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    • 10. 发明申请
    • EDGE COATING IN CONTINUOUS DEPOSITION LINE
    • 连续沉积线中的边缘涂层
    • WO2007108757A1
    • 2007-09-27
    • PCT/SE2007/050124
    • 2007-03-02
    • SANDVIK INTELLECTUAL PROPERTY ABSCHUISKY, Mikael
    • SCHUISKY, Mikael
    • C23C14/56C23C14/02C23C14/24C23C14/32C23C14/34C23C14/35
    • C23C14/022C23C14/225C23C14/562
    • A continuous roll-to-roll deposition coating apparatus and a method to continuous coat an edge of a strip substrate are disclosed. The invention is aimed at accomplishing a hard and abrasion resistant coated metal strip with improved adhesion between a dense coating and the substrate.The deposition coating apparatus, comprises: a vacuum process chamber (114) including an etching zone (116) upstream of a deposition zone (118);at least one ion assisted etcher(120) in the etching zone; and at least one deposition apparatus (122) in the deposition zone,wherein the at least one deposition apparatus includes at least one target (124), wherein the strip substrate, in travelling through the vacuum process chamber, projects a first edge region (140) toward the at least one ion assisted etcher in the etching zone and projects the first edge region toward the target of the at least one deposition apparatus in the deposition zone, wherein the first edge region of the strip substrate includes at least a first angled surface (142) tapered from a first proximal position (144) toward a first distal position, the first proximal position closer to a centre region of the strip substrate than the first distal position, the first angled surface having a first surface normal (150), and wherein the target of the at least one deposition apparatus includes a target surface (126) having a target normal(128) and is angled with respect to the first angled surface so that the target normal intersects the first surface normal at an angle α, where α is greater than or equal to 90 degrees.
    • 公开了一种连续的卷对卷沉积涂覆装置和连续涂覆条带基底的边缘的方法。 本发明的目的在于实现具有改进的致密涂层和基底之间的粘合性的耐磨和耐磨的涂层金属条。沉积涂覆装置包括:真空处理室(114),其包括在沉积物上游的蚀刻区(116) 区域(118);蚀刻区中的至少一个离子辅助蚀刻器(120) 和至少一个沉积设备(122),其中所述至少一个沉积设备包括至少一个靶(124),其中所述带状衬底在穿过所述真空处理室时突出第一边缘区域(140) )朝向所述蚀刻区域中的所述至少一个离子辅助蚀刻器,并且将所述第一边缘区域朝向所述沉积区域中的所述至少一个沉积设备的靶突出,其中所述带状基板的所述第一边缘区域包括至少第一成角度表面 (142)从第一近端位置(144)朝向第一远端位置逐渐变细,所述第一近端位置比所述第一远端位置更靠近所述带状基板的中心区域,所述第一倾斜表面具有第一表面法线(150) 并且其中所述至少一个沉积设备的目标包括具有目标法线(128)的目标表面(126)并且相对于所述第一倾斜表面成角度,使得所述目标表面 以一个角度a切割第一个表面法线,其中a大于或等于90度。