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1. 发明申请

WO2008136666A2 IMAGE SENSOR, METHOD FOR IMAGE DETECTION AND COMPUTER PROGRAM PRODUCT 审中-公开
标题翻译：图像传感器，图像检测方法和计算机程序产品
公开(公告)号：WO2008136666A2
公开(公告)日：2008-11-13
申请号：PCT/NL2008/050264
申请日：2008-04-29
申请人： ASML Netherlands B.V. , STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
发明人： STAALS, Frank , LOF, Joeri , LOOPSTRA, Erik, Roelof , TEL, Wim, Tjibbo , MOEST, Bearrach
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens arranged to form a detection image of the aerial pattern and an image detector arranged to measure radiation intensities in a plurality of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜和布置成测量检测图像中的多个位置中的辐射强度的图像检测器。

2. 发明申请

WO2013029957A2 A METHOD OF DETERMINING FOCUS CORRECTIONS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：确定焦点校正的方法，平版印刷加工单元和装置制造方法
公开(公告)号：WO2013029957A2
公开(公告)日：2013-03-07
申请号：PCT/EP2012/065599
申请日：2012-08-09
申请人： ASML NETHERLANDS B.V. , KISTEMAN, Arend , KIERS, Antoine , TEL, Wim , THEEUWES, Thomas
发明人： KISTEMAN, Arend , KIERS, Antoine , TEL, Wim , THEEUWES, Thomas
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/70616 , G03F7/70625 , G03F9/7026
摘要： Disclosed is a method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises: exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from said interfield focus variation information.
摘要翻译：公开了用于确定光刻投影设备的焦点校正的方法和相关设备。该方法包括：在测试基板上曝光多个全局校正场，每个全局校正场包括多个全局校正标记，并且每个全息校正场以其上的倾斜聚焦偏移曝光; 测量所述多个全局校正标记中的每一个的依赖于焦点的特性以确定场间焦点变化信息; 并根据所述场间焦点变化信息计算场间焦点校正。

3. 发明申请

WO2008136666A3 IMAGE SENSOR FOR LITHOGRAPHY 审中-公开
标题翻译：图像传感器
公开(公告)号：WO2008136666A3
公开(公告)日：2009-01-15
申请号：PCT/NL2008050264
申请日：2008-04-29
申请人： ASML NETHERLANDS BV , STAALS FRANK , LOF JOERI , LOOPSTRA ERIK ROELOF , TEL WIM TJIBBO , MOEST BEARRACH
发明人： STAALS FRANK , LOF JOERI , LOOPSTRA ERIK ROELOF , TEL WIM TJIBBO , MOEST BEARRACH
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in- a plurality, of positions in the detection image.
摘要翻译：本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。

4. 发明申请

WO2005033801A3 ADAPTIVE THERMAL CONTROL OF LITHOGRAPHIC CHEMICAL PROCESSES 审中-公开
标题翻译：光刻化学工艺的自适应热控制
公开(公告)号：WO2005033801A3
公开(公告)日：2005-10-27
申请号：PCT/US2004028550
申请日：2004-08-31
申请人： ASML HOLDING NV , OWEN CASSANDRA M , TEL WIM T , SINKWITZ STEPHAN EWALD
发明人： OWEN CASSANDRA M , TEL WIM T , SINKWITZ STEPHAN EWALD
IPC分类号： G03F7/00 , G03F7/20 , G03F7/30 , G03F7/38 , H01L21/00
CPC分类号： G03F7/38 , G03F7/3028 , G03F7/70875 , G03F7/70991 , H01L21/67098
摘要： A system, apparatus, and method for thermally controlling lithographic chemical processes is disclosed herein. The thermal control system includes a multi-zone thermal sensing unit containing a plurality of thermal sensor elements. These thermal elements are configured to detect the temperature of a plurality of pre-defined zones on the substrates. The system also includes a multi-zone thermal adjustment unit that contains a plurality of thermal coupler elements, which are configured to adjust the temperature of the pre-defined zones. The system further includes a thermal controller unit, operatively and communicatively coupled to the multi-zone thermal sensing unit and the multi-zone thermal adjustment unit. The thermal controller unit receives the detected temperature from the multi-zone thermal sensing unit, processes the detected temperature information, generates temperature control information based on the processed temperature information, and communicates the temperature control information to the multi-zone thermal adjustment unit to adjust the temperatures of the pre-defined zones.
摘要翻译：本文公开了用于热控制光刻化学过程的系统，装置和方法。热控制系统包括多区域热感测单元，其包含多个热传感器元件。这些热元件被配置为检测基板上的多个预定义区域的温度。该系统还包括多区域热调节单元，其包含多个热耦合器元件，其被配置为调节预定义区域的温度。该系统还包括热控制器单元，其可操作地并且通信地耦合到多区域热感测单元和多区域热调节单元。热控制器单元从多区域热敏单元接收检测到的温度，处理检测到的温度信息，基于处理的温度信息生成温度控制信息，并将温度控制信息传送到多区域热调节单元以进行调整预定区域的温度。

