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1. 发明申请

WO2010082106A1 CHARGED PARTICLE BEAM PVD DEVICE, SHIELDING DEVICE, COATING CHAMBER FOR COATING SUBSTRATES, AND METHOD OF COATING 审中-公开
标题翻译：充电颗粒光束PVD装置，屏蔽装置，涂覆基板涂层室，涂层方法
公开(公告)号：WO2010082106A1
公开(公告)日：2010-07-22
申请号：PCT/IB2010/000031
申请日：2010-01-11
申请人： APPLIED MATERIALS, INC. , KREMPEL-HESSE, Joerg , GRILLMAYER, Juergen , HERMANNS, Uwe
发明人： KREMPEL-HESSE, Joerg , GRILLMAYER, Juergen , HERMANNS, Uwe
IPC分类号： C23C14/22 , C23C14/34 , C23C14/56 , C23C14/54
CPC分类号： C23C14/564 , C23C14/3407 , H01J37/34 , H01J37/3447 , H01J37/347
摘要： A charged particle beam PVD device is provided, including a target (262) of coating material inside of a casing (261), a vapor aperture (263) provided in the casing, and a shielding device (266, 268; 2680) provided adjacent to the vapor aperture, the shielding device being on floating potential.
摘要翻译：提供一种带电粒子束PVD器件，包括壳体内部的涂层材料靶（262），设置在壳体中的蒸气孔（263）和邻近设置的屏蔽装置（266,268,2680）对于蒸气孔，屏蔽装置处于浮动电位。

2. 发明申请

WO2011006801A1 TARGET BACKING TUBE, CYLINDRICAL TARGET ASSEMBLY AND SPUTTERING SYSTEM 审中-公开
标题翻译：目标后支管，圆柱形目标组件和喷射系统
公开(公告)号：WO2011006801A1
公开(公告)日：2011-01-20
申请号：PCT/EP2010/059658
申请日：2010-07-06
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
发明人： SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
IPC分类号： H01J37/34
CPC分类号： H01J37/3405 , H01J37/3435 , H01J37/3497
摘要： The present application concerns a target backing tube (122) for a rotatable cylindrical target assembly (120) comprising: a tube (122) for at least one target element (126) to be disposed there around, wherein the tube has an exterior surface adapted to be directed to the at least one target element; and a thermal reflection cover (128) covering a portion of at least 20% of the exterior surface of the tube. Further, the present application concerns a rotatable cylindrical target assembly comprising: said target backing tube and at least one target element disposed around the target backing tube, wherein the thermal reflection cover disposed between the target backing tube and the at least one target element.
摘要翻译：本申请涉及一种用于可旋转的圆柱形目标组件（120）的目标支撑管（122），包括：用于至少一个待设置在其周围的目标元件（126）的管（122），其中管具有适于指向至少一个目标元件; 以及覆盖管的外表面的至少20％的一部分的热反射罩（128）。此外，本申请涉及一种可旋转圆柱形目标组件，其包括：所述目标背衬管和围绕目标背衬管设置的至少一个目标元件，其中设置在目标背衬管和至少一个目标元件之间的热反射盖。

3. 发明申请

WO2011098538A1 METHOD FOR PRODUCING AN ITO LAYER AND SPUTTERING SYSTEM 审中-公开
标题翻译：生产ITO层和溅射系统的方法
公开(公告)号：WO2011098538A1
公开(公告)日：2011-08-18
申请号：PCT/EP2011/051991
申请日：2011-02-10
申请人： APPLIED MATERIALS, INC. , HELLMICH, Anke , SCHNAPPENBERGER, Frank , KREMPEL-HESSE, Joerg
发明人： HELLMICH, Anke , SCHNAPPENBERGER, Frank , KREMPEL-HESSE, Joerg
IPC分类号： C23C14/08 , C23C14/34 , C23C14/35
CPC分类号： C23C14/086 , C23C14/3407 , C23C14/3421 , C23C14/35 , H01J37/3405 , H01J37/342
摘要： The present disclosure relates to a method for producing an indium-tin-oxide layer, comprising: providing a substrate to be coated in a sputtering chamber; providing a rotatable non-bonded target around a backing tube for coating the substrate in the sputtering chamber; and sputtering the material from the target in an atmosphere containing an O 2 /H 2 mixture. Further, the present disclosure relates to a sputtering system comprising a sputtering chamber having at least one gas inlet and being adapted for at least one backing tube for a non-bonded rotatable target, a control device adapted to control the flow through the gas inlet, wherein the control device is adapted to control the at least one gas inlet such that a coating on a substrate using a sputtering process is performed in an atmosphere containing an O 2 /H 2 mixture in the sputtering chamber for forming an indium-tin-oxide layer.
摘要翻译：本公开内容涉及一种制造铟锡氧化物层的方法，包括：在溅射室中提供待涂覆的基板; 在背衬管周围提供可旋转的未粘合的靶，用于在溅射室中涂覆基底; 并在含有O 2 / H 2混合物的气氛中从靶上溅射材料。此外，本公开涉及一种溅射系统，其包括具有至少一个气体入口的溅射室，并且适用于至少一个用于非粘合的可旋转靶的背衬管，适于控制通过气体入口的流动的控制装置，其中所述控制装置适于控制所述至少一个气体入口，使得使用溅射工艺的衬底上的涂层在用于形成铟锡氧化物层的溅射室中的含有O 2 / H 2混合物的气氛中进行。

