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1. 发明申请

WO2004074929A2 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON 审中-公开
标题翻译：基于此的辐射敏感组合物和可成像元素
公开(公告)号：WO2004074929A2
公开(公告)日：2004-09-02
申请号：PCT/EP2004/001705
申请日：2004-02-20
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , DWARS, Udo , FLUGEL, Michael
发明人： BAUMANN, Harald , DWARS, Udo , FLUGEL, Michael
IPC分类号： G03F
CPC分类号： G03F7/029 , G03F7/0295 , G03F7/031
摘要： Radiation-sensitive element comprising (a) one or more types of monomers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizes, (c) at least one coinitiator capable of forming free radicals together with the sensitizes, (b) and selected from 1,3,5-triazine derivatives with one to three CX 3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; Naryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; α-hydroxy and α-amino acetophenones and onium salts; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors, characterized in that the at least one sensitizes is a compound of the formula (I): wherein X is a spacer group comprising at least one C-C double bond conjugated to the heterocycles, Y and Z independently represent an optionally substituted fused aromatic ring and V and W are independently selected from O, S and NR, wherein R is selected from an alkyl, aryl and aralkyl group which can optionally be mono- or polysubstituted.
摘要翻译：辐射敏感元件包括（a）一种或多种类型的单体，每种单体包含至少一种可自由基聚合可接近的烯键式不饱和基团，（b）至少一种致敏剂，（c）至少一种可形成游离基的共引发剂自由基与敏感，（b）并选自具有一至三个CX3基团的1,3,5-三嗪衍生物，其中X表示氯或溴; 过氧化物; hexaarylbiimidazoles; 肟醚肟酯 N-芳基甘氨酸及其衍生物; 硫醇化合物; 具有至少2个羧基的N芳基，S-芳基和O-芳基多元羧酸，其中至少一个与芳基单元的N，S或O原子键合; alkyltriarylborates; 苯偶姻醚; 苯偶姻酯; trihalogenomethylarylsulfones; 胺; N，N-二烷基氨基苯甲酸酯; 芳香族磺酰卤; trihalogenomethylsulfones; 酰亚胺; diazosulfonates; 9,10-二氢蒽衍生物; α-羟基和α-氨基苯乙酮和鎓盐; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分，其特征在于所述至少一种敏化剂是式（I）：其中X是包含至少一个与杂环结合的CC双键的间隔基，Y和Z独立地表示任选取代的稠合芳环，V和W独立地选自O，S和NR，其中 R选自可任选被单或多取代的烷基，芳基和芳烷基。

2. 发明申请

WO2004049069A1 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：光刻胶组合物适用于平版印刷板
公开(公告)号：WO2004049069A1
公开(公告)日：2004-06-10
申请号：PCT/EP2003/013432
申请日：2003-11-28
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , FLUGEL, Michael , DWARS, Udo , GLATT, Hans, Horst
发明人： BAUMANN, Harald , FLUGEL, Michael , DWARS, Udo , GLATT, Hans, Horst
IPC分类号： G03F7/027
CPC分类号： G03F7/027 , C08G18/6715 , C08G18/7831
摘要： Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.
摘要翻译：描述了辐射敏感元件，其辐射敏感性涂层包括具有缩二脲结构单元的光聚合低聚物和可光聚合的磷腈低聚物。

3. 发明申请

WO2004074930A2 RADIATION-SENSITIVE COMPOSITIONS COMPRISING OXAZOLE DERIVATIVES AND IMAGEABLE ELEMENTS BASED THEREON 审中-公开
标题翻译：包含氧唑衍生物和可成像元素的辐射敏感组合物
公开(公告)号：WO2004074930A2
公开(公告)日：2004-09-02
申请号：PCT/EP2004/001706
申请日：2004-02-20
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , FLUGEL, Michael
发明人： BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , FLUGEL, Michael
IPC分类号： G03F
CPC分类号： G03F7/029 , G03F7/031
摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX 3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R 1 , R 2 and R 3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group -NR 4 R 5 and a group - OR6 , wherein R 4 and R 5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R 6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.
摘要翻译：辐射敏感元件包括：（a）一种或多种类型的单体，每种单体各自包含可自由基聚合的至少一个烯键式不饱和基团，（b）至少一种敏化剂，（c）至少一种能形成游离基的共引发剂自由基与敏化剂（b）一起并选自以下类别的化合物：金属茂; 具有一至三个CX 3基团的1,3,5-三嗪衍生物，其中X表示氯或溴; 过氧化物; hexaarylbiimidazoles; 肟醚肟酯 N-芳基甘氨酸及其衍生物; 硫醇化合物; 具有至少2个羧基的N-芳基，S-芳基和O-芳基多元羧酸，其中至少一个与芳基单元的N，S或O原子键合; alkyltriarylborates; 苯偶姻醚; 苯偶姻酯; trihalogenomethylarylsulfones; 胺; N，N-二烷基氨基苯甲酸酯; 芳香族磺酰卤; trihalogenomethylsulfones; 酰亚胺; diazosulfonates; 9,10-二氢蒽衍生物; α-羟基和α-氨基苯乙酮; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分，其特征在于所述至少一种敏化剂是式（I），其中每个R 1，R 2和R 3独立地选自卤素原子，任选取代的烷基，任选取代的芳基，其也可以稠合，任选地取代的芳烷基，基团-NR 4 R 5和基团-OR 6，其中R 4和R 5独立地选自氢原子，烷基，芳基或R 1烷基，R 6是烷基，芳基或芳烷基或氢原子，k，m和n分别为0或1〜5的整数。

