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    • 3. 发明申请
    • METHOD FOR PRODUCING A SUSPENDED ELEMENT IN A MICRO-MACHINED STRUCTURE
    • 在微机械结构中生产悬挂元件的方法
    • WO1998029720A1
    • 1998-07-09
    • PCT/FR1997002437
    • 1997-12-29
    • COMMISSARIAT A L'ENERGIE ATOMIQUEROBERT, PhilippeMICHEL, FranceGRANGE, Hubert
    • COMMISSARIAT A L'ENERGIE ATOMIQUE
    • G01L09/00
    • G01L9/0042
    • The invention concerns a method for producing at least a suspended element (7), by micro-machining, using an etching technique, of a structure comprising a substrate (1) successively covered with a first so-called blocking layer (2), produced in a first material, and with a second layer (3) produced in a second material and in which the suspended element (7) is shaped. The method uses a dry etching technique using a gas whose selectivity enables the etching of the second layer (3) without affecting the blocking layer (2), under conditions established for an anisotropic etching of the second material, the etching being carried out according to a first phase for delimiting the suspended element (7) up to the level of the blocking layer (2) and being continued according to a second phase during which the release of the suspended element (7) results from the etching of the superficial layer of the suspended element delimited during the first phase and which is adjacent to the blocking layer (2).
    • 本发明涉及一种用于通过使用蚀刻技术通过微加工来生产至少悬浮元件(7)的方法,所述方法包括依次被第一所谓的阻挡层(2)覆盖的衬底(1)的结构,所述衬底 在第一材料中,并且第二层(3)以第二材料制成并且悬挂元件(7)成形。 该方法使用使用气体的干法蚀刻技术,其选择性使得能够在不影响阻挡层(2)的情况下蚀刻第二层(2),在为第二材料的各向异性蚀刻建立的条件下,根据 用于将所述悬浮元件(7)分隔直到所述阻挡层(2)的水平并且根据第二阶段继续的第一阶段,在所述第二阶段期间所述悬浮元件(7)的释放是由 所述悬浮元件在所述第一阶段界定并且与所述阻挡层(2)相邻。