4. 发明申请

WO2011006802A1 TARGET BACKING TUBE, CYLINDRICAL TARGET, AND CYLINDRICAL TARGET ASSEMBLY 审中-公开
标题翻译：目标支管，圆柱目标和圆柱目标组件
公开(公告)号：WO2011006802A1
公开(公告)日：2011-01-20
申请号：PCT/EP2010/059660
申请日：2010-07-06
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
发明人： SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
IPC分类号： H01J37/34
CPC分类号： H01J37/3405 , H01J37/3435
摘要： A target backing tube is described. The target backing tube is for a rotatable target and includes a tube adapted for one or more non-bonded target cylinders to be disposed around the tube, the tube having an exterior surface adapted to face the at least one target cylinder and at least three or more protrusion receiving positions; and protrusions mounted on the exterior surface of the tube at each of the protrusion receiving positions for centering the target cylinders.
摘要翻译：描述了目标背衬管。目标背衬管用于可旋转的靶，并且包括适于一个或多个未粘合的目标圆柱体的管以围绕管布置，所述管具有适于面对至少一个目标圆柱体的外表面和至少三个或更多突出接收位置; 以及在用于使目标气缸对中的每个突起接收位置处安装在管的外表面上的突起。

5. 发明申请

WO2011006799A1 SPUTTERING SYSTEM, ROTATABLE CYLINDRICAL TARGET ASSEMBLY, BACKING TUBE, TARGET ELEMENT AND COOLING SHIELD 审中-公开
标题翻译：喷射系统，可旋转圆柱形目标组件，背管，目标元件和冷却屏蔽
公开(公告)号：WO2011006799A1
公开(公告)日：2011-01-20
申请号：PCT/EP2010/059656
申请日：2010-07-06
申请人： APPLIED MATERIALS, INC. , SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
发明人： SCHNAPPENBERGER, Frank , WEBER, Roland , KREMPEL-HESSE, Joerg , HELLMICH, Anke
IPC分类号： H01J37/34
CPC分类号： H01J37/342 , H01J37/3405 , H01J37/3435 , H01J37/3497
摘要： The application concerns a target backing tube for a rotatable cylindrical target assembly (120) comprising : a tube (122a) for at least one target element (126a) to be disposed there around, wherein the tube has an exterior surface adapted to face the at least one target element, wherein a portion of the exterior surface of the tube has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the exterior surface of the tube. Further, the application concerns a cooling shield for a sputtering system comprising a rotatable target, the cooling shield has an interior surface adapted to face a target element of a sputtering system and an exterior surface; wherein a portion of the interior surface of the cooling shield has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the cooling shield. Additionally, the application concerns a target element for a rotatable cylindrical target assembly of a sputtering system, wherein the target element an interior surface adapted to face a target backing tube onto which the target cylinder is adapted to be disposed and exterior surface, wherein a portion of the interior surface of the target element has a emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the target element.
摘要翻译：该应用涉及用于可旋转圆柱形目标组件（120）的目标背衬管，包括：用于至少一个目标元件（126a）的管（122a），其布置在其周围，其中管具有适于面向至少一个目标元件，其中所述管的外表面的一部分的平均发射率为0.7至1，其中所述部分是所述管的外表面的至少50％。此外，该应用涉及包括可旋转靶的溅射系统的冷却屏蔽，冷却屏具有适于面对溅射系统的目标元件和外表面的内表面; 其中所述冷却罩的内表面的一部分的平均发射率为0.7-1，其中所述部分是所述冷却屏蔽的内表面的至少50％。另外，该应用涉及一种用于溅射系统的可旋转圆柱形目标组件的目标元件，其中目标元件适于面向目标背衬管的内表面，目标圆柱体适于放置在其上并且外表面，其中一部分目标元件的内表面的发射率为0.7比1，其中该部分是目标元件的内表面的至少50％。

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