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1. 发明申请

WO2005004189A2 SIDEWALL MAGNET IMPROVING UNIFORMITY OF INDUCTIVELY COUPLED PLASMA AND SHIELDS USED THEREWITH 审中-公开
标题翻译：电动磁铁改善电感耦合等离子体和平板电脑的均匀性
公开(公告)号：WO2005004189A2
公开(公告)日：2005-01-13
申请号：PCT/US2004/020186
申请日：2004-06-22
申请人： APPLIED MATERIALS, INC. , GUNG, Tza-Jing , TANG, Xianmin , FORSTER, John , DING, Peijun , SCHWEITZER, Marc , MILLER, Keith, A. , LAVITSKY, Ilya
发明人： GUNG, Tza-Jing , TANG, Xianmin , FORSTER, John , DING, Peijun , SCHWEITZER, Marc , MILLER, Keith, A. , LAVITSKY, Ilya
IPC分类号： H01J37/00
CPC分类号： H01J37/3402 , C23C14/046 , C23C14/345 , C23C14/3457 , C23C14/358 , H01J37/321 , H01J37/32623 , H01J37/3408 , H01J37/3411 , H01J37/3441 , H01J2237/3327 , H01L21/2855 , H01L21/76843 , H01L21/76877
摘要： One aspect of the invention includes an auxiliary magnet ring positioned outside of the chamber wall of a plasma sputter reactor and being disposed at least partially radially outwardly of an RF coil used to inductively generate a plasma, particularly for sputter etching the substrate being sputter deposited. Thereby, a magnetic barrier prevents the plasma from leaking outwardly to the coil and improves the uniformity of sputter etching. The magnetic field also acts as a magnetron when the coil, when made aspect of the same material as the primary target, is being used as a secondary target. Another aspect of the invention includes a one-piece inner shield extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil.
摘要翻译：本发明的一个方面包括位于等离子体溅射反应器的室壁外部的辅助磁环，并且至少部分地设置在用于感应地产生等离子体的RF线圈的径向外侧，特别是用于溅射蚀刻被溅射沉积的衬底。因此，磁屏障防止等离子体向外泄漏到线圈并提高溅射蚀刻的均匀性。当线圈当与主要目标相同的材料制成的方面被用作次要靶时，磁场也用作磁控管。本发明的另一方面包括从目标件延伸到具有光滑的内表面并由屏蔽件的中间部分中的环形凸缘支撑的一体式内屏蔽件。屏蔽可用于支持RF线圈。

2. 发明申请

WO2005100630A1 SELECTABLE DUAL POSITION MAGNETRON 审中-公开
标题翻译：可选双位置磁铁
公开(公告)号：WO2005100630A1
公开(公告)日：2005-10-27
申请号：PCT/US2005/008513
申请日：2005-03-15
申请人： APPLIED MATERIALS INC. , GUNG, Tza-Jing , YANG, Hong, S. , SUBRAMANI, Anantha, K. , EWERT, Maurice, E. , MILLER, Keith, A. , BURKHART, Vincent, E.
发明人： GUNG, Tza-Jing , YANG, Hong, S. , SUBRAMANI, Anantha, K. , EWERT, Maurice, E. , MILLER, Keith, A. , BURKHART, Vincent, E.
IPC分类号： C23C14/35
CPC分类号： H01J37/3455 , C23C14/35 , H01J37/3408
摘要： A dual-position magnetron (50) that is rotated about a central axis (60) in back of a sputtering target (16), particularly for sputtering an edge of a target of a barrier material onto a wafer (18) and cleaning material redeposited at a center of the target. During target cleaning, wafer bias is reduced. In one embodiment, an arc-shaped magnetron (130) is supported on a pivot arm (90) pivoting on the end of a bracket (82) fixed to the rotary shaft (62). A spring (96) biases the pivot arm such that the magnetron is urged towards and overlies the target center. Centrifugal force at increased rotation rate overcomes the spring bias and shift the magnetron to an outer position with the long magnetron dimension aligned with the target edge. Mechanical stops (100, 102) prevent excessive movement in either direction. Other mechanisms include linear slides (180) and actuators (208).
摘要翻译：一种双重位置磁控管（50），其围绕溅射靶（16）背面的中心轴线（60）旋转，特别是用于将阻挡材料的靶材的边缘溅射到晶片（18）上并重新沉积的清洁材料在目标的中心。在目标清洁期间，晶片偏置减小。在一个实施例中，弧形磁控管（130）被支撑在枢转臂（90）上，枢转臂（90）在固定到旋转轴（62）的托架（82）的端部上枢转。弹簧（96）偏压枢转臂，使得磁控管被推向目标中心并覆盖在目标中心上。提高旋转速度的离心力克服了弹簧偏压，并将磁控管移动到外部位置，长磁导管尺寸与目标边缘对齐。机械止动件（100,102）可以防止任何方向的过度运动。其他机构包括线性滑块（180）和致动器（208）。

