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1. 发明申请

WO2010104560A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH OVERCOAT 审中-公开
标题翻译：负责工作的图像元素与OVERCOAT
公开(公告)号：WO2010104560A1
公开(公告)日：2010-09-16
申请号：PCT/US2010/000695
申请日：2010-03-08
申请人： EASTMAN KODAK COMPANY , SIMPSON, Christopher , BAUMANN, Harold , DWARS, Udo , STREHMEL, Bernd
发明人： SIMPSON, Christopher , BAUMANN, Harold , DWARS, Udo , STREHMEL, Bernd
IPC分类号： G03F7/09 , G03F7/11
CPC分类号： G03F7/092 , G03F7/11 , Y10T428/24802
摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.
摘要翻译：负性可成像元件可用于提供平版印刷版。可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。

2. 发明申请

WO2010008514A1 NEGATIVE-WORKING IMAGING ELEMENTS AND METHODS OF USE 审中-公开
标题翻译：负面工作成像元素和使用方法
公开(公告)号：WO2010008514A1
公开(公告)日：2010-01-21
申请号：PCT/US2009/004046
申请日：2009-07-13
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harold , DWARS, Udo , SIMPSON, Christopher , STREHMEL, Bernd , FLUGEL, Michael
发明人： BAUMANN, Harold , DWARS, Udo , SIMPSON, Christopher , STREHMEL, Bernd , FLUGEL, Michael
IPC分类号： G03F7/033 , G03F7/11 , B41C1/10 , G03F7/031
CPC分类号： G03F7/031 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/10 , B41C2201/12 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/033 , G03F7/092 , G03F7/3035
摘要： Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound, an aerobic free radical inhibitor, optionally a polymeric binder that is not a free radically polymerizable component, and an anaerobic free radical inhibitor. The molar ratio of the anaerobic free radical inhibitor to the aerobic free radical inhibitor is at least 1 :1. This combination of inhibitors provides increased shelf life and good latent image stability particularly when the element includes a polymeric topcoat layer that functions as an oxygen barrier.
摘要翻译：负性工作的可成像元件如平版印刷版前体包括可自由基聚合的组分，引发剂组合物，其能够产生足够的自由基，以便在存在可见光辐射的情况下暴露于成像辐射时引发可自由基聚合的组分的聚合辐射吸收化合物，辐射吸收化合物，需氧自由基抑制剂，任选的不是可自由基自由基组分的聚合物粘合剂和厌氧自由基抑制剂。厌氧自由基抑制剂与好氧自由基抑制剂的摩尔比至少为1:1。这种抑制剂的组合提供了增加的保质期和良好的潜影稳定性，特别是当元件包括用作氧阻隔层的聚合物顶涂层时。

3. 发明申请

WO2009073098A1 IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS 审中-公开
标题翻译：具有1H-四唑基的组分的成像元素
公开(公告)号：WO2009073098A1
公开(公告)日：2009-06-11
申请号：PCT/US2008/013014
申请日：2008-11-21
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harald , DWARS, Udo , STREHMEL, Bernd , SIMPSON, Christopher , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard
发明人： BAUMANN, Harald , DWARS, Udo , STREHMEL, Bernd , SIMPSON, Christopher , SAVARIAR-HAUCK, Celin , HAUCK, Gerhard
IPC分类号： G03F7/033 , B41C1/10
CPC分类号： G03F7/033 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266 , Y10S430/121
摘要： Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.
摘要翻译：辐射敏感组合物和可成像元件包括可成像层中的聚合物或非聚合物组分，该组分包括1H-四唑基团。非聚合物组分可以是可自由基聚合的化合物。聚合物组分可具有垂直于主链的1H-四唑基团。在负片或正性可成像元件中使用这样的组分可提供高的感光速度和改进的显影性，以提供成像和显影元件，例如显示改善的耐化学性和游程长度的平版印刷版。

4. 发明申请

WO2009114056A1 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE 审中-公开
标题翻译：具有改进耐磨性的负离子成像元件
公开(公告)号：WO2009114056A1
公开(公告)日：2009-09-17
申请号：PCT/US2009/000896
申请日：2009-02-12
申请人： EASTMAN KODAK COMPANY , HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
发明人： HAUCK, Gerhard , SAVARIAR-HAUCK, Celin , DWARS, Udo , BAUMANN, Harald , STREHMEL, Bernd , SIMPSON, Christopher
IPC分类号： G03F7/004 , G03F7/075
CPC分类号： G03F7/075 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41C2210/266 , G03F7/0047
摘要： Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.
摘要翻译：使用含有表面改性二氧化硅颗粒如热解法二氧化硅颗粒和溶胶 - 凝胶二氧化硅颗粒的辐射敏感可成像层制备负性可成像元件，其含量为约1至约40重量％，具有具有约1至约500nm的平均粒度具有表面羟基，并且具有衍生自具有1至30个碳原子的表面疏水基团的约0.5至约15重量％的碳含量。表面改性二氧化硅颗粒的存在提供了改进的耐磨性，降低的粘合性和各种其它期望的性能。

