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    • 5. 发明申请
    • SYSTEM AND METHOD FOR DEPOSITION OF COATINGS ON A SUBSTRATE
    • 在基材上沉积涂层的系统和方法
    • WO0155475A2
    • 2001-08-02
    • PCT/RU0100027
    • 2001-01-25
    • V I P VACUUM ION PLASMA TECHNODODONOV ALEXANDR IGOREVICHDIAMANT VALERYBASHKOV VALERY MIKHAILOVICH
    • DODONOV ALEXANDR IGOREVICHDIAMANT VALERYBASHKOV VALERY MIKHAILOVICH
    • C23C14/02C23C14/32H01J37/317H01J37/34C23C14/22H01J37/32
    • C23C14/32C23C14/022H01J37/3178H01J37/32412H01J37/34H01J2237/3142H01J2237/32
    • The present invention relates to a system (1) and method for deposition of coatings on a substrate (10). More particularly, the invention concerns a system and method for low-temperature deposition of corrosion-proof, wear-resistant ion-plasma coatings. A system for deposition of an ion plasma coating on a substrate, said system comprising: a housing (2) defining a vacuum chamber and having access means for the introduction and retrieval of a substrate (10) to be coated; a plasma vacuum deposition (PVD) source (8) communicating with the interior of said housing; an electrically conductive support (12) on which said substrate is placed; a gas ion-plasma source (14) cathode assembly communicating with said chamber in spaced-apart relationship to said support; a first power supply (20') electrically connected to said support; a second power supply (20'') electrically connected to said cathode assembly, and a third power supply (20''') of additional discharge electrically connectable to said cathode assembly, wherein said power supplies are operative to effect pulsed discharge on said gas ion-plasma source cathode assembly or pulsed accelerating voltage on said support.
    • 本发明涉及一种用于在衬底(10)上沉积涂层的系统(1)和方法。 更具体地说,本发明涉及用于耐腐蚀,耐磨的离子等离子体涂层的低温沉积的系统和方法。 一种用于在衬底上沉积离子等离子体涂层的系统,所述系统包括:限定真空室的壳体(2),并具有用于引入和取出待涂覆的衬底(10)的入口装置; 与所述壳体的内部连通的等离子体真空沉积(PVD)源(8); 导电支撑件(12),其上放置所述基板; 气体离子源(14)阴极组件,与所述腔室以间隔开的关系与所述支撑件连通; 电连接到所述支撑件的第一电源(20'); 电连接到所述阴极组件的第二电源(20“)和与所述阴极组件电连接的另外的放电的第三电源(20”),其中所述电源用于在所述气体上实现脉冲放电 离子 - 等离子体源极阴极组件或所述支撑件上的脉冲加速电压。