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1. 发明申请

WO2016165881A1 LITHOGRAPHIC APPARATUS 审中-公开
标题翻译： LITHOGRAPHIC设备
公开(公告)号：WO2016165881A1
公开(公告)日：2016-10-20
申请号：PCT/EP2016/054883
申请日：2016-03-08
申请人： ASML NETHERLANDS B.V.
发明人： NAKIBOGLU, Günes , VAN DER WIJST, Marc, Wilhelmus, Maria , VAN DUIJNHOVEN, Marc , DE HOON, Cornelius, Adrianus, Lambertus , VAN BOXTEL, Frank, Johannes, Jacobus
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , G03F7/709
摘要： A lithographic apparatus has shield which protects a functional subsystem form acoustic disturbances. The shield comprises a locally resonant sonic material for implementing the protecting. In an embodiment the shield comprises a panel formed by a cell or a plurality of cells comprising: a frame; an elastic membrane whose edge is fixed to the frame; and a mass attached to a location at the membrane at a non-zero distance from the edge.
摘要翻译：光刻设备具有保护功能子系统形成声学干扰的屏蔽。屏蔽包括用于实现保护的局部共振声波材料。在一个实施例中，屏蔽包括由单元或多个单元形成的面板，包括：框架; 其边缘固定在框架上的弹性膜; 以及在距离边缘非零距离处附着在膜上的位置的质量。

2. 发明申请

WO2017148650A1 VIBRATION ISOLATOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：振动隔离器，光刻设备和器件制造方法
公开(公告)号：WO2017148650A1
公开(公告)日：2017-09-08
申请号：PCT/EP2017/052343
申请日：2017-02-03
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , DE HOON, Cornelius, Adrianus, Lambertus , JACOBS, Fransiscus, Mathijs , KAGAN, Pavel , STARREVELD, Jeroen, Pieter , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
IPC分类号： G03F7/20 , F16F15/02 , F16F15/023 , F16F15/027 , F16F9/02
摘要： The invention relates to a vibration isolator (VI), comprising: a base (10); a coupling element (20) to be coupled to a vibration sensitive object; a decoupling mass (30); a first vibration isolator part (31) arranged between the base (10) and the decoupling mass (30); and a second vibration isolator part (40) arranged between the decoupling mass (30) and the coupling element (20), and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.
摘要翻译：本发明涉及一种隔振器（VI），包括：底座（10）;以及底座耦合到振动敏感物体的耦合元件（20）一个解耦体（30）; 布置在所述基座（10）与所述解耦质量体（30）之间的第一隔振器部件（31）; 和布置在所述解耦质量体（30）与所述耦合元件（20）之间的第二隔振器部件（40），并且其中所述第一隔振器部件和所述第二隔振器部件中的至少一个包括气动隔离器。

3. 发明申请

WO2020160852A1 ELECTRONIC SYSTEM, ACCELEROMETER, CALIBRATION METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2020160852A1
公开(公告)日：2020-08-13
申请号：PCT/EP2020/050051
申请日：2020-01-03
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , JANSEN, Bas , DE HOON, Cornelius, Adrianus, Lambertus
IPC分类号： G01P15/09 , G01P21/00 , G03F7/20 , G01D3/032
摘要： The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: - receive an acceleration signal from the piezoelectric element; - electronically dampen an amplitude of the first mechanical resonance frequency; and - generate a damped acceleration signal, b) an extender configured to: - receive the damped acceleration signal; - extend the frequency response; and - output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

