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1. 发明申请

WO2021259633A1 MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2021259633A1
公开(公告)日：2021-12-30
申请号：PCT/EP2021/065326
申请日：2021-06-08
申请人： CARL ZEISS SMT GMBH , HILD, Kerstin , GRUNER, Toralf , GOLDE, Daniel , STIEPAN, Hans Michael , SHKLOVER, Vitaliy
发明人： HILD, Kerstin , GRUNER, Toralf , GOLDE, Daniel , STIEPAN, Hans Michael , SHKLOVER, Vitaliy
IPC分类号： G03F7/20 , G02B5/08 , G02B7/185 , G02B27/00 , G21K1/06 , H01L41/08 , G02B26/0825 , G02B26/0858 , G02B27/0068 , G02B5/0891 , G03F7/70266 , G03F7/70316 , G21K1/062 , G21K2201/061 , G21K2201/067 , H01L41/047 , H01L41/0805 , H01L41/0986
摘要： The invention relates to a mirror, in particular for a microlithographic projection exposure apparatus, comprising an optical effective surface, a mirror substrate (10, 21, 31, 41, 50, 70, 80), a reflection layer stack (28, 38, 48, 75, 85) for reflecting electromagnetic radiation that is incident on the optical effective sur¬ face, at least one first electrode arrangement (24, 34, 44), at least one second electrode arrangement (23, 33, 43), and an actuator layer system situated between the first electrode arrangement and the second electrode arrangement, wherein said actuator layer system is arranged between the mirror substrate (10, 21, 31, 41, 50, 70, 80) and the reflection layer stack (28, 38, 48, 75, 85), said actuator layer system comprising a piezoelectric layer (25, 35, 45) and, in reaction to an electrical voltage being applied between the first electrode arrangement and the second electrode arrangement, exhibiting a deformation response (11, 51) characterizing the linear deformation of the actuator layer system in a direction perpendicular to the optical effective surface for a pre¬ defined value of the electrical voltage, wherein said deformation response varies locally by at least 20% in the PV value for a predefined electrical voltage that is spatially constant across the piezoelectric layer.

2. 发明申请

WO2017029383A1 EUV-LITHOGRAPHIEANLAGE UND VERFAHREN 审中-公开
标题翻译： EUV光刻系统和方法
公开(公告)号：WO2017029383A1
公开(公告)日：2017-02-23
申请号：PCT/EP2016/069658
申请日：2016-08-18
申请人： CARL ZEISS SMT GMBH
发明人： WOLF, Alexander , HARTJES, Joachim , GRUNER, Toralf , GOLDE, Daniel , MANN, Hans-Jürgen
IPC分类号： G03F7/20 , G02B17/06
CPC分类号： G03F7/70308 , G02B17/0647 , G03F7/70033 , G03F7/70233 , G03F7/7025
摘要： Es wird offenbart eine EUV-Lithographieanlage (100) mit einem Projektionssystem (104), in welchem ein optisches System (138) angeordnet ist, wobei das optische System (13) aufweist: eine Obskurationsblende (200) zum Blockieren zumindest eines Bereichs (204) eines Strahlengangs (206), und eine Manipulationseinrichtung (202) zum Verschieben und/oder Verkippen der Obskurationsblende (200).
摘要翻译：它公开了一种具有投影系统（104），其中光学系统被布置（138），EUV光刻设备（100），其中所述光学系统（13），包括：用于封闭至少一个区域的遮蔽（200）（204）的光束路径（206），和用于移动和/或遮蔽（200）的倾斜的操作装置（202）。

3. 发明申请

WO2021001311A1 STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS 审中-公开
公开(公告)号：WO2021001311A1
公开(公告)日：2021-01-07
申请号：PCT/EP2020/068239
申请日：2020-06-29
申请人： CARL ZEISS SMT GMBH
发明人： MODESTE, Benjahman Julius , GRUNER, Toralf , GOLDE, Daniel , LOERING, Ulrich , ZWEERING, Ralf , XALTER, Stefan
IPC分类号： G03F7/20 , G02B5/00 , G02B17/08
摘要： A stop (300), in particular numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus (100A, 100B), comprising a light-transmissive aperture (302) and at least one stop element (306, 308), in which or at which the 5 aperture (302) is provided, wherein the stop element (306, 308) is opaque and fluid- permeable outside the aperture (302).

4. 发明申请

WO2016041805A1 PROJECTION LENS, PROJECTION EXPOSURE APPARATUS AND PROJECTION EXPOSURE METHOD FOR EUV MICROLITHOGRAPHY 审中-公开
标题翻译：投影镜头，投影曝光装置和投影曝光方法
公开(公告)号：WO2016041805A1
公开(公告)日：2016-03-24
申请号：PCT/EP2015/070391
申请日：2015-09-07
申请人： CARL ZEISS SMT GMBH
发明人： ANDRÉ, Stephan , GOLDE, Daniel , GRUNER, Toralf , RUOFF, Johannes , WABRA, Norbert , SCHNEIDER, Ricarda , SCHNEIDER, Sonja
IPC分类号： G03F7/20
CPC分类号： G03F7/70266 , G03F7/7015 , G03F7/70233 , G03F7/70258
摘要： A projection lens (PO) for imaging a pattern arranged in an object plane (OS) of the projection lens into an image plane (IS) of the projection lens by means of electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range (EUV) comprises a multiplicity of mirrors (M1 - M6) having mirror surfaces which are arranged in a projection beam path between the object plane and the image plane in such a way that a pattern of a mask (M) that is arranged in the object plane is imagable into the image plane by means of the mirrors. A first imaging scale in a first direction (y-direction) running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction (x-direction) perpendicular to the first direction. Provision is made of a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.
摘要翻译：一种投影透镜（PO），用于通过具有来自极紫外线范围的工作波长λ（EUV）的电磁辐射，将布置在投影透镜的物平面（OS）中的图案成像为投影透镜的像平面（IS））包括多个反射镜（M1-M6），其具有布置在物平面和图像平面之间的投影光束路径中的镜面，使得布置在物平面中的掩模（M）的图案通过镜子可以进入图像平面。在与第一方向垂直的第二方向（x方向）上，在与扫描方向平行的第一方向（y方向）上的第一成像刻度在绝对值上小于第二成像刻度。提供了一种用于校正由掩模版位移引起的散光波前像差部分的动态波前操纵系统。

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