5. 发明申请

WO2013029957A3 A METHOD OF DETERMINING FOCUS CORRECTIONS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：确定焦点校正的方法，光刻处理单元和器件制造方法
公开(公告)号：WO2013029957A3
公开(公告)日：2013-04-25
申请号：PCT/EP2012065599
申请日：2012-08-09
申请人： ASML NETHERLANDS BV , KISTEMAN AREND , KIERS ANTOINE , TEL WIM , THEEUWES THOMAS
发明人： KISTEMAN AREND , KIERS ANTOINE , TEL WIM , THEEUWES THOMAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/70616 , G03F7/70625 , G03F9/7026
摘要： Disclosed is a method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises: exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from said interfield focus variation information.
摘要翻译：公开了一种用于确定光刻投影装置的焦点校正的方法和相关联的装置。该方法包括：将测试基板上的多个全局校正场曝光，每个全局校正场均包括多个全局校正标记，并且每个全局校正场在其上以倾斜的焦点偏移曝光; 测量所述多个全局校正标记中的每一个的聚焦依赖特性，以确定场间焦点变化信息; 以及从所述场间焦点变化信息计算场间焦点校正。

6. 发明申请

WO2005033801A2 ADAPTIVE THERMAL CONTROL OF LITHOGRAPHIC CHEMICAL PROCESSES 审中-公开
标题翻译：光刻化学过程的自适应热控制
公开(公告)号：WO2005033801A2
公开(公告)日：2005-04-14
申请号：PCT/US2004/028550
申请日：2004-08-31
申请人： ASML HOLDING N.V. , OWEN, Cassandra, M. , TEL, Wim, T. , SINKWITZ, Stephan, Ewald
发明人： OWEN, Cassandra, M. , TEL, Wim, T. , SINKWITZ, Stephan, Ewald
IPC分类号： G03F7/20
CPC分类号： G03F7/38 , G03F7/3028 , G03F7/70875 , G03F7/70991 , H01L21/67098
摘要： A system, apparatus, and method for thermally controlling lithographic chemical processes is disclosed herein. The thermal control system includes a multi-zone thermal sensing unit containing a plurality of thermal sensor elements. These thermal elements are configured to detect the temperature of a plurality of pre-defined zones on the substrates. The system also includes a multi-zone thermal adjustment unit that contains a plurality of thermal coupler elements, which are configured to adjust the temperature of the pre-defined zones. The system further includes a thermal controller unit, operatively and communicatively coupled to the multi-zone thermal sensing unit and the multi-zone thermal adjustment unit. The thermal controller unit receives the detected temperature from the multi-zone thermal sensing unit, processes the detected temperature information, generates temperature control information based on the processed temperature information, and communicates the temperature control information to the multi-zone thermal adjustment unit to adjust the temperatures of the pre-defined zones.
摘要翻译：本文公开了用于热控制平版印刷化学工艺的系统，设备和方法。热控制系统包括含有多个热传感器元件的多区域热感测单元。这些热敏元件被配置为检测基板上的多个预定义区域的温度。该系统还包括多区域热调节单元，该多区域热调节单元包含多个热耦合器元件，所述多个热耦合器元件被配置为调节预定区域的温度。该系统还包括热控制器单元，该热控制器单元可操作且通信地耦合到多区热感测单元和多区热调整单元。热控制器单元从多区域热感测单元接收检测到的温度，处理检测到的温度信息，基于处理后的温度信息产生温度控制信息，并且将温度控制信息传送到多区域热调节单元以调节预定义区域的温度。

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