4. 发明申请

WO2017108284A1 LITHOGRAPHIC APPARATUS HAVING AN ACTIVE BASE FRAME SUPPORT 审中-公开
标题翻译：具有主动式基座支架的光刻设备
公开(公告)号：WO2017108284A1
公开(公告)日：2017-06-29
申请号：PCT/EP2016/077954
申请日：2016-11-17
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , BUKKEMS, Björn, Hubertus, Maria , DE HOON, Cornelius, Adrianus, Lambertus , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.
摘要翻译：光刻设备包括构造成形成光刻设备的支撑结构的基座框架，设置在基座框架和底层之间的主动基座框架支撑件。有源底座支架配置为支撑地面底座上的底座。有源底座支架包括致动器，该致动器构造成在底座框架和接地平面之间沿水平方向施加力。所述光刻设备进一步包括控制装置，所述控制装置构造成驱动所述致动器，所述控制装置提供表示基架上的干扰力的信号，所述控制装置配置为使用所述力传感器信号驱动所述致动器。

5. 发明申请

WO2019206595A1 FRAME ASSEMBLY, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2019206595A1
公开(公告)日：2019-10-31
申请号：PCT/EP2019/058504
申请日：2019-04-04
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , DE BEER, Joep, Sander , DE HOON, Cornelius, Adrianus, Lambertus , STARREVELD, Jeroen, Pieter , VAN DUIJNHOVEN, Martinus , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
IPC分类号： G03F7/20
摘要： The invention provides a lithographic apparatus or frame assembly, comprising: - a first and a second pneumatic support, being arranged to control a position of a frame, each of said pneumatic supports accommodating a pressure chamber, - a frame position control system, comprising: - a first position sensor device, configured to generate measurement data relating to the position of the frame, - a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device, - a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first pneumatic support and the second pneumatic support, - a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

6. 发明申请

WO2019206517A1 PNEUMATIC SUPPORT DEVICE AND LITHOGRAPHIC APPARATUS WITH PNEUMATIC SUPPORT DEVICE 审中-公开
公开(公告)号：WO2019206517A1
公开(公告)日：2019-10-31
申请号：PCT/EP2019/056650
申请日：2019-03-18
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , DE BEER, Joep, Sander , DE HOON, Cornelius, Adrianus, Lambertus , STARREVELD, Jeroen, Pieter , VAN DUIJNHOVEN, Martinus , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
IPC分类号： G03F7/20
摘要： The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

7. 发明申请

WO2015062921A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2015062921A1
公开(公告)日：2015-05-07
申请号：PCT/EP2014/072590
申请日：2014-10-22
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , DE HOON, Cornelius, Adrianus, Lambertus , VAN DER WIJST, Marc, Wilhelmus, Maria , VERHEES, Thijs , KERSSEMAKERS, Sander
IPC分类号： G03F7/20
CPC分类号： G03F7/70775 , G03F7/70766 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus (300) includes: a base frame (50); an illumination system (310) configured to condition a radiation beam and supported by the base frame; a support (320) constructed to support a patterning device (350), the patterning device being capable of imparting the radiation beam with a pattern in its cross- section to form a patterned radiation beam; a substrate table (100.2, 100.3) constructed to hold a substrate (110); a projection system (340) configured to project the patterned radiation beam onto a target portion of the substrate; a positioning device (100) configured to position the substrate table, the positioning device being supported by the base frame; a sensor (395) configured to sense a vibration caused by a torque exerted on the base frame and, an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.
摘要翻译：光刻设备（300）包括：基架（50）; 照明系统（310），被配置为调节辐射束并由所述基架支撑; 构造成支撑图案形成装置（350）的支撑件（320），所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底（110）的衬底台（100.2,100.3）; 投影系统（340），被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 定位装置（100），其被配置为定位所述基板台，所述定位装置由所述基架支撑; 传感器（395），其被配置为感测由施加在所述基座框架上的扭矩引起的振动;以及致动器，其被配置为响应于所感测到的振动而对所述照明系统或所述基座框架施加力，以便至少部分地抑制振动。

8. 发明申请

WO2019214930A1 VIBRATION ISOLATION SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2019214930A1
公开(公告)日：2019-11-14
申请号：PCT/EP2019/060281
申请日：2019-04-23
申请人： ASML NETHERLANDS B.V.
发明人： JACOBS, Roy, Hendrikus, Emilie, Maria , DE HOON, Cornelius, Adrianus, Lambertus , STARREVELD, Jeroen, Pieter , VERMEULEN, Johannes, Petrus, Martinus, Bernardus
IPC分类号： G03F7/20 , F16F15/023 , F16F15/04
摘要： The invention provides a vibration isolation system (IS), comprising a piston (402) to carry a payload, a connecting member (410), a spring (404) and a flexible member (408). The spring is arranged to support the piston along a direction with a positive stiffness. The flexible member is arranged to apply a force to the piston along the direction via the connecting member with a negative stiffness.

