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    • 1. 发明申请
    • SELF-ALIGNED METAL OXIDE TFT WITH REDUCED NUMBER OF MASKS
    • 自对准金属氧化物膜,具有减少数量的掩模
    • WO2013019910A1
    • 2013-02-07
    • PCT/US2012/049238
    • 2012-08-02
    • CBRITE INC.SHIEH, Chan-LongYU, GangFOONG, Fatt
    • SHIEH, Chan-LongYU, GangFOONG, Fatt
    • H01L29/10
    • H01L29/7869H01L21/02554H01L21/02565
    • A method of fabricating MO TFTs on transparent substrates by positioning opaque gate metal on the front surface of the substrate defining a gate area, depositing gate dielectric material on the front surface of the substrate, overlying the gate metal and a surrounding area, and depositing metal oxide semiconductor material on the gate dielectric material. Depositing etch stop material on the semiconductor material. Positioning photoresist on the etch stop material, the etch stop material and the photoresist being selectively removable, and the photoresist defining an isolation area in the semiconductor material. Removing uncovered portions of the etch stop. Exposing the photoresist from the rear surface of the substrate using the gate metal as a mask and removing exposed portions so as to leave the etch stop material uncovered except for a portion overlying and aligned with the gate metal. Etching uncovered portions of the semiconductor material to isolate the TFT. Using the photoresist, selectively etching the etch stop layer to leave a portion overlying and aligned with the gate metal and defining a channel area in the semiconductor material. Depositing and patterning conductive material on the etch stop layer and on the semiconductor material to form source and drain areas on opposed sides of the channel area.
    • 一种在透明基板上制造MO TFT的方法,该方法是通过在形成栅极区域的衬底的前表面上定位不透明栅极金属,在衬底的前表面上沉积栅介电材料,覆盖栅极金属和周围区域,并沉积金属 氧化物半导体材料。 在半导体材料上沉积蚀刻停止材料。 将光致抗蚀剂定位在蚀刻停止材料上,蚀刻停止材料和光致抗蚀剂可选择性地移除,并且光刻胶在半导体材料中限定隔离区域。 去除蚀刻停止件的未覆盖部分。 使用栅极金属作为掩模从基板的后表面露出光致抗蚀剂,并除去暴露部分,以使除蚀刻停止材料未被覆盖,除了覆盖并与栅极金属对准的部分之外。 蚀刻半导体材料的未覆盖部分以隔离TFT。 使用光致抗蚀剂,选择性地蚀刻蚀刻停止层以留下覆盖并与栅极金属对准的部分并限定半导体材料中的沟道区域。 在蚀刻停止层和半导体材料上沉积和图案化导电材料以在沟道区域的相对侧上形成源极和漏极区域。
    • 3. 发明申请
    • MASK LEVEL REDUCTION FOR MOFET
    • 屏蔽层减少MOFET
    • WO2011056294A1
    • 2011-05-12
    • PCT/US2010/048264
    • 2010-09-09
    • CBRITE INC.SHIEH, Chan-LongFOONG, FattYU, Gang
    • SHIEH, Chan-LongFOONG, FattYU, Gang
    • H01L21/336H01L29/78
    • H01L27/1288H01L27/1214H01L27/1225H01L29/4908H01L29/66969H01L29/7869
    • A method of fabricating a thin film transistor for an active matrix display using reduced masking operations includes patterning a gate on a substrate. A gate dielectric is formed over the gate and a semiconducting metal oxide is deposited on the gate dielectric. A channel protection layer is patterned on the semiconducting metal oxide overlying the gate to define a channel area and to expose the remaining semiconducting metal oxide. A source/drain metal layer is deposited on the structure and etched through to the channel protection layer above the gate to separate the source/drain metal layer into source and drain terminals and the source/drain metal layer and the semiconducting metal oxide are etched through at the periphery to isolate the transistor. A nonconductive spacer is patterned on the transistor and portions of the surrounding source/drain metal layer.
