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1. 发明申请

WO2011080016A3 METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM 审中-公开
公开(公告)号：WO2011080016A3
公开(公告)日：2011-07-07
申请号：PCT/EP2010/068318
申请日：2010-11-26
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , SANDERS, Daniel, Paul , CHENG, Joy , HINSBERG, William , KIM, Ho-Cheol , COLBURN, Matthew , HARRER, Stefan , HOLMES, Steven
发明人： SANDERS, Daniel, Paul , CHENG, Joy , HINSBERG, William , KIM, Ho-Cheol , COLBURN, Matthew , HARRER, Stefan , HOLMES, Steven
IPC分类号： G03F7/00
摘要： A method of forming a layered structure comprising a self-assembled material comprises: disposing a non-crosslinking photoresist layer on a substrate; pattern-wise exposing the photoresist layer to first radiation; optionally heating the exposed photoresist layer; developing the exposed photoresist layer in a first development process with an aqueous alkaline developer, forming an initial patterned photoresist layer; treating the initial patterned photoresist layer photochemically, thermally and/or chemically, thereby forming a treated patterned photoresist layer comprising non-crosslinked treated photoresist disposed on a first substrate surface; casting a solution of an orientation control material in a first solvent on the treated patterned photoresist layer, and removing the first solvent, forming an orientation control layer; heating the orientation control layer to effectively bind a portion of the orientation control material to a second substrate surface; removing at least a portion of the treated photoresist and, optionally, any non-bound orientation control material in a second development process, thereby forming a pre-pattern for self-assembly; optionally heating the pre-pattern; casting a solution of a material capable of self-assembly dissolved in a second solvent on the pre-pattern and removing the second solvent; and allowing the casted material to self-assemble with optional heating and/or annealing, thereby forming the layered structure comprising the self-assembled material.

2. 发明申请

WO2011080016A2 METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM 审中-公开
标题翻译：方向自组装方法和形成的层状结构
公开(公告)号：WO2011080016A2
公开(公告)日：2011-07-07
申请号：PCT/EP2010068318
申请日：2010-11-26
申请人： IBM , SANDERS DANIEL PAUL , CHENG JOY , HINSBERG WILLIAM , KIM HO-CHEOL , COLBURN MATTHEW , HARRER STEFAN , HOLMES STEVEN
发明人： SANDERS DANIEL PAUL , CHENG JOY , HINSBERG WILLIAM , KIM HO-CHEOL , COLBURN MATTHEW , HARRER STEFAN , HOLMES STEVEN
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of forming a layered structure comprising a self-assembled material comprises: disposing a non-crosslinking photoresist layer on a substrate; pattern-wise exposing the photoresist layer to first radiation; optionally heating the exposed photoresist layer; developing the exposed photoresist layer in a first development process with an aqueous alkaline developer, forming an initial patterned photoresist layer; treating the initial patterned photoresist layer photochemically, thermally and/or chemically, thereby forming a treated patterned photoresist layer comprising non-crosslinked treated photoresist disposed on a first substrate surface; casting a solution of an orientation control material in a first solvent on the treated patterned photoresist layer, and removing the first solvent, forming an orientation control layer; heating the orientation control layer to effectively bind a portion of the orientation control material to a second substrate surface; removing at least a portion of the treated photoresist and, optionally, any non-bound orientation control material in a second development process, thereby forming a pre-pattern for self-assembly; optionally heating the pre-pattern; casting a solution of a material capable of self-assembly dissolved in a second solvent on the pre-pattern and removing the second solvent; and allowing the casted material to self-assemble with optional heating and/or annealing, thereby forming the layered structure comprising the self-assembled material.
摘要翻译：形成包括自组装材料的层状结构的方法包括：在基底上设置非交联光致抗蚀剂层; 将光致抗蚀剂层图案化地暴露于第一辐射; 可选地加热曝光的光致抗蚀剂层; 在第一显影工艺中用含水碱性显影剂显影曝光的光致抗蚀剂层，形成初始图案化的光致抗蚀剂层; 以光学，光学和/或化学方式处理初始图案化的光致抗蚀剂层，从而形成经处理的图案化的光刻胶层，其包含设置在第一衬底表面上的非交联处理的光致抗蚀剂; 在经处理的图案化光刻胶层上浇铸取向控制材料在第一溶剂中的溶液，并除去第一溶剂，形成取向控制层; 加热所述取向控制层以有效地将所述取向控制材料的一部分粘合到第二基板表面; 在第二显影过程中除去至少一部分经处理的光致抗蚀剂和任选的任何未结合的取向控制材料，从而形成用于自组装的预图案; 可选地加热预图案; 将能够自组装的溶解在第二溶剂中的材料的溶液浇铸在预图案上并除去第二溶剂; 并且允许铸造材料通过任选的加热和/或退火自组装，从而形成包括自组装材料的层状结构。

