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    • 3. 发明申请
    • NEW HETEROCYCLIC COMPOUNDS FOR THE INHIBITION OF INTEGRINS AND USE THEREOF
    • 用于抑制整合及其使用的新型杂环化合物
    • WO2007131764A2
    • 2007-11-22
    • PCT/EP2007/004283
    • 2007-05-14
    • JERINI AGZISCHINSKY, GuntherSTRAGIES, RolandOSTERKAMP, FrankSCHARN, DirkHUMMEL, GerdKALKHOF, HolgerZAHN, GritVOSSMEYER, DörteCHRISTNER-ALBRECHT, ClaudiaREINEKE, Ulrich
    • ZISCHINSKY, GuntherSTRAGIES, RolandOSTERKAMP, FrankSCHARN, DirkHUMMEL, GerdKALKHOF, HolgerZAHN, GritVOSSMEYER, DörteCHRISTNER-ALBRECHT, ClaudiaREINEKE, Ulrich
    • C07D401/12C07D403/12C07D407/12C07D409/12C07D413/12C07D417/12A61P29/00A61K31/44
    • C07D405/12C07D401/12C07D403/12C07D409/12C07D413/12C07D417/12
    • The present invention is related to a compound of formula (I), wherein A is a radical selected from the group comprising aromatic heterocyclic 5-membered ring systems; Ar is a radical selected from the group comprising optionally substituted 5- and 6-membered aromatic ring systems, whereby the ring system contains 0, 1, 2 or 3 heteroatoms selected from the group comprising N, O and S; Z is a radical individually and independently selected from the group comprising (CH 2 ) n -E-(CH 2 ) m -L-(CH 2 ) k and (CH 2 ) m -L-(CH 2 ) k, wherein E is a radical which is either absent or present, whereby if E is present, E is selected from the group comprising O, S, NH, NR a , CO, SO, SO 2 , acetylene and substituted ethylene; L is a radical which is either absent or present, whereby if L is present, L is individually and independently selected from the group comprising O, S, NH, NR b , CO, SO, SO 2 , substituted ethylene and acetylene; and k, m and n are individually and independently O, 1, 2 or 3; ψ is a radical of formula (II), wherein Q is a radical selected from the group comprising a direct bond, Cl-C4alkyl, C=O, C=S, O, S, CR a R b , NR a -NR b , N=N, CR a =N, N=CR a , (C=O)-O, 0-(C=O), SO 2 , NR a , (C=O)-NR 3 , NR a -(C=0)-NR b , NR C -(C=O), 0-(C=0)-NR c , NR c -(C=0)-0, NR C -(C=S), (C=S)-NR c , NR c -(C=S)-NR d , NR C -SO 2 and SO 2 -NR c . R1, R a , R b , R c and R d are radicals which are individually and independently selected from the group comprising H, alkyl, substituted alkyl, cycloalkyl, substituted cycloalkyl, heterocycloyl, substituted heterocycloyl, aryl, substituted aryl, heteroaryl, substituted heteroaryl, arylalkyl, substituted arylalkyl, heteroarylalkyl, substituted heteroarylalkyl, cycloalkylalkyl, substituted cycloalkylalkyl, heterocyclylalkyl, substituted heterocyclylalkyl, alkyloxy, alkyloxyalkyl, substituted alkyloxyalkyl, alkyloxycycloalkyl, substituted alkyloxycycloalkyl, alkyloxyheterocyclyl, substituted alkyloxyheterocyclyl, alkyloxyaryl, substituted alkyloxyaryl, alkyloxyheteroaryl, substituted alkyloxyheteroaryl, alkylthioalkyl, substituted alkylthioalkyl, alkylthiocycloalkyl and substituted alkylthiocycloalkyl, hydroxy, substituted hydroxy, oxo, thio, substituted thio, aminocarbonyl, substituted aminocarbonyl, formyl, substituted formyl, thioformyl, substituted thioformyl, amino, substituted amino, hydroxy 1, substituted hydroxy 1, mercapto, substituted mercapto, hydrazino, substituted hydrazino, diazene, substituted diazene, imine, substituted imine, amidino, substituted amidino, iminomethylamino, substituted iminomethylamino, ureido, substituted ureido, formylamino, substituted formylamino, aminocarbonyloxy, substituted aminocarbonyloxy, hydroxycarbonylamino, substituted hydroxycarbonylamino, hydroxycarbonyl, substituted hydroxycarbonyl, formyloxy, substituted formyloxy, thioformylamino, substituted thioformylamino, aminothiocarbonyl, substituted aminothiocarbonyl, thioureido, substituted thioureido, sufonyl, substituted sulfonyl, sulfonamino, substituted sulfonamino, aminosulfonyl, substituted aminosulfonyl, cyano and halogen; R 2 is a hydrophobic moiety; R 3 is a radical selected from the group comprising OH, C1C8alkyloxy and aryl C0-C6alkyloxy; R 4 is a radical selected from the group comprising hydrogen, halogen and C1-C4alkyl; and G is a radical containing a basic moiety.