4. 发明申请

WO2005054952A1 RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENTS BASED THEREON 审中-公开
标题翻译：基于此的辐射敏感组合物和可成像元素
公开(公告)号：WO2005054952A1
公开(公告)日：2005-06-16
申请号：PCT/EP2004/013138
申请日：2004-11-18
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , DWARS, Udo , FLUGEL, Michael
发明人： BAUMANN, Harald , DWARS, Udo , FLUGEL, Michael
IPC分类号： G03F7/031
CPC分类号： G03F7/031 , Y10T428/31591
摘要： Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≤ number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2’, 4,4’, 5’5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.
摘要翻译：辐射敏感性组合物，其包含（a）至少一种可光聚合化合物与至少一种可自由基聚合的烯键式不饱和基团，其中所述至少一种可光聚合化合物的分子量为3,000以下，可以通过使二异氰酸酯与（I）具有羟基的烯属不饱和化合物，同时（ii）具有NH基和OH基的饱和有机化合物，其中反应物的用量按照以下条件使用：异氰酸酯基团的摩尔数= OH加NH基团的摩尔数; （b）至少一种吸收来自电磁波谱的波长范围为250至450nm的辐射的敏化剂，并选自：式（I）的二氢吡啶和式（II）的恶唑衍生物：（II）（c）能够与敏化剂（b）一起形成自由基的至少一种共引发剂，并选自2,2'，4,4'，5,5'-六芳基联咪唑，具有至少一个可光解裂解的三卤代甲基的化合物，二芳基碘鎓盐，三芳基锍盐和环中具有至少一个氮原子的N-杂环化合物，至少一个环氮原子具有氧取代基，以及上述化合物的混合物; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分; 条件是辐射敏感组合物不包含金属茂。

5. 发明申请

WO2006087102A2 PROCESS FOR THE PRODUCTION OF LITHOGRAPHIC PRINTING PLATES 审中-公开
标题翻译：生产平版印刷板的方法
公开(公告)号：WO2006087102A2
公开(公告)日：2006-08-24
申请号：PCT/EP2006/000878
申请日：2006-02-01
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , FIEBAG, Ulrich , DWARS, Udo , STREHMEL, Bernd , FLUGEL, Michael , TIMPE, Hans-Joachim
发明人： BAUMANN, Harald , FIEBAG, Ulrich , DWARS, Udo , STREHMEL, Bernd , FLUGEL, Michael , TIMPE, Hans-Joachim
CPC分类号： G03F7/322
摘要： Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to 750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to 750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt. -% of at least one compound of formula (I) wherein R 1 , R 2 , R 3 and R 4 are each independently selected from C 1 -C 12 alkyl groups and aryl groups, X is selected from -CH=CH-, -C≡C-,formula (II), formula (III), and formula (IV), n + m results in a value of 2 to 30 and p + q results in a value of 0 to 30, wherein in the case of p + q ≠ 0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed.
摘要翻译：制备平版印刷版的方法包括（a）向平版印刷基材提供亲水表面; （b）将负性辐射敏感组合物施加到所述亲水性表面上，其中所述组合物包含：（i）一种或多种类型的单体和/或低聚物和/或聚合物，其各自包含至少一个烯键式不饱和基团自由基聚合，（ii）至少一种敏化剂，其在至少一种共引发剂的存在下，并且在暴露于300至<480nni或> 750至1,100nm的波长的辐射下引发组分的自由基聚合一世）; 和（iii）至少一种具有酸性官能团的粘合剂，并且对480至750nm的波长范围基本上不敏感; （c）根据所使用的敏化剂或引发剂体系，将得到的负性工作平版印刷版原版成像曝光于从300至<480nm或> 750至1,100nm的波长范围内的辐射; 和（d）通过用pH值在9至14范围内的碱性显影剂处理除去未照射的区域，其包含（i）水，（ii）一种或多种足以调节的碱金属氢氧化物 pH值在9至14的范围内; 和（iii）1〜30wt。 - 至少一种其中R 1，R 2，R 3和R 4的式（I）化合物的％ SUP>各自独立地选自C 1 -C 12烷基和芳基，X选自-CH = CH-，-C = C-，式（ II），式（III）和式（IV）中，n + m的值为2〜30，p + q的值为0〜30，其中，在p +q≥2的情况下， 0环氧乙烷和环氧丙烷单元以块或随机分布存在。