3. 发明申请

WO2011101260A3 SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE 审中-公开
标题翻译：含磺酰胺的光敏剂组合物和使用方法
公开(公告)号：WO2011101260A3
公开(公告)日：2011-12-01
申请号：PCT/EP2011051565
申请日：2011-02-03
申请人： IBM , IBM UK , CENTRAL GLASS CO LTD , SANDERS DANIEL PAUL , FUJIWARA MASAKI , TERUI YOSHIHARU
发明人： SANDERS DANIEL PAUL , FUJIWARA MASAKI , TERUI YOSHIHARU
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol- soluble photoresists for resist-on-resist applications. The sulfonamide- containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I).
摘要翻译：提供了用于平版印刷方法的含磺酰胺的光刻胶组合物，其具有用于高分辨率，低模糊成像的改进性质。还提供用于抗蚀剂抗蚀剂应用的醇溶性光刻胶。本发明的含磺酰胺的光刻胶组合物包括正式光刻胶组合物，其具有式（I）所示的具有支化连接基团的磺酰胺取代的重复单元。

4. 发明申请

WO2011135046A1 CYCLIC CARBONYL COMPOUNDS WITH PENDANT PENTAFLUOROPHENYL CARBONATE GROUPS, PREPARATIONS THEREOF, AND POLYMERS THEREFROM 审中-公开
标题翻译：环状碳化合物与悬浮剂二芳基碳酸酯基团，其制备方法及聚合物
公开(公告)号：WO2011135046A1
公开(公告)日：2011-11-03
申请号：PCT/EP2011/056778
申请日：2011-04-28
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , CENTRAL GLASS CO LTD , SANDERS, Daniel, Paul , HEDRICK, James, Lupton , MANABU, Yasumoto , FUJIWARA, Masaki
发明人： SANDERS, Daniel, Paul , HEDRICK, James, Lupton , MANABU, Yasumoto , FUJIWARA, Masaki
IPC分类号： C07D317/36 , C07D319/04 , C08G64/30
CPC分类号： C07D319/04 , C07D317/36 , C08G64/0233 , C08G64/30 , Y02P20/582
摘要： A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
摘要翻译：公开了一种制备包含活性五氟苯基碳酸酯基团的环状羰基化合物的一锅法。环状羰基化合物可以通过开环方法聚合以形成包含包含侧链五氟苯基碳酸酯基团的重复单元的ROP聚合物。使用合适的亲核试剂，可以在开环聚合之前或之后将五氟苯基五氟苯基碳酸酯基团选择性地转化成多种其它官能团。

5. 发明申请

WO2011101260A2 SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE 审中-公开
标题翻译：含有磺酰胺的光催化剂组合物及其使用方法
公开(公告)号：WO2011101260A2
公开(公告)日：2011-08-25
申请号：PCT/EP2011/051565
申请日：2011-02-03
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , CENTRAL GLASS CO LTD , SANDERS, Daniel, Paul , FUJIWARA, Masaki , TERUI, Yoshiharu
发明人： SANDERS, Daniel, Paul , FUJIWARA, Masaki , TERUI, Yoshiharu
IPC分类号： G03F7/004
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/322 , G03F7/325
摘要： Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol- soluble photoresists for resist-on-resist applications. The sulfonamide- containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I).
摘要翻译：提供了用于光刻工艺的含磺酰胺的光致抗蚀剂组合物，其具有用于高分辨率，低模糊成像的改进的性质。还提供了用于抗蚀剂抗蚀剂应用的醇溶性光致抗蚀剂。本发明的含磺酰胺的光致抗蚀剂组合物包括具有如式（I）所示的具有支链连接基团的磺酰胺取代的重复单元的正色调光致抗蚀剂组合物。

