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    • 2. 发明申请
    • MULTI-LAYER COATING SYSTEM AND METHOD
    • 多层涂层系统及方法
    • WO2006125086A3
    • 2007-12-27
    • PCT/US2006019247
    • 2006-05-18
    • ISOFLUX INCGLOCKER DAVID A
    • GLOCKER DAVID A
    • B05D1/36
    • G01R33/286
    • A system and method for coating implantable medical devices so that they do not interfere with MR imaging are described. Using any of the coating processes well known to those skilled in the art, e.g., physical vapor deposition such as evaporation, sputtering, or cathode arc, or chemical vapor deposition, spraying, plasma polymerization, plasma enhanced chemical vapor deposition and the like, multiple sources, including at least one source of an electrically insulating material and at least one source of an electrically conducting material, are oriented and shielded so as to coat separate sections of the implantable medical device. The object being coated is then rotated so that overlapping spiral coatings of the materials from the different coating sources are produced on the object.
    • 描述了用于涂覆可植入医疗装置以使它们不干扰MR成像的系统和方法。 使用本领域技术人员熟知的任何涂覆方法,例如物理气相沉积如蒸发,溅射或阴极电弧,或化学气相沉积,喷涂,等离子体聚合,等离子体增强化学气相沉积等,多重 包括电绝缘材料的至少一个源和至少一个导电材料源的源被定向和屏蔽以便涂覆可植入医疗装置的分开的部分。 然后旋转被涂覆的物体,使得在物体上产生来自不同涂层源的材料的重叠螺旋涂层。
    • 6. 发明申请
    • CONICAL SPUTTERING TARGET
    • 锥形溅射靶
    • WO0240736B1
    • 2002-09-12
    • PCT/US0147089
    • 2001-11-13
    • GLOCKER DAVID A
    • GLOCKER DAVID A
    • C23C14/34C23C14/35H01J37/34
    • H01J37/3423C23C14/3407C23C14/35H01J37/3405
    • A hollow cathode magnetron (10) for sputtering target material (12) from the inner surface of a target onto an off-spaced substrate. The magnetron (10) is in the shape of a truncated cone, also known as a conical frustum. The target cone (12) is backed by a conical cathode maintained at a predetermined voltage for attracting gas ions into the inner surface of the target cone (12) to sputter material therefrom. The sputtering plasma is made uniform over the entire surface of the target (12) by assuring that the magnitude of the component of the magnetic field tangent to the target surface is constant. The plasma is further confined to the vicinity of the target (12) using electrostatic elements. Sputter coatings on planar substrates (16) can achieve areal thickness nonuniformities of less than +/-0.2%.
    • 一种空心阴极磁控管(10),用于从目标的内表面溅射目标材料(12)到间隔开的衬底上。 磁控管(10)呈截锥形,也称为圆锥台。 目标圆锥体(12)由保持在预定电压的圆锥形阴极支撑,用于将气体离子吸引到目标圆锥体(12)的内表面以从其溅射材料。 通过确保与目标表面相切的磁场分量的大小恒定,使溅射等离子体在靶(12)的整个表面上均匀。 使用静电元件将等离子体进一步限制在靶(12)的附近。 平面衬底(16)上的溅射涂层可实现小于+/- 0.2%的面积厚度不均匀性。