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    • 3. 发明申请
    • WAVEFRONT MEASUREMENT PRE-SMOOTHING SYSTEMS AND METHODS
    • WAVEFRONT测量预曝光系统和方法
    • WO2015103273A1
    • 2015-07-09
    • PCT/US2014/072769
    • 2014-12-30
    • AMO Development, LLC.FABRIKANT, AnatolyCHERNYAK, DimitriDAI, Guang-mingSHAH, Jayesh
    • FABRIKANT, AnatolyCHERNYAK, DimitriDAI, Guang-mingSHAH, Jayesh
    • A61F9/008
    • A61F9/008A61F2009/0088
    • Embodiments of the present invention encompass systems and methods for generating a vision treatment target for an eye of a patient. Exemplary techniques can involve obtaining a wavefront measurement for the eye of the patient, processing the wavefront measurement, using a low pass filter, to obtain an ocular wavefront, and generating the vision treatment target based on the ocular wavefront. In some cases, the wavefront is processed by applying a Fourier transform to the wavefront measurement to obtain a Fourier spectrum of the wavefront, convolving, in the Fourier domain, the Fourier spectrum of the wavefront and the low pass filter to obtain a Fourier spectrum convolution result, and applying an inverse transform to the convolution result to obtain the ocular wavefront. The ocular wavefront can represent a low pass filtered version of the wavefront measurement, such that high spatial frequency features present in the wavefront measurement are not present in the ocular wavefront
    • 本发明的实施例包括用于产生患者眼睛的视力治疗目标的系统和方法。 示例性技术可以包括获得患者眼睛的波前测量,使用低通滤波器处理波前测量,以获得眼波阵面,以及基于眼波前生成视觉治疗目标。 在一些情况下,通过对波前测量应用傅里叶变换来处理波阵面,以获得波前的傅立叶频谱,在傅立叶域中卷积波前和低通滤波器的傅立叶频谱以获得傅立叶频谱卷积 结果,并且对卷积结果应用逆变换以获得眼波。 眼波前可以表示波前测量的低通滤波版本,使得波前测量中存在的高空间频率特征不存在于眼波前
    • 7. 发明申请
    • APPARATUS AND METHOD FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
    • 用于使用散射检测来检测重叠错误的装置和方法
    • WO2004076963A2
    • 2004-09-10
    • PCT/US2004/005419
    • 2004-02-23
    • KLA-TENCOR TECHNOLOGIES CORPORATIONMIEHER, Walter, D.LEVY, AdyGOLOVANEVSKY, BorisFRIEDMANN, MichaelSMITH, IanADEL, MichaelFABRIKANT, AnatolyBEVIS, Christopher, F.FIELDEN, JohnBAREKET, NoahGROSS, KenZALICKI, PiotrWACK, DanDECECCO, PaolaDZIURA, Thaddeus, G.GHINOVKER, Mark
    • MIEHER, Walter, D.LEVY, AdyGOLOVANEVSKY, BorisFRIEDMANN, MichaelSMITH, IanADEL, MichaelFABRIKANT, AnatolyBEVIS, Christopher, F.FIELDEN, JohnBAREKET, NoahGROSS, KenZALICKI, PiotrWACK, DanDECECCO, PaolaDZIURA, Thaddeus, G.GHINOVKER, Mark
    • G01B
    • G03F9/7088G01N21/956G01N2021/213G03F7/70625G03F7/70633G03F7/70683G03F9/7049G03F9/7084
    • Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system comprises any one or more of the following apparatus: an imaging reflectometer, an imaging spectroscopic reflectometer, a polarized spectroscopic imaging reflectometer, a scanning reflectometer system, a system with two or more reflectometers capable of parallel data acquisition, a system with two or more spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the reflectometer stage, imaging spectrometers, imaging system with wavelength filter, imaging system with long-pass wavelength filter, imaging system with short-pass wavelength filter, imaging system without wavelength filter, interferometric imaging system, imaging ellipsometer, a spectroscopic ellipsometer, a laser ellipsometer having a photoelastic modulator, an imaging spectroscopic ellipsometer, a scanning ellipsometer system, a system with two or more ellipsometers capable of parallel data acquisition, a system with two or more ellipsometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the ellipsometer stage, a Michelson interferometer, and a Mach-Zehnder interferometer, a Sagnac interferometer, a scanning angle of incidence system, a scanning azimuth angle system, a +/- first order differential reflectometer, a +/- first order differential polarized reflectometer.
    • 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标,采用光学系统,从而测量来自每个周期性目标的光信号。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号,在第一和第二结构之间确定覆盖误差。 光学系统包括以下装置中的任何一个或多个:成像反射计,成像光谱反射计,偏振光谱成像反射计,扫描反射计系统,具有两个或更多个能够并行数据采集的反射计的系统,具有两个 具有能够并行数据采集的两个或更多个偏振分光反射计的系统,具有两个或更多个偏振光谱反射计的系统,其能够进行串行数据采集而不移动晶片台或移动任何光学元件或 反射计阶段,成像光谱仪,波长滤波器成像系统,长波长滤波器成像系统,短波长滤波器成像系统,无波长滤波器成像系统,干涉成像系统,成像椭偏仪,光谱椭偏仪,激光 椭偏仪具有 光弹性调制器,成像光谱椭偏仪,扫描椭偏仪系统,具有能够并行数据采集的两个或更多个椭偏仪的系统,具有两个或更多个椭圆计的系统,能够进行串行数据采集而不移动晶片台或移动任何光学元件或 椭圆偏振台,迈克尔逊干涉仪和马赫 - 策德尔干涉仪,Sagnac干涉仪,入射系统的扫描角度,扫描方位角系统,+/-一阶微分反射计,+/-一阶差分偏振反射计 。