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1. 发明申请

WO2016128259A1 INSTALLATION FOR FILM DEPOSITION ONTO AND/OR MODIFICATION OF THE SURFACE OF A MOVING SUBSTRATE 审中-公开
标题翻译：安装薄膜沉积和/或修改移动基板的表面
公开(公告)号：WO2016128259A1
公开(公告)日：2016-08-18
申请号：PCT/EP2016/052215
申请日：2016-02-03
申请人： COATING PLASMA INDUSTRIE , VETAPHONE A/S
发明人： GAT, Eric , TRAN, Minh Duc , EISBY, Frank
IPC分类号： C23C16/54 , C23C16/50 , C23C16/455 , B01J3/00 , H01J37/32 , C23C16/44
CPC分类号： C23C16/545 , C23C16/4401 , C23C16/45504 , C23C16/45519 , C23C16/45578 , C23C16/458 , C23C16/50 , C23C16/52 , H01J37/3244 , H01J37/3277
摘要： This installation comprises a housing, a substrate support (20) received in said housing, diffusion means (42) for diffusing an inert gas, such as nitrogen, towards said substrate support and at least one head (30) defining an inner volume (V) opened opposite to said top, said head being provided with at least two electrodes (8, 8', 8") for creating an electric discharge and with injection means (7, 7', 7") for injecting a gaseous mixture towards said substrate. Said injection means comprise at least one injection tube (7, 7', 7") placed between two adjacent electrodes or between one electrode and a peripheral wall, said tube being provided with injection holes facing said substrate support, for injecting said gaseous mixture on said substrate, whereas diffusion means are provided inside said head, said injection tube being placed between said substrate support and said diffusion means so that, in use, said gaseous mixture is urged against said substrate by said inert gas.
摘要翻译：该装置包括壳体，容纳在所述壳体中的衬底支撑件（20），用于将惰性气体（例如氮气）扩散到所述衬底支撑件的扩散装置（42）和至少一个限定内部容积（V ），所述头部设置有用于产生放电的至少两个电极（8,8'，8“），并具有用于将气体混合物朝所述顶部喷射的注射装置（7,7'，7”），基质。所述注射装置包括放置在两个相邻电极之间或者在一个电极和周围壁之间的至少一个注入管（7,7'，7“），所述管设置有面向所述衬底支撑件的注入孔，用于将所述气体混合物所述衬底，而扩散装置设置在所述头部内部，所述注入管被放置在所述衬底支撑件和所述扩散装置之间，使得在使用中，所述气态混合物被所述惰性气体压向所述衬底。

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