6. 发明申请

WO2011101259A2 SULFONAMIDE-CONTAINING TOPCOAT AND PHOTORESIST ADDITIVE COMPOSITIONS AND METHODS OF USE 审中-公开
标题翻译：含有磺酰胺的TopCOAT和光催化剂添加剂组合物及其使用方法
公开(公告)号：WO2011101259A2
公开(公告)日：2011-08-25
申请号：PCT/EP2011051564
申请日：2011-02-03
申请人： IBM , IBM UK , CENTRAL GLASS CO LTD , SANDERS DANIEL PAUL , FUJIWARA MASAKI , TERUI YOSHIHARU
发明人： SANDERS DANIEL PAUL , FUJIWARA MASAKI , TERUI YOSHIHARU
IPC分类号： G03F7/11
CPC分类号： C09D133/16 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I).
摘要翻译：提供了与本领域已知的相比，具有改进的静态后退水接触角的用于光刻工艺的含磺酰胺的组合物，面漆聚合物和添加剂聚合物。本发明的含磺酰胺的面漆聚合物和添加剂聚合物包括具有支链连接基团的磺酰胺取代的重复单元，如式（I）所示。

7. 发明申请

WO2010133422A3 DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS USING SEGMENTED PREPATTERNS 审中-公开
标题翻译：使用SEGMENTED PREPATTERNS的嵌段共聚物的方向自组装
公开(公告)号：WO2010133422A3
公开(公告)日：2011-05-12
申请号：PCT/EP2010055412
申请日：2010-04-23
申请人： IBM , IBM UK , CHENG JOY , NA YOUNG-HYE , LAI KAFAI , RETTNER CHARLES THOMAS , SANDERS DANIEL PAUL , LI WAI-KIN
发明人： CHENG JOY , NA YOUNG-HYE , LAI KAFAI , RETTNER CHARLES THOMAS , SANDERS DANIEL PAUL , LI WAI-KIN
IPC分类号： B81C1/00
CPC分类号： B81C1/00031 , B81C1/00404 , B81C2201/0149 , H01L21/0337 , H01L21/31144
摘要： An opening in a substrate is formed, e.g., using optical lithography, with the opening having sidewalls whose cross section is given by segments that are contoured and convex. The cross section of the opening may be given by overlapping circular regions, for example. The sidewalls adjoin at various points, where they define protrusions. A layer of polymer including a block copolymer is applied over the opening and the substrate, and allowed to self-assemble. Discrete, segregated domains form in the opening, which are removed to form holes, which can be transferred into the underlying substrate. The positions of these domains and their corresponding holes are directed to predetermined positions by the sidewalls and their associated protrusions. The distances separating these holes may be greater or less than what they would be if the block copolymer (and any additives) were to self-assemble in the absence of any sidewalls.
摘要翻译：例如使用光刻法形成衬底中的开口，其中开口具有侧壁，其横截面由轮廓和凸形的部分给出。例如，开口的横截面可以由重叠的圆形区域给出。侧壁在各个点处相邻，在那里它们限定突起。将包含嵌段共聚物的聚合物层施加在开口和基底上，并允许自组装。在开口中形成离散的分离的区域，其被去除以形成孔，其可以被转移到下面的基底中。这些区域及其对应的孔的位置通过侧壁及其相关联的突起被引导到预定位置。分离这些孔的距离可以大于或小于如果嵌段共聚物（和任何添加剂）在没有任何侧壁的情况下自组装就会发生。

8. 发明申请

WO2010133422A2 DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS USING SEGMENTED PREPATTERNS 审中-公开
标题翻译：使用SEGMENTED PREPATTERNS的嵌段共聚物的方向自组装
公开(公告)号：WO2010133422A2
公开(公告)日：2010-11-25
申请号：PCT/EP2010/055412
申请日：2010-04-23
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , CHENG, Joy , NA, Young-Hye , LAI, Kafai , RETTNER, Charles, Thomas , SANDERS, Daniel, Paul , LI, Wai-Kin
发明人： CHENG, Joy , NA, Young-Hye , LAI, Kafai , RETTNER, Charles, Thomas , SANDERS, Daniel, Paul , LI, Wai-Kin
IPC分类号： B81C1/00
CPC分类号： B81C1/00031 , B81C1/00404 , B81C2201/0149 , H01L21/0337 , H01L21/31144
摘要： An opening in a substrate is formed, e.g., using optical lithography, with the opening having sidewalls whose cross section is given by segments that are contoured and convex. The cross section of the opening may be given by overlapping circular regions, for example. The sidewalls adjoin at various points, where they define protrusions. A layer of polymer including a block copolymer is applied over the opening and the substrate, and allowed to self-assemble. Discrete, segregated domains form in the opening, which are removed to form holes, which can be transferred into the underlying substrate. The positions of these domains and their corresponding holes are directed to predetermined positions by the sidewalls and their associated protrusions. The distances separating these holes may be greater or less than what they would be if the block copolymer (and any additives) were to self-assemble in the absence of any sidewalls.
摘要翻译：例如使用光刻法形成衬底中的开口，其中开口具有侧壁，其横截面由轮廓和凸形的部分给出。例如，开口的横截面可以由重叠的圆形区域给出。侧壁在各个点处相邻，在那里它们限定突起。将包含嵌段共聚物的聚合物层施加在开口和基底上，并允许自组装。在开口中形成离散的分离的区域，其被去除以形成孔，其可以被转移到下面的基底中。这些区域及其对应的孔的位置通过侧壁及其相关联的突起被引导到预定位置。分离这些孔的距离可以大于或小于如果嵌段共聚物（和任何添加剂）在没有任何侧壁的情况下自组装就会发生。