3. 发明申请

WO2010025104A3 PROCESS KIT SHIELDS AND METHODS OF USE THEREOF 审中-公开
公开(公告)号：WO2010025104A3
公开(公告)日：2010-03-04
申请号：PCT/US2009/054741
申请日：2009-08-24
申请人： APPLIED MATERIALS, INC. , SOMMERS, Joseph, F. , MILLER, Keith, A.
发明人： SOMMERS, Joseph, F. , MILLER, Keith, A.
IPC分类号： H01L21/00 , H01L21/02 , H01L21/683 , H01L21/687
摘要： Process kit shields for use in a process chamber and methods of use thereof are provided herein. In some embodiments, the process kit shield may include a body having a wall comprising a first layer and a second layer bonded to the first layer, wherein the first layer comprises a first material resistant to a cleaning chemistry utilized to remove material disposed on the first layer during processing, and wherein the second layer comprises a second material different than the first material and having a coefficient of thermal expansion substantially similar to that of the first material. In some embodiments, the process kit shield may be disposed in a process chamber having a processing volume and a non-processing volume. The process kit shield may be disposed between the processing volume and the non-processing volume

4. 发明申请

WO2009085157A1 PREDICTION AND COMPENSATION OF EROSION IN A MAGNETRON SPUTTERING TARGET 审中-公开
标题翻译：磁控溅射目标中的腐蚀预测和补偿
公开(公告)号：WO2009085157A1
公开(公告)日：2009-07-09
申请号：PCT/US2008/013766
申请日：2008-12-16
申请人： APPLIED MATERIALS, INC. , MILLER, Keith, A. , LUBBEN, Daniel, C.
发明人： MILLER, Keith, A. , LUBBEN, Daniel, C.
IPC分类号： H01L21/203
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3482
摘要： When a magnetron (72) is scanned about the back of a target (38) in a selected complex path (150) having radial components, the target erosion profile has a form depending upon the selection of paths. A radial erosion rate profile (160) for a given magnetron is measured. Periodically during scanning, an erosion profile (168) is calculated from the measured erosion rate profile (160) and profiles (162, 164, 166) derived from it, the time the magnetron spends at different radii, and the target power. The calculated erosion profile may be used to indicate when erosion has become excessive at any location prompting target replacement or to adjust the height of the magnetron above the target for repeated scans, hi another aspect of the invention, the magnetron height is dynamically adjusted (206) during a scan to compensate for erosion. The compensation may be based on the calculated erosion profile or on feedback control of the present value of the target voltage (124) for a constant-power target supply (110).
摘要翻译：当在具有径向分量的选定复合路径（150）中围绕目标（38）的背面扫描磁控管（72）时，目标侵蚀曲线具有取决于路径选择的形式。测量给定磁控管的径向侵蚀速率曲线（160）。在扫描期间，根据测得的侵蚀速率曲线（160）和衍生自其的轮廓（162,164,166），磁控管在不同半径处的时间和目标功率计算出侵蚀曲线（168）。所计算的侵蚀曲线可用于指示在任何位置处的侵蚀已经变得过度，促使目标更换或调整靶上方的磁控管的高度以重复扫描。在本发明的另一方面，磁控管高度被动态地调节（206 ），以补偿侵蚀。补偿可以基于所计算的侵蚀曲线或者针对恒定功率目标电源（110）的目标电压（124）的当前值的反馈控制。