5. 发明申请

WO2007009580A2 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：光刻胶组合物适用于平版印刷板
公开(公告)号：WO2007009580A2
公开(公告)日：2007-01-25
申请号：PCT/EP2006/006462
申请日：2006-07-03
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harald , STREHMEL, Bernd , PIETSCH, Detlef , DWARS, Udo , EBHARDT, Tanja , DRABER, Axel
发明人： BAUMANN, Harald , STREHMEL, Bernd , PIETSCH, Detlef , DWARS, Udo , EBHARDT, Tanja , DRABER, Axel
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X 1 , X 2 and X 3 are independently selected from straight-chain or cyclic C 4 -C 12 alkylene and C 6 -C 10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R 1 , R 2 and R 3 are independently selected from (II) and (III) with the proviso that (1) n = 0 in at least one of the groups R 1 , R 2 and R 3 , and (2) n > 2 in at least one of the groups R 1 , R 2 and R 3 , and (3) at least one group R 6 is different from H in formula (III).
摘要翻译：辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。

6. 发明申请

WO2011094243A1 METHOD FOR AUTOMATED CONTROL OF PROCESSING PARAMETERS 审中-公开
标题翻译：自动控制加工参数的方法
公开(公告)号：WO2011094243A1
公开(公告)日：2011-08-04
申请号：PCT/US2011/022484
申请日：2011-01-26
申请人： EASTMAN KODAK COMPANY , PLUMER, Lara , KOROLIK, Pavel , KOIFMAN, Danny , BAUMANN, Harold , STREHMEL, Bernd
发明人： PLUMER, Lara , KOROLIK, Pavel , KOIFMAN, Danny , BAUMANN, Harold , STREHMEL, Bernd
IPC分类号： B41C1/10
CPC分类号： B41C1/1083
摘要： The invention relates to processing imaged precursors such as lithographic printing plates. The invention relates specifically to adjusting a processing device for optimal processing performance using a plate recognition system that includes a sensing and authentication subsystem. The processor is automated to make adjustments according to the information provided.
摘要翻译：本发明涉及加工成像的前体，如平版印刷版。本发明具体涉及使用包括感测和认证子系统的板识别系统来调整处理装置以获得最佳处理性能。处理器可以根据所提供的信息进行自动调整。

7. 发明申请

WO2009024592A1 PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH A DEVELOPER SOLUTION CONTAINING A HYDROPHILIC POLYMER 审中-公开
标题翻译：用含有聚合物的开发商解决方案处理平版印刷版
公开(公告)号：WO2009024592A1
公开(公告)日：2009-02-26
申请号：PCT/EP2008/060930
申请日：2008-08-21
申请人： EASTMAN KODAK COMPANY , STREHMEL, Bernd , SIMPSON, Christopher , PIESTERT, Oliver , BAUMANN, Harald
发明人： STREHMEL, Bernd , SIMPSON, Christopher , PIESTERT, Oliver , BAUMANN, Harald
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer which comprises (m1) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from -COOH, -SO 3 H, -PO 2 H and -PO 3 H 2 , and (m3) optionally alkylene oxide units -(CHR 1 -CH 2 -O) p -, wherein R 1 is H or -CH 3 and p is an integer from 1 to 50.
摘要翻译：描述了一种用于生产成像平版印刷版的方法，其中显影剂包括亲水性聚合物，其包含（m1）伯，仲和/或叔氨基，和（m2）选自-COOH，-SO3H，-PO2H 和-PO 3 H 2，和（m 3）任选的环氧烷单元 - （CHR 1 -CH 2 -O）p - ，其中R 1是H或-CH 3，p是1至50的整数。

8. 发明申请

WO2008058939A2 UV-SENSITIVE ELEMENTS WITH TRIARYLAMINE DERIVATIVES AS SENSITIZERS FOR CTP EXPOSURE 审中-公开
标题翻译：以三芳胺衍生物作为敏化剂用于CTP曝光的紫外敏感元件
公开(公告)号：WO2008058939A2
公开(公告)日：2008-05-22
申请号：PCT/EP2007/062223
申请日：2007-11-12
申请人： EASTMAN KODAK COMPANY , STREHMEL, Bernd , BAUMANN, Harald , SIMPSON, Christopher
发明人： STREHMEL, Bernd , BAUMANN, Harald , SIMPSON, Christopher
IPC分类号： G03F7/031
CPC分类号： G03F7/031
摘要： A UV-sensitive composition and element comprising (a) one or more types of monomers and/or oligomers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b), said coinitiator being other than metallocenes, and (d) at least one reactive polymeric binder comprising (i) structural units (m1) comprising at least one pendant acidic group, (ii) structural units (m2) comprising at least one pendant free radical polymerizable group, and (iii) optionally further structural units (m3) different from units (m1) and (m2). The sensitizer is a substituted triarylamine of formula (I).
摘要翻译：（a）一种或多种类型的单体和/或低聚物，其各自包含至少一个可用于自由基聚合的烯键式不饱和基团，（b）在（c）至少一种能够与敏化剂（b）一起形成自由基的共引发剂，所述共引发剂不是茂金属，和（d）至少一种反应性聚合物粘合剂，其包含（i）结构单元（m1）（ii）包含至少一个侧链可自由基聚合基团的结构单元（m2），和（iii）任选地不同于单元（m1）和（m2）的其它结构单元（m3）。敏化剂是式（I）的取代的三芳基胺。

