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    • 9. 发明申请
    • HIGH PEAK POWER PLASMA PULSED SUPPLY WITH ARC HANDLING
    • 高峰值功率等离子脉冲电源电弧处理
    • WO2005010228A2
    • 2005-02-03
    • PCT/US2004023402
    • 2004-07-20
    • ADVANCED ENERGY IND INC
    • CHRISTIE DAVID J
    • C23C20060101C23C14/00C23C14/35C25B9/00C25B11/00C25B13/00H01J37/34C23C
    • H01J37/3444C23C14/35H01J37/34H01J37/3405
    • A magnetron sputtering system is provided comprising a pulsed DC power supply capable of delivering peak powers of 0.1 mega Watts to several megaWatts with a peak power density greater than 1kW/cm . A sputtering plasma in a highly ionized state is created without first adopting an arc discharge state. The power supply has a pulsing circuit comprising an energy storage capacitor and serially connected inductor with a switching means for disconnecting the pulsing circuit from the plasma and recycling the inductor energy back to the energy storage capacitor at the detection of an arc condition. The energy storage capacitor and the serially connected inductor provide an impedance match to the plasma, limits the current rate of rise and peak magnitude in the event of an arc, and shapes the voltage pulses to the plasma.
    • 提供了一种磁控溅射系统,其包括脉冲直流电源,该脉冲直流电源能够提供0.1兆瓦至几兆瓦的峰值功率,峰值功率密度大于1kW / cm 2。 在没有首先采用电弧放电状态的情况下产生高度电离状态的溅射等离子体。 该电源具有脉冲电路,该电路包括储能电容器和串联连接的电感器,该电感器具有开关装置,用于将脉冲电路从等离子体断开,并且在检测到电弧状况时将电感器能量回馈给能量存储电容器。 储能电容器和串联连接的电感器提供与等离子体的阻抗匹配,限制当前电弧的上升和峰值幅度,并将电压脉冲整形为等离子体。