5. 发明申请

WO2008094418A1 OFFSET MAGNET COMPENSATION FOR NON-UNIFORM PLASMA 审中-公开
标题翻译：非均匀等离子体的偏移磁体补偿
公开(公告)号：WO2008094418A1
公开(公告)日：2008-08-07
申请号：PCT/US2008/000793
申请日：2008-01-22
申请人： APPLIED MATERIALS, INC. , BOITNOTT, Christopher , MILLER, Keith, A.
发明人： BOITNOTT, Christopher , MILLER, Keith, A.
IPC分类号： C23C14/32
CPC分类号： C23C14/35 , C23C14/046 , H01J37/3408 , H01J37/3452 , H01J37/3458
摘要： A non-axisymmetric electromagnet coil (124) used in plasma processing in which at least one electromagnet coil is not symmetric with the central axis (54) of the plasma processing chamber with which it is used but is symmetric with an axis (130) offset from the central axis. When placed radially outside of an RF coil (86), it may reduce the azimuthal asymmetry in the plasma produced by the RF coil. Axisymmetric magnet arrays may include additional axisymmetric electromagnet coils (122, 126, 128). One axisymmetric coil (126) is advantageously placed radially inside of the non-axisymmetric coil to carry opposed currents. The multiple electromagnet coils may be embedded in a molded encapsulant (162) having a central bore (178) about a central axis providing the axisymmetry of the coils.
摘要翻译：用于等离子体处理中的非轴对称电磁线圈（124），其中至少一个电磁线圈与等离子体处理室的中心轴线（54）不对称，使用该等离子体处理室，但与轴（130）偏移对称从中心轴。当径向放置在RF线圈（86）的外部时，可以降低由RF线圈产生的等离子体的方位不对称性。轴对称磁体阵列可以包括附加的轴对称电磁体线圈（122,126,128）。一个轴对称线圈（126）有利地放置在非轴对称线圈的径向内部以承载相对的电流。多个电磁线圈可以嵌入模制的密封剂（162）中，所述密封剂具有围绕中心轴线的中心孔（178），从而提供线圈的轴对称性。

6. 发明申请

WO2009154853A2 WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS 审中-公开
标题翻译：波浪加工沉积屏蔽部件
公开(公告)号：WO2009154853A2
公开(公告)日：2009-12-23
申请号：PCT/US2009/040487
申请日：2009-04-14
申请人： APPLIED MATERIALS, INC. , RIKER, Martin, Lee , MILLER, Keith, A. , SUBRAMANI, Anantha, K.
发明人： RIKER, Martin, Lee , MILLER, Keith, A. , SUBRAMANI, Anantha, K.
CPC分类号： C23C16/4585 , C23C14/34 , C23C14/50 , C23C14/564 , H01J37/32623 , H01J37/32633 , H01J37/3408 , H01J37/3441
摘要： Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support.
摘要翻译：本文描述的实施例通常涉及用于半导体处理室的部件，用于半导体处理室的处理套件以及具有处理套件的半导体处理室。在一个实施例中，提供了用于环绕溅射靶的底部屏蔽件和衬底支撑件。下屏蔽包括具有第一直径的圆柱形外带，其尺寸被设计成围绕溅射靶的溅射表面和衬底支撑件，该圆柱形带包括围绕溅射靶的溅射表面的顶壁和围绕溅射靶的底壁衬底支撑件，包括搁置表面并从圆柱形外带径向向外延伸的支撑凸缘，从圆柱形带的底壁径向向内延伸的底板，以及与基板耦合并部分围绕外围的圆柱形内带基板支撑的边缘。