9. 发明申请

WO2009065849A1 PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION 审中-公开
标题翻译：在完成溶液中加工具有疏水性聚合物的平版印刷板
公开(公告)号：WO2009065849A1
公开(公告)日：2009-05-28
申请号：PCT/EP2008/065817
申请日：2008-11-19
申请人： EASTMAN KODAK COMPANY , STREHMEL, Bernd , SIMPSON, Christopher , PIESTERT, Oliver , BAUMANN, Harald
发明人： STREHMEL, Bernd , SIMPSON, Christopher , PIESTERT, Oliver , BAUMANN, Harald
IPC分类号： B41N3/08 , G03F7/40
CPC分类号： B41N3/08 , G03F7/40
摘要： Process for the production of a lithographic printing plate, comprising (a) providing a lithographic printing plate precursor comprising (i) a substrate; (ii) a radiation-sensitive coating comprising one or more layers and (iii) optionally an oxygen-impermeable overcoat; (b) image-wise exposing the lithographic printing plate precursor to radiation of a wavelength to which the radiation-sensitive coating is sensitive; (c) optionally subjecting the image-wise exposed precursor to a preheat treatment and/or rinsing with water; (d) removing the non-image areas from the image-wise exposed precursor by means of an alkaline developer solution; (e) optionally subjecting the imaged precursor obtained in step (d) to rinsing with water; (f) treating the imaged lithographic printing plate obtained in step (d) or (e) with a finisher solution; and (g) optionally subjecting the finisher treated plate obtained in step (f) to at least one further process step selected from rinsing with water, drying and baking; characterized in that the finisher solution comprises 0.01 to 15 wt.%, based on the total weight of the finisher, of a hydrophilic polymer comprising: (ml) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from -COOH, -SO 3 H, -PO 2 H 2 and PO 3 H 2 , and (m3) optionally alkylene oxide units -(CHR 1 -CH 2 -O) P -, wherein each R 1 independently represents H or -CH 3 and p is an integer from 1 to 50.
摘要翻译：制备平版印刷版的方法，包括（a）提供平版印刷版原版，其包含（i）基底; （ii）包含一层或多层的辐射敏感涂层和（iii）任选的不透氧外涂层; （b）将平版印刷版前体成像曝光于对辐射敏感涂层敏感的波长的辐射; （c）任选地使成像曝光的前体经受预热处理和/或用水冲洗; （d）通过碱性显影剂溶液从图像曝光的前体中除去非图像区域; （e）任选地使步骤（d）中获得的成像前体用水冲洗; （f）用整理剂溶液处理步骤（d）或（e）中获得的成像平版印刷版; 和（g）任选地将步骤（f）中获得的整理剂处理的板处理至少一个选自用水漂洗，干燥和烘烤的其它工艺步骤; 其特征在于，整理剂溶液包含基于整理剂总重量的0.01至15重量％的亲水性聚合物，其包含：（ml）伯，仲和/或叔氨基，和（m2）选自 -COOH，-SO 3 H，-P 2 H 2，PO 3 H 2，（m 3）任选地是环氧烷单元 - （CHR 1 -CH 2 -O）P - ，其中每个R 1独立地表示H或-CH 3，p是1至50的整数。

10. 发明申请

WO2007144096A1 METHOD FOR PROCESSING OF PHOTOPOLYMER PRINTING PLATES WITH OVERCOAT 审中-公开
标题翻译：用OVERCOAT处理光刻胶印刷板的方法
公开(公告)号：WO2007144096A1
公开(公告)日：2007-12-21
申请号：PCT/EP2007/004988
申请日：2007-06-05
申请人： EASTMAN KODAK COMPANY , BAUMANN, Harald , SIMPSON, Christopher , FIEBAG, Ulrich , STREHMEL, Bernd
发明人： BAUMANN, Harald , SIMPSON, Christopher , FIEBAG, Ulrich , STREHMEL, Bernd
IPC分类号： G03F7/32 , B41N3/08
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22 , B41C2210/24 , G03F7/09 , G03F7/322
摘要： Method is described for producing an imaged lithographic printing plate from a precursor comprising a free-radical polymerizable coating and an oxygen-impermeable overcoat, characterized in that removing the overcoat, developing and gumming is carried out in one single step.
摘要翻译：描述了用于从包含自由基可聚合涂层和不透氧外涂层的前体制备成像平版印刷版的方法，其特征在于，在一个单一步骤中进行外涂层，显影和涂胶的去除。

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