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1. 发明申请

WO2012061711A1 METHODS AND APPARATUS FOR DETECTING THE CONFINEMENT STATE OF PLASMA IN A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：用于检测等离子体处理系统中等离子体的限制状态的方法和装置
公开(公告)号：WO2012061711A1
公开(公告)日：2012-05-10
申请号：PCT/US2011/059336
申请日：2011-11-04
申请人： LAM RESEARCH CORPORATION , NIXON, Ronda, K. , SHAREEF, Iqbal, A. , WAGNER, Mark, I. , MCANDREW, Robert , KROEKER, Tony, Ray
发明人： NIXON, Ronda, K. , SHAREEF, Iqbal, A. , WAGNER, Mark, I. , MCANDREW, Robert , KROEKER, Tony, Ray
IPC分类号： H05K3/26
CPC分类号： B08B7/0021 , H01L21/02101 , H01L21/67051 , H01L21/6719
摘要： A processing chamber for post-wet-etch removing of drying fluid (DF) is disclosed. The chamber includes a chamber wall surrounding a processing volume and a plurality of nozzles disposed annularly about the processing volume and arranged into a set of nozzle rows that includes at least one nozzle row. The chamber also includes a plenum and a set of manifolds coupled to the plurality of nozzles to deliver the supercritical CO 2 to the plurality of nozzles. Each nozzle has a nozzle outlet directed toward an interior portion of the processing volume and the nozzles are configured to flow the supercritical CO 2 toward the substrates in a manner that minimizes recirculation loops and vortices.
摘要翻译：公开了一种用于湿法蚀刻去除干燥流体（DF）的处理室。该室包括围绕处理容积的室壁和围绕处理容积环状设置并且布置成包括至少一个喷嘴排的一组喷嘴行的多个喷嘴。该腔室还包括一个气室和一组联接到多个喷嘴的歧管，以将超临界CO 2输送到多个喷嘴。每个喷嘴具有指向处理体积的内部部分的喷嘴出口，并且喷嘴构造成以使循环回路和涡流最小化的方式朝向基板流动超临界CO 2。

2. 发明申请

WO2009155221A3 METHODS FOR CONTROLLING TIME SCALE OF GAS DELIVERY INTO A PROCESSING CHAMBER 审中-公开
标题翻译：用于控制气体输送到加工室的时间尺度的方法
公开(公告)号：WO2009155221A3
公开(公告)日：2010-03-25
申请号：PCT/US2009047279
申请日：2009-06-12
申请人： LAM RES CORP , YUN GUNSU , SHAREEF IQBAL A , JORGENSEN KURT , CHARATAN ROBERT
发明人： YUN GUNSU , SHAREEF IQBAL A , JORGENSEN KURT , CHARATAN ROBERT
IPC分类号： H01L21/00 , H01L21/02
CPC分类号： G05D7/0635 , Y10T137/7761
摘要： A method for establishing a mass flow controller (MFC) control scheme, which is configured for reducing a time scale for gas delivery into a processing chamber, for a recipe is provided. The method includes identifying a set of delayed gas species utilized during execution of the recipe with a set of delivery time slower than a target delivery time scale. The method also includes establishing an initial overshoot strength and an initial overshoot duration for each gas specie of the set of delayed gas species. The method further includes establishing MFC control scheme by adjusting an MFC hardware for each gas specie during the execution of the recipe. Adjusting the MFC hardware includes applying the initial overshoot strength for the initial overshoot duration to determine if the MFC control scheme provides for each gas specie a pressure profile within a target accuracy of an equilibrium pressure for the processing chamber.
摘要翻译：提供了一种用于建立质量流量控制器（MFC）控制方案，其被配置为用于减少用于配方的气体输送到处理室中的时间标度。该方法包括在具有比目标递送时间标度慢的一组递送时间的情况下识别在执行配方期间使用的一组延迟气体种类。该方法还包括为该组延迟气体种类的每种气体物质建立初始过冲强度和初始过冲持续时间。该方法还包括在执行配方期间通过调整每种气体样品的MFC硬件来建立MFC控制方案。调整MFC硬件包括对初始过冲持续时间应用初始过冲强度，以确定MFC控制方案是否为每种气体提供在处理室的平衡压力的目标精度内的压力分布。