7. 发明申请

WO2008123987A1 COAXIAL SHAFTS FOR RADIAL POSITIONING OF ROTATING MAGNETRON 审中-公开
标题翻译：旋转磁铁径向定位的同轴线
公开(公告)号：WO2008123987A1
公开(公告)日：2008-10-16
申请号：PCT/US2008/004262
申请日：2008-04-02
申请人： APPLIED MATERIALS, INC. , MILLER, Keith, A. , FLANIGAN, Michael, Allen , PONNEKANTI, Hari
发明人： MILLER, Keith, A. , FLANIGAN, Michael, Allen , PONNEKANTI, Hari
IPC分类号： H01J7/24
CPC分类号： H01J37/3408 , H01J37/3455
摘要： A magnetron actuator (140) for moving a magnetron (42) in a nearly arbitrary radial and azimuthal path in the back of a target (18) in a plasma sputter chamber (10). The magnetron actuator includes two coaxial rotary shafts (28, 30) extending along the chamber central axis (14) and coupled to two independently controllable rotary actuators (178, 18). An epicyclic gear mechanism (40) or a frog-leg structure (210) mechanically couple the shafts to the magnetron to control its radial and azimuthal position. A vertical actuator (144) moves the shafts vertically in tandem to vary the magnetron's separation from the target's back surface and compensate for erosion of the front surface. The rotary actuators may be separately coupled to the shafts or a rotatable ring gear may be coupled to the shafts through respectively fixed and orbiting idler gears. Two radially spaced sensors (234, 236) detect reflectors (230, 232) attached to the inner and outer arms (116, 122) of the epicyclic gear mechanism for homing of the controller (238).
摘要翻译：磁控管致动器（140），用于在等离子体溅射室（10）中的靶（18）的背面中几乎任意的径向和方位路径上移动磁控管（42）。磁控管致动器包括沿腔室中心轴线（14）延伸并连接到两个可独立控制的旋转致动器（178,18）的两个同轴旋转轴（28,30）。将行星齿轮机构（40）或青蛙腿结构（210）机械地将轴连接到磁控管以控制其径向和方位位置。垂直致动器（144）串联地垂直移动轴以改变磁控管与目标背面的分离，并补偿前表面的侵蚀。旋转致动器可以单独地联接到轴上，或者可旋转的环形齿轮可以通过分别固定和绕动的空转齿轮联接到轴。两个径向间隔的传感器（234,236）检测附接到行星齿轮机构的内臂和外臂（116,122）的反射器（230,232），用于归位控制器（238）。

8. 发明申请

WO2008141142A2 FIBER RETENTION SLEEVE 审中-公开
标题翻译：光纤保持套管
公开(公告)号：WO2008141142A2
公开(公告)日：2008-11-20
申请号：PCT/US2008/063194
申请日：2008-05-09
申请人： PREFORMED LINE PRODUCTS COMPANY , GRUBISH, Christopher, S. , MILLER, Keith, A. , DUDASH, George , HORNSBY, John, L. , STRANSKY, Mark, A. , CLOUD, Randy, G.
发明人： GRUBISH, Christopher, S. , MILLER, Keith, A. , DUDASH, George , HORNSBY, John, L. , STRANSKY, Mark, A. , CLOUD, Randy, G.
IPC分类号： G02B6/00
CPC分类号： G02B6/4477 , G02B6/4453 , G02B6/4471
摘要： A fiber retention device is provided for retention of fibers such as optical fibers, tubing, cables, buffer tubes and other elongate objects. The retention device includes, generally, a mounting retainer and a resilient sleeve. The mounting retainer is formed of a resilient material and defines one or more generally U-shaped support channels. The resilient sleeve is positioned in the U-shaped support channel and defines at least one expandable passageway for receiving a fiber therein. The passageway diameter is less than the fiber diameter in a pre-load orientation or relaxed condition prior to inserting the fiber into the passageway. The support channel selectively includes a plurality of tabs for locating the sleeve therein including tabs on a bottom wall for resisting relative horizontal movement and tabs on a side wall for resisting relative vertical movement of the sleeve within the channel. The sleeve is positively located by the channel, and the fiber is retained and strain relieved by the elastomer sleeve. A mounting flange is provided for coupling a plurality of mounting retainers in a coupled orientation as desired.
摘要翻译：提供纤维保持装置用于保持诸如光纤，管道，电缆，缓冲管和其它细长物体之类的纤维。保持装置通常包括安装保持器和弹性套筒。安装保持器由弹性材料形成并且限定一个或多个大体上U形的支撑通道。弹性套筒定位在U形支撑通道中，并且限定了用于在其中容纳纤维的至少一个可扩张通道。在将纤维插入通道之前，通道直径小于预加载取向或松弛状态下的纤维直径。支撑通道选择性地包括多个用于将套筒定位在其中的突出部，其中包括用于抵抗相对水平运动的底壁上的突出部和侧壁上的突出部，用于抵抗套管在通道内的相对垂直运动。套筒由通道确定地定位，并且纤维被弹性体套筒保持和应变消除。提供了安装法兰，用于根据需要以联接方向联接多个安装保持器。