6. 发明申请

WO2004049068A1 RADIATION-SENSITIVE ELEMENTS 审中-公开
标题翻译：辐射敏感元素
公开(公告)号：WO2004049068A1
公开(公告)日：2004-06-10
申请号：PCT/EP2003/013430
申请日：2003-11-28
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , FLUGEL, Michael , DWARS, Udo
发明人： BAUMANN, Harald , FLUGEL, Michael , DWARS, Udo
IPC分类号： G03F7/027
CPC分类号： C08G18/6715 , C08G18/664 , C08G18/7831 , C08L75/04 , C08L75/06 , G03F7/027 , G03F7/031 , C08L2666/20
摘要： The invention relates to radiation-sensitive elements comprising an aluminum substrate that has been roughened electrochemically with hydrochloric acid, and a radiation-sensitive coating comprising a coumarin sensitizer (I), a coinitiator a free-radical polymerizable monomer one or more P-OH groups and a biuret oligomer.
摘要翻译：本发明涉及辐射敏感元件，其包括已经用盐酸电化学地粗糙化的铝基底和包含香豆素敏化剂（I），共引发剂，自由基可聚合单体一种或多种P-OH基团的辐射敏感性涂层和缩二脲低聚物。

7. 发明申请

WO2006053689A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC OR POLYMERIC SENSITIZERS 审中-公开
标题翻译：具有低分子或聚合物敏感剂的平版印刷机前驱体（LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH OLIGOMERIC或POLYMERIC SENSITIZERS）
公开(公告)号：WO2006053689A1
公开(公告)日：2006-05-26
申请号：PCT/EP2005/012136
申请日：2005-11-11
申请人： KODAK POLYCHROME GRAPHICS GMBH , STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
发明人： STREHMEL, Bernd , BAUMANN, Harald , DWARS, Udo , PIETSCH, Detlef , DRABER, Axel , MURSAL, Michael
IPC分类号： G03F7/031 , G03F7/029
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π 1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R 1 and R 2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group -NR 3 R 4 and a group -OR 5 , each R 3 , R 4 and R 5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.
摘要翻译：该平版印刷版前体包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物。

8. 发明申请

WO2007077207A3 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES 审中-公开
公开(公告)号：WO2007077207A3
公开(公告)日：2007-07-12
申请号：PCT/EP2007/000009
申请日：2007-01-02
申请人： KODAK POLYCHROME GRAPHICS GMBH , BAUMANN, Harald , STREHMEL, Bernd , DWARS, Udo , MÜLLER, Ursula
发明人： BAUMANN, Harald , STREHMEL, Bernd , DWARS, Udo , MÜLLER, Ursula
IPC分类号： G03F7/027 , B41C1/10 , B41M5/40
摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

9. 发明申请

WO2004057421A3 PROCESS FOR THE PRODUCTION OF NEGATIVE WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS WITH A COATING COMPRISING DIAZO RESIN 审中-公开
公开(公告)号：WO2004057421A3
公开(公告)日：2004-07-08
申请号：PCT/EP2003/014418
申请日：2003-12-17
申请人： KODAK POLYCHROME GRAPHICS GMBH , DWARS, Udo , BAUMANN, Harald , MURSAL, Michael , DRABER, Axel
发明人： DWARS, Udo , BAUMANN, Harald , MURSAL, Michael , DRABER, Axel
IPC分类号： G03F7/00
摘要： A process for the production of lithographic printing plate precursors with a coating comprising a diazo resin is described, wherein a solvent mixture comprising (i) 2 to 9.9 wt.-% 1-methoxy-2-propanol, (ii) 20 to 50 wt.-% of at least one ketone with a boiling point below 130°C, (iii) 20 to 60 wt.-% of at least one alkanol with a boiling point below 120°C, and (iv) 10 to 30 wt.-% ethyl lactate, and a slot coater are used.

10. 发明申请

WO2004049071A1 RADIATION-SENSITIVE ELEMENTS AND THEIR STORAGE STABILITY 审中-公开
标题翻译：辐射敏感元件及其储存稳定性
公开(公告)号：WO2004049071A1
公开(公告)日：2004-06-10
申请号：PCT/EP2003/013431
申请日：2003-11-28
申请人： KODAC POLYCHROME GRAPHICS GMBH.C. , KOTTMAIR, Eduard , BAUMANN, Harald , FLUGEL, Michael , DWARS, Udo
发明人： KOTTMAIR, Eduard , BAUMANN, Harald , FLUGEL, Michael , DWARS, Udo
IPC分类号： G03F7/029
CPC分类号： B41M5/46 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , G03F7/029 , Y10S430/118
摘要： Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on .at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a ,wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.
摘要翻译：辐射敏感元件包括（a）具有至少一个亲水表面的基底和（b）基底的至少一个亲水表面上的辐射敏感涂层，其中所述涂层包括：（i）至少一种自由基具有至少一个烯属不饱和基团的可聚合单体和/或聚合物和/或聚合物各自包含（ii）至少一种选自光引发剂和敏化剂的吸收剂，其能够吸收波长在250至1,200nm范围内的辐射和（iii）至少一种在其分子中包含至少一个能够抑制自由基聚合的基团的稳定剂和至少一种能够在底物亲水表面吸附的其它基团。

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