9. 发明申请

WO2017118508A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：WO2017118508A1
公开(公告)日：2017-07-13
申请号：PCT/EP2016/080062
申请日：2016-12-07
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , DE HOON, Cornelius, Adrianus, Lambertus , JACOBS, Fransiscus, Mathijs , KAGAN, Pavel , STARREVELD, Jeroen, Pieter , WIJCKMANS, Maurice, Willem, Jozef, Etiënne
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithographic apparatus is described, the lithographic apparatus comprising: - an illumination system (IL) configured to condition a radiation beam; - a support (SA2) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam (PR); - a projection system (PS) configured to project the patterned radiation beam onto a target portion of a substrate (W), - a stage assembly (SA) comprising: - a substrate table (WT) constructed to hold the substrate; and - a positioning device configured to displace the substrate table relative to the projection system; - a base frame onto which stage assembly and the projection system are mounted; - the base frame comprising a first portion (SABF) configured to support the stage assembly and a second portion (BF2) configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion (DC) of the base frame.
摘要翻译：描述了一种光刻设备，该光刻设备包括： - 照射系统（IL），其被配置为调节辐射束; - 构造成支撑图案形成装置（MA）的支撑件（SA2），所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束（PR）; - 投影系统（PS），其经配置以将所述经图案化的辐射束投影到衬底（W）的目标部分上; - 平台组合件（SA），其包括： - 衬底台（WT），其经构造以保持所述衬底; 以及 - 定位装置，其被构造成相对于所述投影系统移位所述衬底台; - 台架组件和投影系统安装在其上的基座框架; - 基架包括被配置为支撑台组件的第一部分（SABF）和被配置为支撑投影系统的第二部分（BF2），第一部分和第二部分经由柔性部分（DC）彼此连接，的基本框架。

10. 发明申请

WO2015106925A1 SUPPORT DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：支持设备，平面设备和设备制造方法
公开(公告)号：WO2015106925A1
公开(公告)日：2015-07-23
申请号：PCT/EP2014/078541
申请日：2014-12-18
申请人： ASML NETHERLANDS B.V.
发明人： BUTLER, Hans , DE HOON, Cornelius, Adrianus, Lambertus , KERP, Ingmar, August , MEIJERS, Pieter, Johannes, Gertrudis , OOMS, Wesley , STARREVELD, Jeroen, Pieter , TEN HOOPEN, Derk , VAN DUIJNHOVEN, Martinus , HAGE, Edward , DRAAIJER, Evert, Hendrik, Jan
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , F16F15/0232 , G03F7/70733 , G03F7/70833 , G03F7/709
摘要： A support device (2) configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes: a supporting system (20) configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber (30) connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting section; and a section of acoustic damping material (40), arranged at a location within the gas chamber such that it separates first and second gas containing regions within the gas chamber on either side of the section of acoustic damping material.
摘要翻译：支撑装置（2），被配置为相对于第二部件支撑第一部件，使得两个部件之间的振动传递最小化，包括：支撑系统（20），其构造成在压力下使用气体以在第一部分之间提供支撑力和第二部分; 连接到所述支撑系统并被配置为容纳处于压力下的气体并将气体提供给所述支撑部分的气室（30）; 以及一部分声学阻尼材料（40），其布置在气体室内的位置处，使得其分隔在声阻尼材料部分的任一侧上的气体室内的第一和第二气体容纳区域。

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