9. 发明申请

WO2002097488A2 FIBER OPTIC CABLE CLOSURE AND ASSEMBLY 审中-公开
标题翻译：光纤电缆封闭和组装
公开(公告)号：WO2002097488A2
公开(公告)日：2002-12-05
申请号：PCT/US2002/005975
申请日：2002-02-27
申请人： PREFORMED LINE PRODUCTS COMPANY , CLOUD, Randy, G. , MILLER, Keith, A. , MURES, Marcel, G. , GARCIA, José, Antonio, Rivero
发明人： CLOUD, Randy, G. , MILLER, Keith, A. , MURES, Marcel, G. , GARCIA, José, Antonio, Rivero
IPC分类号： G02B6/00
CPC分类号： H02G15/076 , G02B6/4444 , H02G3/22
摘要： A cable closure assembly includes a rotatable collar secured to an end plate for rtating the end plate with respect to the closeure. Drop ports and express ports are provided within the end plate to accommodate either cut or unctu cables within the closure. Grommet and cap tools are provided which consist of two pieces to bbe installed over cables after the cables are inserted into the closure. A modular closure system is provided including a dome closure and extender or expander closures to increase storage and splicing area within the dome closure. A sliding and locking bracket allow for movement and pivoting of splice trays to access splice trays below other stacked trays. An extender for a strenght member bracket accomodates various lengths of strenght members on the cable fiber cable. A bracket on an end of a rigid bar member permits wrapping of the cable within the closure and positions the cable within the closure.
摘要翻译：电缆闭合组件包括固定到端板的可旋转轴环，用于使端板相对于闭合件进行翻转。端板和快速端口设置在端板内，以适应封闭件内的切割或非接触电缆。提供的索环和盖工具由电缆插入闭合件中之后由电缆安装的两个部件组成。提供了一种模块化封闭系统，包括一个圆顶盖和延伸器或膨胀器封闭件，以增加圆顶盖内的储存和拼接区域。滑动和锁定支架允许接合盘的移动和枢转，以便在其他堆叠的托盘下方接合接合盘。用于强度构件支架的延长件可以承受电缆光纤电缆上的各种长度的强度构件。在刚性杆构件的端部上的支架允许将电缆缠绕在封闭件内并将电缆定位在闭合件内。

10. 发明申请

WO2012162016A1 WEAR PIN GAP CLOSURE DETECTION SYSTEM FOR GAS TURBINE ENGINE 审中-公开
标题翻译：用于气体发动机的密封挡圈闭合检测系统
公开(公告)号：WO2012162016A1
公开(公告)日：2012-11-29
申请号：PCT/US2012/037873
申请日：2012-05-15
申请人： SIEMENS ENERGY, INC. , SINGH, Ram Bahadur , WASDELL, David, L. , MILLER, Keith, A.
发明人： SINGH, Ram Bahadur , WASDELL, David, L. , MILLER, Keith, A.
IPC分类号： F01D11/00 , F01D21/04 , F04D27/02
CPC分类号： F01D11/001 , F01D21/04 , F04D27/008 , F04D27/0292 , F05D2240/55 , F05D2250/32 , F05D2260/30 , F05D2260/36 , F05D2260/80
摘要： A wear indication system (10) for use in turbine engines to measure the rate of gap closure between a seal holder (12) and a rotor disk in a compressor blade assembly (16) includes a support system capable of supporting a wear indicator (20) formed from a relatively soft wear material without enabling the wear indicator (20) to shift position or to fall out. One or more wear pins (22) are releasably attached to a compression plate (24) with a seal holder (12). The seal holder (12) restrains the wear pin (22) in position in an interference fit. During turbine engine operation, the wear pin (22) is used to determine the rate of gap closing between a rotor disk (14) and a seal holder (12) precisely so that gas turbine engine repair can be scheduled and proper actions be taken to prevent rubbing between rotating and stationary parts of a compressor.
摘要翻译：一种用于涡轮发动机的磨损指示系统（10），用于测量压缩机叶片组件（16）中的密封保持器（12）和转子盘之间的间隙关闭速率，包括能够支撑磨损指示器（20）的支撑系统）由相对软的磨损材料形成，而不使磨损指示器（20）移动位置或脱落。一个或多个磨损销（22）通过密封保持器（12）可释放地附接到压缩板（24）。密封保持器（12）将磨损销（22）限制在过盈配合中的适当位置。在涡轮发动机运行期间，磨损销（22）用于精确地确定转子盘（14）和密封保持器（12）之间的间隙关闭速率，从而能够安排燃气涡轮发动机修理并采取适当的措施防止在压缩机的旋转和静止部分之间摩擦。

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