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1. 发明申请

WO2023041274A1 METROLOGY METHOD AND DEVICE 审中-公开
公开(公告)号：WO2023041274A1
公开(公告)日：2023-03-23
申请号：PCT/EP2022/072840
申请日：2022-08-16
申请人： ASML NETHERLANDS B.V.
发明人： KOOLEN, Armand, Eugene, Albert , COENE, Willem, Marie, Julia, Marcel , KONIJNENBERG, Alexander, Prasetya , TUKKER, Teunis, Willem , DEN BOEF, Arie, Jeffrey
IPC分类号： G06T5/00 , G06T5/10
摘要： Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one or more non-isoplanatic aberrations by performing one or both of: a field non-isoplanatic correction operation in field space for said first image, said field space corresponding to a field plane of the optical system; and a pupil non-isoplanatic correction operation in pupil space for said first image, said pupil space corresponding to a pupil plane of the optical system. Said one or more non-isoplanatic aberrations comprise a class of non-isoplanatic aberrations describable as a convolution combined with an object distortion and/or a pupil distortion.

2. 发明申请

WO2022135962A1 METROLOGY METHOD 审中-公开
公开(公告)号：WO2022135962A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/085058
申请日：2021-12-09
申请人： ASML NETHERLANDS B.V.
发明人： KOOLEN, Armand, Eugene, Albert , MATHIJSSEN, Simon, Gijsbert, Josephus , LIM, Hui Quan , ANDERSON, Amanda, Elizabeth
IPC分类号： G03F7/20
摘要： Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.

3. 发明申请

WO2020120082A1 METHOD OF MEASURING A PARAMETER OF A LITHOGRAPHIC PROCESS 审中-公开
公开(公告)号：WO2020120082A1
公开(公告)日：2020-06-18
申请号：PCT/EP2019/081836
申请日：2019-11-19
申请人： ASML NETHERLANDS B.V.
发明人： CRAMER, Hugo, Augustinus, Joseph , BOS, Hilko, Dirk , KOOP, Erik, Johan , KOOLEN, Armand, Eugene, Albert , NIENHUYS, Han-Kwang , POLO, Alessandro , LIAN, Jin , DEN BOEF, Arie, Jeffrey
IPC分类号： G03F7/20 , G01N21/47
摘要： The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.

4. 发明申请

WO2019158328A1 METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IMAGE PLANE DETECTION TECHNIQUES 审中-公开
公开(公告)号：WO2019158328A1
公开(公告)日：2019-08-22
申请号：PCT/EP2019/051618
申请日：2019-01-23
申请人： ASML NETHERLANDS B.V.
发明人： PANDEY, Nitesh , ZHOU, Zili , VAN DER ZOUW, Gerbrand , DEN BOEF, Arie , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria , KOOLEN, Armand, Eugene, Albert , CRAMER, Hugo, Augustinus, Joseph , HINNEN, Paul, Christiaan , VAN WEERT, Martinus, Hubertus, Maria , TSIATMAS, Anagnostis , WANG, Shu-jin , FAGGINGER AUER, Bastiaan, Onne , VERMA, Alok
IPC分类号： G03F7/20
摘要： A inspection apparatus, method, and system associated therewith are described herein. In a non-limiting embodiment, a inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, and the illumination beam being polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization; generate image data representing an image of each of the feature(s) based on the intensity data; and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

5. 发明申请

WO2018219639A1 METROLOGY APPARATUS 审中-公开
公开(公告)号：WO2018219639A1
公开(公告)日：2018-12-06
申请号：PCT/EP2018/062547
申请日：2018-05-15
申请人： ASML NETHERLANDS B.V.
发明人： RAVENSBERGEN, Janneke , PANDEY, Nitesh , ZHOU, Zili , KOOLEN, Armand, Eugene, Albert , GOORDEN, Sebastianus, Adrianus , FAGGINGER AUER, Bastiaan, Onne , MATHIJSSEN, Simon, Gijsbert, Josephus
IPC分类号： G03F7/20 , G01N21/47 , G01N21/95 , G01B11/02
摘要： A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

6. 发明申请

WO2022223230A1 METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL 审中-公开
公开(公告)号：WO2022223230A1
公开(公告)日：2022-10-27
申请号：PCT/EP2022/057659
申请日：2022-03-23
申请人： ASML NETHERLANDS B.V.
发明人： LIAN, Jin , KOOLEN, Armand, Eugene, Albert , GOORDEN, Sebastianus, Adrianus , LIM, Hui Quan
IPC分类号： G03F7/20
摘要： Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values; and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data, the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack; and the correction is determined from said target-invariant correction parameter.