3. 发明申请

WO2009155221A2 METHODS FOR CONTROLLING TIME SCALE OF GAS DELIVERY INTO A PROCESSING CHAMBER 审中-公开
标题翻译：用于控制气体输送到加工室的时间尺度的方法
公开(公告)号：WO2009155221A2
公开(公告)日：2009-12-23
申请号：PCT/US2009/047279
申请日：2009-06-12
申请人： LAM RESEARCH CORPORATION , YUN, Gunsu , SHAREEF, Iqbal, A. , JORGENSEN, Kurt , CHARATAN, Robert
发明人： YUN, Gunsu , SHAREEF, Iqbal, A. , JORGENSEN, Kurt , CHARATAN, Robert
IPC分类号： H01L21/00 , H01L21/02
CPC分类号： G05D7/0635 , Y10T137/7761
摘要： A method for establishing a mass flow controller (MFC) control scheme, which is configured for reducing a time scale for gas delivery into a processing chamber, for a recipe is provided. The method includes identifying a set of delayed gas species utilized during execution of the recipe with a set of delivery time slower than a target delivery time scale. The method also includes establishing an initial overshoot strength and an initial overshoot duration for each gas specie of the set of delayed gas species. The method further includes establishing MFC control scheme by adjusting an MFC hardware for each gas specie during the execution of the recipe. Adjusting the MFC hardware includes applying the initial overshoot strength for the initial overshoot duration to determine if the MFC control scheme provides for each gas specie a pressure profile within a target accuracy of an equilibrium pressure for the processing chamber.
摘要翻译：提供了一种用于建立质量流量控制器（MFC）控制方案，其被配置为用于减少用于配方的气体输送到处理室中的时间标度。该方法包括在具有比目标递送时间标度慢的一组递送时间的情况下识别在执行配方期间使用的一组延迟气体种类。该方法还包括为该组延迟气体种类的每种气体物质建立初始过冲强度和初始过冲持续时间。该方法还包括在执行配方期间通过调整每种气体样品的MFC硬件来建立MFC控制方案。调整MFC硬件包括对初始过冲持续时间应用初始过冲强度，以确定MFC控制方案是否为每种气体提供在处理室的平衡压力的目标精度内的压力分布。

4. 发明申请

WO2008064044A1 METHODS FOR PERFORMING ACTUAL FLOW VERIFICATION 审中-公开
标题翻译：执行实际流程验证的方法
公开(公告)号：WO2008064044A1
公开(公告)日：2008-05-29
申请号：PCT/US2007/084724
申请日：2007-11-14
申请人： LAM RESEARCH CORPORATION , SHAREEF, Iqbal A. , TIETZ, Jim , WONG, Vernon , MEINECKE, Rich
发明人： SHAREEF, Iqbal A. , TIETZ, Jim , WONG, Vernon , MEINECKE, Rich
IPC分类号： H01L21/3065
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A method for determining an actual gas flow rate in a reaction chamber of a plasma processing system is provided. The method includes delivering gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, which is located upstream from the reaction chamber. The method also includes pressurizing the gas to create a choked flow condition within the orifice. The method further includes measuring a set of upstream pressure values of the gas via a set of pressure sensors. The method yet also includes applying a calibration factor of a set of calibration factors to determine the actual flow rate. The calibration factor is a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values, which is associated with an indicated flow rate for an MFC.
摘要翻译：提供了一种用于确定等离子体处理系统的反应室中的实际气体流量的方法。该方法包括通过由质量流量控制器（MFC）控制的气体输送系统将气体输送到位于反应室上游的孔口。该方法还包括对气体进行加压以在孔口内产生阻塞流动状态。该方法还包括经由一组压力传感器测量气体的一组上游压力值。该方法还包括应用一组校准因子的校准因子来确定实际流量。校准因子是一组上游压力值的平均值与一组金黄上游压力值的平均值的比值，其与MFC的指示流速相关联。

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