9. 发明申请

WO2011101259A3 TOPCOAT COMPOSITION COMPRISING A POLYMER CONTAINING A REPEAT UNIT INCLUDING A SULFONAMIDE FUNCTION, PHOTORESIST COMPOSITION CONTAINING THE SAME AND METHODS OF USE 审中-公开
公开(公告)号：WO2011101259A3
公开(公告)日：2011-08-25
申请号：PCT/EP2011/051564
申请日：2011-02-03
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , CENTRAL GLASS CO LTD , SANDERS, Daniel, Paul , FUJIWARA, Masaki , TERUI, Yoshiharu
发明人： SANDERS, Daniel, Paul , FUJIWARA, Masaki , TERUI, Yoshiharu
IPC分类号： G03F7/11 , G03F7/004 , G03F7/20 , G03F7/038 , G03F7/039
摘要： Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I).

10. 发明申请

WO2011073013A1 METHODS OF DIRECTED SELF-ASSEMBLY WITH 193 - NM IMMERSION LITHOGRAPHY AND LAYERED STRUCTURES FORMED THEREFROM 审中-公开
标题翻译：方向自组装与193-NM渗透层析及其形成的层状结构的方法
公开(公告)号：WO2011073013A1
公开(公告)日：2011-06-23
申请号：PCT/EP2010/068316
申请日：2010-11-26
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , CHENG, Joy , HINSBERG, William , WALLRAFF, Gregory, Michael , TRUONG, Hoa , SUNDBERG, Linda, Karin , ITO, Hiroshi , SANDERS, Daniel, Paul , KIM, Ho-Cheol , NA, Young-Hye
发明人： CHENG, Joy , HINSBERG, William , WALLRAFF, Gregory, Michael , TRUONG, Hoa , SUNDBERG, Linda, Karin , ITO, Hiroshi , SANDERS, Daniel, Paul , KIM, Ho-Cheol , NA, Young-Hye
IPC分类号： B81C1/00 , G03F7/32 , G03F7/16 , G03F7/20
CPC分类号： B82Y40/00 , B81C1/00031 , B81C2201/0149 , G03F7/0392 , G03F7/09 , G03F7/091 , G03F7/165 , G03F7/325 , G03F7/327 , G03F7/40
摘要： A method of forming a layered structure comprising a domain pattern of a self-assembled material comprises: disposing on a substrate a photoresist layer comprising a non-crosslinking photoresist; optionally baking the photoresist layer; pattern- wise exposing the photoresist layer to first radiation; optionally baking the exposed photoresist layer; and developing the exposed photoresist layer with a non-alkaline developer to form a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist; wherein the developed photoresist is not soluble in a given organic solvent suitable for casting a given material capable of self-assembly, and the developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the given material capable of self-assembly dissolved in the given organic solvent is casted on the patterned photoresist layer, and the given organic solvent is removed. The casted given material is allowed to self-assemble while optionally heating and/or annealing the casted given material, thereby forming the layered structure comprising the domain pattern of the self-assembled given material.
摘要翻译：形成包括自组装材料的畴图案的层状结构的方法包括：在基底上设置包含非交联光致抗蚀剂的光致抗蚀剂层; 任选地烘烤光致抗蚀剂层; 将光致抗蚀剂层以图形方式曝光到第一辐射; 任选地烘烤曝光的光致抗蚀剂层; 以及用非碱性显影剂显影曝光的光致抗蚀剂层以形成包含非交联显影光致抗蚀剂的负色图案光刻胶层; 其中显影的光致抗蚀剂不溶于适于铸造能够自组装的给定材料的给定有机溶剂中，并且显影的光致抗蚀剂可溶于碱性显影液和/或第二有机溶剂。将包含溶解在给定有机溶剂中的能够自组装的给定材料的溶液浇铸在图案化的光致抗蚀剂层上，并且除去给定的有机溶剂。铸造的给定材料允许自组装，同时任选地加热和/或退火铸造的给定材料，从而形成包括自组装给定材料的畴图案的分层结构。

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