专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2014197102A3 NEUTRON RADIATION SENSOR 审中-公开
标题翻译：中子辐射传感器
公开(公告)号：WO2014197102A3
公开(公告)日：2015-03-05
申请号：PCT/US2014030801
申请日：2014-03-17
申请人： STARFIRE IND LLC
发明人： STUBBERS ROBERT S , SCOTT BRETT W , ALMAN DARREN A , JURCZYK BRIAN E , COVENTRY MATTHEW D
IPC分类号： G01T3/08
CPC分类号： G01T3/08
摘要： Embodiments utilize high energy particles generated by nuclear reactions involving neutron radiation and neutron-sensitive materials to generate and maintain an electric potential gradient between an electrode and a region separated from the electrode by an electric insulator. System and methods contemplated by the invention thereby enable passive detection of neutrons without an externally applied electric potential bias by maintaining a charge accumulation facilitated by nuclear reactions involving neutrons. The charge accumulation produces an electric potential gradient within an electric insulator that separates the charge accumulation from an exterior region.
摘要翻译：实施例利用由涉及中子辐射和中子敏感材料的核反应产生的高能粒子，以通过电绝缘体产生和维持电极与从电极分离的区域之间的电势梯度。因此，本发明考虑的系统和方法能够通过维持由涉及中子的核反应促进的电荷累积而无需经外部施加的电势偏置的中子的被动检测。电荷累积在电绝缘体内产生电荷梯度，该电绝缘体将电荷积聚与外部区域分离。

2. 发明申请

WO2007002170A3 MICRODISCHARGE LIGHT SOURCE CONFIGURATION AND ILLUMINATION SYSTEM 审中-公开
标题翻译：微型光源配置和照明系统
公开(公告)号：WO2007002170A3
公开(公告)日：2009-04-23
申请号：PCT/US2006024104
申请日：2006-06-21
申请人： STARFIRE IND LLC , JURCZYK BRIAN E , STUBBERS ROBERT
发明人： JURCZYK BRIAN E , STUBBERS ROBERT
IPC分类号： G21G4/00 , A61N5/06 , G01J1/00 , G01J3/10 , H01J3/26
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70391 , H05G2/005
摘要： A novel plasma source configuration system based on an arrangement of microdischarges is presented with particular emphasis on the generation of radiation for next-generation lithographic integrated circuit manufacturing, microscopy and medical/biological imaging. The present invention makes substantive improvements to the current state-of-the-art by specifically addressing known deficiencies, problems limiting high-volume manufacturing and cost-of-ownership considerations. In particular, the present invention enables a series of innovative illumination configurations that can improve lithographic tool design and performance.
摘要翻译：提出了一种基于微放电布置的新型等离子体源配置系统，特别强调下一代光刻集成电路制造，显微镜和医学/生物成像的辐射产生。本发明通过专门解决已知的缺陷，限制大批量制造和成本所有权考虑的问题，对当前最先进的技术进行实质性改进。特别地，本发明使得能够改善光刻工具设计和性能的一系列创新照明配置。

3. 发明申请

WO2014146008A2 SCALABLE MULTI-ROLE SURFACE-WAVE PLASMA GENERATOR 审中-公开
标题翻译：可扩展多功能表面波等离子发生器
公开(公告)号：WO2014146008A2
公开(公告)日：2014-09-18
申请号：PCT/US2014030877
申请日：2014-03-17
申请人： STARFIRE IND LLC
发明人： RUZIC DAVID N , REILLY MICHAEL P , ZOONOZ PIYUM , STUBBERS ROBERT S , JURCZYK BRIAN E
IPC分类号： H05H1/46
CPC分类号： H05H1/46 , H01L21/67017 , H01L21/67155 , H01L31/18 , H05H2001/4615 , H05H2001/463
摘要： Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of heterostructures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.
摘要翻译：本文描述了用于产生能够同时实现具有低温度和平面可伸缩性的高密度的表面波等离子体的系统和方法。本发明的关键特征是由于缺少RF偏压而减少与等离子体接触的物体的损坏; 允许无损处理。优选的实施方案是适用于光伏电池制造，执行锯切损伤去除，氧化物剥离，沉积，掺杂和形成异质结构的一体化处理反应器。本发明可用于原子层沉积，蚀刻和其它表面相互作用过程。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式