031
CPC分类号： G03F7/031 , Y10T428/31591
摘要： Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≤ number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2’, 4,4’, 5’5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.
摘要翻译：辐射敏感性组合物，其包含（a）至少一种可光聚合化合物与至少一种可自由基聚合的烯键式不饱和基团，其中所述至少一种可光聚合化合物的分子量为3,000以下，可以通过使二异氰酸酯与（I）具有羟基的烯属不饱和化合物，同时（ii）具有NH基和OH基的饱和有机化合物，其中反应物的用量按照以下条件使用：异氰酸酯基团的摩尔数= OH加NH基团的摩尔数; （b）至少一种吸收来自电磁波谱的波长范围为250至450nm的辐射的敏化剂，并选自：式（I）的二氢吡啶和式（II）的恶唑衍生物：（II）（c）能够与敏化剂（b）一起形成自由基的至少一种共引发剂，并选自2,2'，4,4'，5,5'-六芳基联咪唑，具有至少一个可光解裂解的三卤代甲基的化合物，二芳基碘鎓盐，三芳基锍盐和环中具有至少一个氮原子的N-杂环化合物，至少一个环氮原子具有氧取代基，以及上述化合物的混合物; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分; 条件是辐射敏感组合物不包含金属茂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式