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    • 2. 发明申请
    • SEMICONDUCTOR LASER DIODE
    • 半导体激光二极管
    • WO2006044314A1
    • 2006-04-27
    • PCT/US2005/036360
    • 2005-10-11
    • ALFALIGHT INCKANSKAR, ManojEARLES, ThomasSTIERS, Eric
    • KANSKAR, ManojEARLES, ThomasSTIERS, Eric
    • H01S5/00H01S3/04
    • H01S5/34B82Y20/00H01S5/20H01S5/2009H01S5/32
    • A semiconductor laser diode comprises a p-n junction. The p-n junction comprises a substrate, an n-type semiconductor layer, a p-type semiconductor layer, and a quantum well. The quantum well is disposed between the n-type semiconductor layer and the p-type semiconductor layer. The substrate is formed from a first material system, the n-type semiconductor layer is formed from a second material system, the p-type semiconductor layer is formed from a third material system, and the quantum well is formed from a fourth material system. The second material system is different from the third material system. The second material system and the third material system are selected such that there is an increase in the rate of recombinations of the electrons from the n-type semiconductor layer and the holes from the p-type semiconductor layer in the quantum well. This results in a lower turn-on voltage for the semiconductor laser diode.
    • 半导体激光二极管包括p-n结。 p-n结包括衬底,n型半导体层,p型半导体层和量子阱。 量子阱设置在n型半导体层和p型半导体层之间。 基板由第一材料体系形成,n型半导体层由第二材料体系形成,p型半导体层由第三材料体系形成,量子阱由第四材料体系形成。 第二种材料体系与第三种材料体系不同。 选择第二材料系统和第三材料系统,使得来自n型半导体层的电子和来自量子阱中的p型半导体层的空穴的复合速率增加。 这导致半导体激光二极管的较低的导通电压。