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    • 9. 发明申请
    • X-RAY WAVEGUIDE
    • X射线波形
    • WO2012039338A1
    • 2012-03-29
    • PCT/JP2011/071064
    • 2011-09-08
    • CANON KABUSHIKI KAISHAKOMOTO, AtsushiOKAMOTO, KoheiMIYATA, Hirokatsu
    • KOMOTO, AtsushiOKAMOTO, KoheiMIYATA, Hirokatsu
    • G21K1/06
    • G21K1/062G21K1/067G21K2201/061
    • An X-ray waveguide includes a core (101) to guide X-rays in a wavelength band where the real part of the refractive index of a material is 1 or less, and a cladding (102) to confine the X-rays to the core, in which the core includes a periodic structure having basic structures that contain materials having different real parts of refractive indices, the basic structures being periodically arranged, a low electron density layer (103) is arranged between the core and the cladding and has a lower electron density than that of a material having the highest electron density of all the materials constituting the core, and the critical angle for total reflection of the X-rays at the boundary between the cladding and the low electron density layer is larger than the Bragg angle attributed to the periodicity of the basic structures in the periodic structure of the core.
    • X射线波导包括用于引导材料的折射率的实部的1个以下的波长带的X射线的芯部(101)以及将X射线限制到 芯,其中芯包括具有包含具有不同实际折射率部分的材料的基本结构的周期性结构,基本结构周期性地布置,低电子密度层(103)布置在芯和包层之间,并且具有 比构成芯的全部材料的电子密度最高的材料的电子密度低,并且包层和低电子密度层之间的边界处的X射线的全反射的临界角大于布拉格 角度归因于核心周期性结构中基本结构的周期性。
    • 10. 发明申请
    • MESOSTRUCTURED FILM, MESPOROUS MATERIAL FILM, AND PRODUCTION METHODS FOR THE SAME
    • 组合膜,多孔材料薄膜及其生产方法
    • WO2005014480A1
    • 2005-02-17
    • PCT/JP2004/011582
    • 2004-08-05
    • CANON KABUSHIKI KAISHAMIYATA, HirokatsuKAWASHIMA, YasuhiroKURODA, Kazuyuki
    • MIYATA, HirokatsuKAWASHIMA, YasuhiroKURODA, Kazuyuki
    • C01B37/02
    • G21K1/06C01B37/02Y10T428/24322Y10T428/24496Y10T428/249967Y10T428/249969Y10T428/31504
    • A mesostructured film is provided having a structure in which surfactant molecular assemblies are regularly arranged three-dimensionally. A polymer compound thin film is formed on the substrate surface through spin coating or the like, and a rotating roller wrapped with a cloth is pressed against the polymer film for rubbing in one direction. The polymer material includes polyimide, polyamide, and polystyrene. The substrate includes a silica glass substrate and a silicon substrate. The mesostructured film can be formed by retaining the substrate in an aqueous solution containing a surfactant, silicon alkoxide, and acid. After being retained in the solution, the substrate is heated at about 60 to 120 ° C for several hours to several days for reaction. The surfactant includes C 18 H 37 (OCH 2 CH 2 ) 20 0H and C 16 H 33 (OCH 2 CH 2 ) 20 0H . The alkoxide included tetraethoxysilane, tetramethoxysilane, and tetrapropoxysilane. Hydrochloric acid, nitric acid, or sulfuric acid'is used as a catalyst.
    • 提供了具有其中表面活性剂分子组件被三维规则地排列的结构的介孔结构膜。 通过旋涂等在基材表面上形成高分子化合物薄膜,将用布覆盖的旋转辊按压在聚合物膜上以在一个方向上摩擦。 聚合物材料包括聚酰亚胺,聚酰胺和聚苯乙烯。 基板包括石英玻璃基板和硅基板。 可以通过将基材保持在含有表面活性剂,硅醇盐和酸的水溶液中来形成介孔结构膜。 在保留在溶液中之后,将基底在约60至120℃下加热数小时至数天以进行反应。 表面活性剂包括C18H37(OCH2CH2)200H和C16H33(OCH2CH2)200H。 醇盐包括四乙氧基硅烷,四甲氧基硅烷和四丙氧基硅烷。 将盐酸,硝酸或硫酸用作催化剂。