7. 发明申请

WO2019068459A1 METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE OR MORE STRUCTURES ON A SUBSTRATE 审中-公开
公开(公告)号：WO2019068459A1
公开(公告)日：2019-04-11
申请号：PCT/EP2018/075239
申请日：2018-09-18
申请人： STICHTING VU , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , ASML NETHERLANDS B.V.
发明人： TINNEMANS, Patricius, Aloysius, Jacobus , DEN BOEF, Arie, Jeffrey , KOOLEN, Armand, Eugene, Albert , PANDEY, Nitesh , TENNER, Vasco, Tomas , COENE, Willem, Marie, Julia, Marcel , WARNAAR, Patrick
IPC分类号： G01B11/24 , G03F7/20
摘要： Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

8. 发明申请

WO2018108499A1 METHOD FOR MONITORING A CHARACTERISTIC OF ILLUMINATION FROM A METROLOGY APPARATUS 审中-公开
公开(公告)号：WO2018108499A1
公开(公告)日：2018-06-21
申请号：PCT/EP2017/080476
申请日：2017-11-27
申请人： ASML NETHERLANDS B.V.
发明人： SCHMETZ-SCHAGEN, Jolanda, Theodora, Josephina , CRAMER, Hugo, Augustinus, Joseph , KOOLEN, Armand, Eugene, Albert , FAGGINGER AUER, Bastiaan, Onne
IPC分类号： G03F7/20 , G03F9/00 , G01N21/956
摘要： A method for monitoring a characteristic of illumination from a metrology apparatus, the method comprising: using the metrology apparatus to acquire a pupil image at different focus settings of the metrology apparatus; and calculating an asymmetry value for each acquired pupil image; wherein each pupil image is acquired on at least one edge of a target of a substrate.

9. 发明申请

WO2017114641A1 METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM 审中-公开
标题翻译：在检查系统中对焦的方法和装置
公开(公告)号：WO2017114641A1
公开(公告)日：2017-07-06
申请号：PCT/EP2016/079798
申请日：2016-12-06
申请人： ASML HOLDING N.V. , ASML NETHERLANDS B.V.
发明人： SHMAREV, Yevgeniy, Konstantinovich , SMIRNOV, Stanislav , TSENG, Chien-Hung , KOOLEN, Armand, Eugene, Albert
IPC分类号： G03F7/20
CPC分类号： G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8822 , G01N2021/95676 , G01N2201/0638 , G03F7/70625 , G03F7/70641
摘要： An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
摘要翻译：检查设备，包括：基板保持器，被构造为保持基板; 一个光圈装置; 以及光学系统，所述光学系统被配置为将第一测量光束照射到所述衬底上，所述第一测量光束具有第一强度分布，并且被配置为在所述第一测量光束同时将第二聚焦照射光束引导到所述衬底上所述第二聚焦束具有第二强度分布，其中所述第二强度分布的至少一部分至少在所述衬底和/或所述孔装置处与所述第一强度分布在空间上分离。

10. 发明申请

WO2017055072A1 METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC SYSTEM 审中-公开
标题翻译：计量方法与装置，计算机程序和计算机系统
公开(公告)号：WO2017055072A1
公开(公告)日：2017-04-06
申请号：PCT/EP2016/071505
申请日：2016-09-13
申请人： ASML NETHERLANDS B.V.
发明人： PANDEY, Nitesh , ZHOU, Zili , KOOLEN, Armand, Eugene, Albert , VAN DER ZOUW, Gerbrand
IPC分类号： G03F7/20
CPC分类号： G03F7/70625 , G01B11/272 , G01N21/47 , G03F7/7015 , G03F7/706 , G03F7/70633
摘要： Disclosed is a metrology apparatus for measuring a parameter of a lithographic process, and associated computer program and method. The metrology apparatus comprises an optical system for measuring a target on a substrate by illuminating the target with measurement radiation and detecting the measurement radiation scattered by the target; and an array of lenses. Each lens of the array is operable to focus the scattered measurement radiation onto a sensor, said array of lenses thereby forming an image on the sensor which comprises a plurality of sub-images, each sub-image being formed by a corresponding lens of the array of lenses. The resulting plenoptic image comprises image plane information from the sub-images, wavefront distortion information (from the relative positions of the sub-images) and pupil information from the relative intensities of the sub-images.
摘要翻译：公开了一种用于测量光刻工艺的参数的计量装置，以及相关联的计算机程序和方法。测量装置包括：光学系统，用于通过用测量辐射照射目标并检测目标散射的测量辐射来测量基板上的目标; 和一系列镜头。阵列的每个透镜可操作以将散射的测量辐射聚焦到传感器上，所述透镜阵列由此在传感器上形成包括多个子图像的图像，每个子图像由阵列的相应透镜形成的镜头。所得到的全视觉图像包括来自子图像的图像平面信息，波前失真信息（来自子图像的相对位置）和来自子图像的相对强度的瞳孔信息。

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