    • 使用减少的掩模操作制造用于有源矩阵显示器的薄膜晶体管的方法包括在衬底上图形化栅极。 在栅极上形成栅极电介质,并且在栅极电介质上沉积半导体金属氧化物。 将通道保护层图案化在覆盖栅极的半导体金属氧化物上,以限定通道区域并露出剩余的半导体金属氧化物。 源极/漏极金属层沉积在结构上并蚀刻到栅极上方的沟道保护层,以将源极/漏极金属层分离成源极和漏极端子,并且源/漏极金属层和半导体金属氧化物被蚀刻通过 在外围隔离晶体管。 在晶体管和周围源极/漏极金属层的部分上构图非导电间隔物。
    • 6. 发明申请
    • TWO-TERMINAL SWITCHING DEVICES AND THEIR METHODS OF FABRICATION
    • 双端开关器件及其制造方法
    • WO2008057553A2
    • 2008-05-15
    • PCT/US2007/023427
    • 2007-11-06
    • CBRITE INC.YU, GangSHIEH, Chan-LongLEE, Hsing-Chung
    • YU, GangSHIEH, Chan-LongLEE, Hsing-Chung
    • H01L29/861G02F1/1365G02F1/167H01L29/22H01L29/417H01L29/786H01L45/00H01L51/0035H01L51/0579H01L51/0587
    • Two-terminal switching devices characterized by high on/off current ratios and by high breakdown voltage are provided. These devices can be employed as switches in the driving circuits of active matrix displays, e.g., in electrophoretic, rotataing element and liquid crystal displays. The switching devices include two electrodes, and a layer of a broad band semiconducting material residing between the electrodes. According to one example, the cathode comprises a metal having a low work function, the anode comprises an organic material having a p+ or p++ type of conductivity, and the broad band semiconductor comprises a metal oxide. The work function difference between the cathode and the anode material is preferably at least about 0.6 eV. The on/off current ratios of at least 10,000 over a voltage range of about 15 V can be achieved. The devices can be formed, if desired, on flexible polymeric substrates having low melting points.
    • 提供了具有高开/关电流比和高击穿电压的双端开关器件。 这些器件可以用作有源矩阵显示器的驱动电路中的开关,例如在电泳,旋转元件和液晶显示器中。 开关装置包括两个电极以及位于电极之间的一层宽带半导体材料。 根据一个实例,阴极包含具有低功函数的金属,阳极包含具有p +或p ++类型导电性的有机材料,并且宽带半导体包含金属氧化物。 阴极和阳极材料之间的功函数差优选为至少约0.6eV。 可以实现在约15V的电压范围内至少10,000的通/断电流比。 如果需要,可以在具有低熔点的柔性聚合物基材上形成该装置。
    • 9. 发明申请
    • SURFACE EMITTING LASER
    • 表面发射激光
    • WO2002089276A1
    • 2002-11-07
    • PCT/US2002/006293
    • 2002-03-01
    • JIANG, WenbinSHIEH, Chan-LongLEE, Hsing-ChungSUN, Xiqing
    • JIANG, WenbinSHIEH, Chan-LongLEE, Hsing-ChungSUN, Xiqing
    • H01S5/18
    • H01S5/18H01S5/005H01S5/026H01S5/0654
    • A surface emitting diode (10), such as a laser (10), including an active region (16) positioned between first (15)and second (17) semiconductor layers and extending longitudinally. The active region (16) and at least portions of the first (15) and second (17) semiconductor layers defining first (21) and second (20) facets positioned at opposite ends of the length with the first facet (21) defining a light output for the active region (16). The active region (16) is adjusted to emit a single mode of light. A reflective element (25) is positioned adjacent to the first facet (21) and at an angle with the first facet (21) for receiving light output from the active region (16) and directing the light perpendicular to the active region (16).
    • 一种表面发射二极管(10),例如激光器(10),其包括位于第一(15)和第二(17)半导体层之间的纵向延伸的有源区(16)。 有源区域(16)和限定第一(21)和第二(20)半导体层的第一(15)和第二(17)半导体层的至少部分定位在与第一小面(21)的长度的相对端限定一个 用于有源区域(16)的光输出。 有源区域(16)被调节以发射单一模式的光。 反射元件(25)定位成与第一刻面(21)相邻并且与第一刻面(21)成一定角度,用于接收从有源区域(16)输出的光并且引导垂直于有源区域(16)的光, 。