    • 本发明涉及式(I)化合物,其中A是选自芳族杂环5元环系的基团; Ar是选自包含任选取代的5元和6元芳族环系的基团,其中该环体系含有0,1,2或3个选自N,O和S的杂原子; Z是单独且独立地选自下列基团的基团:(CH 2 CH 2)n - (CH 2) /(CH 2)2 - (CH 2)n - (CH 2) 其中E是不存在或存在的基团,由此如果存在E,则E选自O,S,NH,NR CO,SO,SO 2,乙炔和取代的乙烯; L是不存在或存在的基团,其中如果存在L,则L独立地且独立地选自O,S,NH,NR b,CO,SO,SO, > 2,取代的乙烯和乙炔; 并且k,m和n各自独立地为O,1,2或3; ? 是式(II)的基团,其中Q是选自直接键,C 1 -C 4烷基,C = O,C = S,O,S,CR a, N,N = N,CR = N,N = CR, (C = O)-O,O-(C = O),SO 2,NR a,(C = O) (C = O)-NR b,C(O) - (C = O), (C = O)-NR C,C(O)C(= C) ),(C = S)-NR C C, - NR C - (C = S)-NR D, SO 2 SO 2和SO 2 -NR 2 C 0。 R 1,R a,B,R b,R c和R d都是独立地且独立地选自 包括H,烷基,取代的烷基,环烷基,取代的环烷基,杂环基,取代的杂环基,芳基,取代的芳基,杂芳基,取代的杂芳基,芳基烷基,取代的芳基烷基,杂芳基烷基,取代的杂芳基烷基,环烷基烷基,取代的环烷基烷基,杂环基烷基,取代的杂环基烷基, 烷基氧基烷基,烷氧基烷基,取代烷氧基环烷基,烷氧基杂环基,取代烷氧基杂环基,烷氧基芳基,取代烷氧基芳基,烷氧基杂芳基,取代烷氧基杂芳基,烷硫基烷基,取代烷硫基烷基,烷硫基环烷基和取代烷硫基环烷基,羟基,取代羟基,氧代, 取代的氨基羰基,甲酰基,取代的甲酰基,硫代甲酰基,取代基 氨基,取代的氨基,羟基1,取代的羟基1,巯基,取代的巯基,肼基,取代的肼基,二氮烯,取代的二嗪,亚胺,取代的亚胺,脒基,取代的脒基,亚氨基甲基氨基,取代的亚氨基甲基氨基,脲基,取代的脲基, 甲酰氨基,取代的甲酰氨基,氨基羰基氧基,取代的氨基羰基氧基,羟基羰基氨基,取代的羟基羰基氨基,羟基羰基,取代的羟基羰基,甲酰氧基,取代的甲酰氧基,硫代甲酰氨基,取代的硫代甲酰基氨基,氨基硫代羰基,取代的氨基硫代羰基,硫脲基,取代的硫脲基,磺酰基,取代的磺酰基,磺氨基,取代的磺氨基, 氨基磺酰基,取代氨基磺酰基,氰基和卤素; R 2是疏水部分; R 3是选自OH,C 1 -C 8烷氧基和芳基C 0 -C 6烷氧基的基团; R 4是选自氢,卤素和C 1 -C 4烷基的基团; 并且G是含有基本部分的基团。